Theory of the single contact electron beam induced current effect
All publications on the single contact electron beam induced current (SC-EBIC) technique so far have been concerned with the application of the technique. This paper seeks to examine the theory behind the technique and supports it with experimental observation. It will be shown that the technique ca...
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Veröffentlicht in: | IEEE transactions on electron devices 2000-04, Vol.47 (4), p.897-899 |
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creator | Ong, V.K.S. Lau, K.T. Ma, J.G. |
description | All publications on the single contact electron beam induced current (SC-EBIC) technique so far have been concerned with the application of the technique. This paper seeks to examine the theory behind the technique and supports it with experimental observation. It will be shown that the technique can be used, not only on electron and ion beam machines, but also on any scanning equipment that is capable of generating electron-hole pairs within a semiconductor device, e.g., with the use of a fine laser beam. |
doi_str_mv | 10.1109/16.831013 |
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fullrecord | <record><control><sourceid>proquest_RIE</sourceid><recordid>TN_cdi_ieee_primary_831013</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>831013</ieee_id><sourcerecordid>29073316</sourcerecordid><originalsourceid>FETCH-LOGICAL-c433t-8bfa33e33579e5323b38c72e975493e5a291dcea9169336bfaf1ab87573826d33</originalsourceid><addsrcrecordid>eNqN0TtPwzAUBWALgUR5DKxMEQOIISU313bssap4SZVYyhw5zg1NlSbFTob-e1ylYmAAvFjW-XQGH8auIJkCJPoB5FQhJIBHbAJCZLGWXB6zSZKAijUqPGVn3q_DU3KeTthsuaLO7aKuivoVRb5uPxqKbNf2xvYRNWR717VRQWYT1W05WCojOzhHbUirKsQX7KQyjafLw33O3p8el_OXePH2_DqfLWLLEftYFZVBJESRaRKYYoHKZinpTHCNJEyqobRkNEiNKIOuwBQqExmqVJaI5-xu7N267nMg3-eb2ltqGtNSN_hcA5ccExBB3v4qU51kiCD_hkoi1_wfjVk4kEKANz_guhtcG_4lV0qkYRmxb7sfkXWd946qfOvqjXG7HJJ8v2IOMh9XDPZ6tDURfbtD-AVFw5Qz</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>885231055</pqid></control><display><type>article</type><title>Theory of the single contact electron beam induced current effect</title><source>IEEE Electronic Library (IEL)</source><creator>Ong, V.K.S. ; Lau, K.T. ; Ma, J.G.</creator><creatorcontrib>Ong, V.K.S. ; Lau, K.T. ; Ma, J.G.</creatorcontrib><description>All publications on the single contact electron beam induced current (SC-EBIC) technique so far have been concerned with the application of the technique. This paper seeks to examine the theory behind the technique and supports it with experimental observation. It will be shown that the technique can be used, not only on electron and ion beam machines, but also on any scanning equipment that is capable of generating electron-hole pairs within a semiconductor device, e.g., with the use of a fine laser beam.</description><identifier>ISSN: 0018-9383</identifier><identifier>EISSN: 1557-9646</identifier><identifier>DOI: 10.1109/16.831013</identifier><identifier>CODEN: IETDAI</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Contact ; Devices ; Documents ; Electron beam induced current ; Ion beams ; Laser beams ; Scanning ; Semiconductor devices</subject><ispartof>IEEE transactions on electron devices, 2000-04, Vol.47 (4), p.897-899</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2000</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c433t-8bfa33e33579e5323b38c72e975493e5a291dcea9169336bfaf1ab87573826d33</citedby><cites>FETCH-LOGICAL-c433t-8bfa33e33579e5323b38c72e975493e5a291dcea9169336bfaf1ab87573826d33</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/831013$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,796,27922,27923,54756</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/831013$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Ong, V.K.S.</creatorcontrib><creatorcontrib>Lau, K.T.</creatorcontrib><creatorcontrib>Ma, J.G.</creatorcontrib><title>Theory of the single contact electron beam induced current effect</title><title>IEEE transactions on electron devices</title><addtitle>TED</addtitle><description>All publications on the single contact electron beam induced current (SC-EBIC) technique so far have been concerned with the application of the technique. This paper seeks to examine the theory behind the technique and supports it with experimental observation. It will be shown that the technique can be used, not only on electron and ion beam machines, but also on any scanning equipment that is capable of generating electron-hole pairs within a semiconductor device, e.g., with the use of a fine laser beam.</description><subject>Contact</subject><subject>Devices</subject><subject>Documents</subject><subject>Electron beam induced current</subject><subject>Ion beams</subject><subject>Laser beams</subject><subject>Scanning</subject><subject>Semiconductor devices</subject><issn>0018-9383</issn><issn>1557-9646</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2000</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNqN0TtPwzAUBWALgUR5DKxMEQOIISU313bssap4SZVYyhw5zg1NlSbFTob-e1ylYmAAvFjW-XQGH8auIJkCJPoB5FQhJIBHbAJCZLGWXB6zSZKAijUqPGVn3q_DU3KeTthsuaLO7aKuivoVRb5uPxqKbNf2xvYRNWR717VRQWYT1W05WCojOzhHbUirKsQX7KQyjafLw33O3p8el_OXePH2_DqfLWLLEftYFZVBJESRaRKYYoHKZinpTHCNJEyqobRkNEiNKIOuwBQqExmqVJaI5-xu7N267nMg3-eb2ltqGtNSN_hcA5ccExBB3v4qU51kiCD_hkoi1_wfjVk4kEKANz_guhtcG_4lV0qkYRmxb7sfkXWd946qfOvqjXG7HJJ8v2IOMh9XDPZ6tDURfbtD-AVFw5Qz</recordid><startdate>20000401</startdate><enddate>20000401</enddate><creator>Ong, V.K.S.</creator><creator>Lau, K.T.</creator><creator>Ma, J.G.</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope><scope>7U5</scope><scope>F28</scope><scope>FR3</scope></search><sort><creationdate>20000401</creationdate><title>Theory of the single contact electron beam induced current effect</title><author>Ong, V.K.S. ; Lau, K.T. ; Ma, J.G.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c433t-8bfa33e33579e5323b38c72e975493e5a291dcea9169336bfaf1ab87573826d33</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2000</creationdate><topic>Contact</topic><topic>Devices</topic><topic>Documents</topic><topic>Electron beam induced current</topic><topic>Ion beams</topic><topic>Laser beams</topic><topic>Scanning</topic><topic>Semiconductor devices</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Ong, V.K.S.</creatorcontrib><creatorcontrib>Lau, K.T.</creatorcontrib><creatorcontrib>Ma, J.G.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>ANTE: Abstracts in New Technology & Engineering</collection><collection>Engineering Research Database</collection><jtitle>IEEE transactions on electron devices</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Ong, V.K.S.</au><au>Lau, K.T.</au><au>Ma, J.G.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Theory of the single contact electron beam induced current effect</atitle><jtitle>IEEE transactions on electron devices</jtitle><stitle>TED</stitle><date>2000-04-01</date><risdate>2000</risdate><volume>47</volume><issue>4</issue><spage>897</spage><epage>899</epage><pages>897-899</pages><issn>0018-9383</issn><eissn>1557-9646</eissn><coden>IETDAI</coden><abstract>All publications on the single contact electron beam induced current (SC-EBIC) technique so far have been concerned with the application of the technique. This paper seeks to examine the theory behind the technique and supports it with experimental observation. It will be shown that the technique can be used, not only on electron and ion beam machines, but also on any scanning equipment that is capable of generating electron-hole pairs within a semiconductor device, e.g., with the use of a fine laser beam.</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/16.831013</doi><tpages>3</tpages><oa>free_for_read</oa></addata></record> |
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subjects | Contact Devices Documents Electron beam induced current Ion beams Laser beams Scanning Semiconductor devices |
title | Theory of the single contact electron beam induced current effect |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-10T00%3A33%3A24IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_RIE&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Theory%20of%20the%20single%20contact%20electron%20beam%20induced%20current%20effect&rft.jtitle=IEEE%20transactions%20on%20electron%20devices&rft.au=Ong,%20V.K.S.&rft.date=2000-04-01&rft.volume=47&rft.issue=4&rft.spage=897&rft.epage=899&rft.pages=897-899&rft.issn=0018-9383&rft.eissn=1557-9646&rft.coden=IETDAI&rft_id=info:doi/10.1109/16.831013&rft_dat=%3Cproquest_RIE%3E29073316%3C/proquest_RIE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=885231055&rft_id=info:pmid/&rft_ieee_id=831013&rfr_iscdi=true |