Schottky Barrier Rectifier Based on (100) \beta -Ga2O3 and its DC and AC Characteristics
A Schottky barrier rectifier was fabricated with a (100)-oriented \beta -Ga 2 O 3 substrate grown by the edge-defined film-fed method. The Sn-doped \beta -Ga 2 O 3 substrate had an effective donor concentration of approximately 2\times 10^{17} cm −3 . High performance parameters were obtained, s...
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Veröffentlicht in: | IEEE electron device letters 2018-04, Vol.39 (4), p.556-559 |
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Hauptverfasser: | , , , , , , , , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | A Schottky barrier rectifier was fabricated with a (100)-oriented \beta -Ga 2 O 3 substrate grown by the edge-defined film-fed method. The Sn-doped \beta -Ga 2 O 3 substrate had an effective donor concentration of approximately 2\times 10^{17} cm −3 . High performance parameters were obtained, such as a high forward current (421 A/cm 2 at 2 V), low ON-resistance (2.9 \text{m}\Omega \cdot cm 2 ), and short reverse recovery time (20 ns). Furthermore, the dynamic behavior of the device is characterized through test on the half-wave rectification of ac voltages at different frequency. The diode worked well at 100 kHz. At the end of the letter, we discuss how Ga 2 O 3 Schottky rectifier can operate at high frequency. |
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ISSN: | 0741-3106 |
DOI: | 10.1109/LED.2018.2810858 |