Control systems for the nanolithography process
The lithography process is the critical step in the fabrication of nanostructures for integrated circuit manufacturing. In this paper, a summary is presented of several projects applying control and signal processing techniques to lithography. We begin with a discussion of areas in the optical expos...
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| creator | Schaper, C.D. El-Awady, K. Tay, A. Kailath, T. |
| description | The lithography process is the critical step in the fabrication of nanostructures for integrated circuit manufacturing. In this paper, a summary is presented of several projects applying control and signal processing techniques to lithography. We begin with a discussion of areas in the optical exposure process where systems techniques make a significant difference. These areas include the optical mask preparation step where fast simulation methods and computational algorithms are used for mask design. Critical systems areas for next generation lithography are noted including nanopositioning by precision control of flexure systems and alignment by signal processing of laser interferometry strategies. A case study is then presented of temperature control for the postexposure bake step of sensitive chemically amplified photoresists used in deep-UV lithography. |
| doi_str_mv | 10.1109/CDC.1999.828016 |
| format | Conference Proceeding |
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In this paper, a summary is presented of several projects applying control and signal processing techniques to lithography. We begin with a discussion of areas in the optical exposure process where systems techniques make a significant difference. These areas include the optical mask preparation step where fast simulation methods and computational algorithms are used for mask design. Critical systems areas for next generation lithography are noted including nanopositioning by precision control of flexure systems and alignment by signal processing of laser interferometry strategies. A case study is then presented of temperature control for the postexposure bake step of sensitive chemically amplified photoresists used in deep-UV lithography.</description><identifier>ISSN: 0191-2216</identifier><identifier>ISBN: 9780780352506</identifier><identifier>ISBN: 0780352505</identifier><identifier>DOI: 10.1109/CDC.1999.828016</identifier><language>eng</language><publisher>IEEE</publisher><subject>Control systems ; Integrated circuit manufacture ; Lithography ; Nanolithography ; Nanostructures ; Optical device fabrication ; Optical interferometry ; Optical sensors ; Optical signal processing ; Signal processing algorithms</subject><ispartof>Proceedings of the 38th IEEE Conference on Decision and Control (Cat. 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No.99CH36304)</title><addtitle>CDC</addtitle><description>The lithography process is the critical step in the fabrication of nanostructures for integrated circuit manufacturing. In this paper, a summary is presented of several projects applying control and signal processing techniques to lithography. We begin with a discussion of areas in the optical exposure process where systems techniques make a significant difference. These areas include the optical mask preparation step where fast simulation methods and computational algorithms are used for mask design. Critical systems areas for next generation lithography are noted including nanopositioning by precision control of flexure systems and alignment by signal processing of laser interferometry strategies. A case study is then presented of temperature control for the postexposure bake step of sensitive chemically amplified photoresists used in deep-UV lithography.</description><subject>Control systems</subject><subject>Integrated circuit manufacture</subject><subject>Lithography</subject><subject>Nanolithography</subject><subject>Nanostructures</subject><subject>Optical device fabrication</subject><subject>Optical interferometry</subject><subject>Optical sensors</subject><subject>Optical signal processing</subject><subject>Signal processing algorithms</subject><issn>0191-2216</issn><isbn>9780780352506</isbn><isbn>0780352505</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>1999</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNotj09LwzAYhwM6cM6dBU_5Au3eN2n-HSXqFAZedh9JltpK15Skl357BxN-8FweHvgR8oxQI4LZ2TdbozGm1kwDyjuyNUrDdVwwAfKerAENVoyhfCCPpfwCgAYp12Rn0zjnNNCylDleCm1TpnMX6ejGNPRzl36ym7qFTjmFWMoTWbVuKHH7zw05frwf7Wd1-N5_2ddD1Ws1V2elnfHQmEaGhnMhuNECW-QcvFDOCUDvWy0dE8JfZRWAoY8QhGwa7QPfkJdbto8xnqbcX1xeTrd3_A91MkId</recordid><startdate>1999</startdate><enddate>1999</enddate><creator>Schaper, C.D.</creator><creator>El-Awady, K.</creator><creator>Tay, A.</creator><creator>Kailath, T.</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope></search><sort><creationdate>1999</creationdate><title>Control systems for the nanolithography process</title><author>Schaper, C.D. ; El-Awady, K. ; Tay, A. ; Kailath, T.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i87t-d78a9b04946c4335539851f1330b57aa501bbf86a255bd787c021be0c56448bc3</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>1999</creationdate><topic>Control systems</topic><topic>Integrated circuit manufacture</topic><topic>Lithography</topic><topic>Nanolithography</topic><topic>Nanostructures</topic><topic>Optical device fabrication</topic><topic>Optical interferometry</topic><topic>Optical sensors</topic><topic>Optical signal processing</topic><topic>Signal processing algorithms</topic><toplevel>online_resources</toplevel><creatorcontrib>Schaper, C.D.</creatorcontrib><creatorcontrib>El-Awady, K.</creatorcontrib><creatorcontrib>Tay, A.</creatorcontrib><creatorcontrib>Kailath, T.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Schaper, C.D.</au><au>El-Awady, K.</au><au>Tay, A.</au><au>Kailath, T.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Control systems for the nanolithography process</atitle><btitle>Proceedings of the 38th IEEE Conference on Decision and Control (Cat. No.99CH36304)</btitle><stitle>CDC</stitle><date>1999</date><risdate>1999</risdate><volume>4</volume><spage>4173</spage><epage>4178 vol.4</epage><pages>4173-4178 vol.4</pages><issn>0191-2216</issn><isbn>9780780352506</isbn><isbn>0780352505</isbn><abstract>The lithography process is the critical step in the fabrication of nanostructures for integrated circuit manufacturing. In this paper, a summary is presented of several projects applying control and signal processing techniques to lithography. We begin with a discussion of areas in the optical exposure process where systems techniques make a significant difference. These areas include the optical mask preparation step where fast simulation methods and computational algorithms are used for mask design. Critical systems areas for next generation lithography are noted including nanopositioning by precision control of flexure systems and alignment by signal processing of laser interferometry strategies. A case study is then presented of temperature control for the postexposure bake step of sensitive chemically amplified photoresists used in deep-UV lithography.</abstract><pub>IEEE</pub><doi>10.1109/CDC.1999.828016</doi></addata></record> |
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| ispartof | Proceedings of the 38th IEEE Conference on Decision and Control (Cat. No.99CH36304), 1999, Vol.4, p.4173-4178 vol.4 |
| issn | 0191-2216 |
| language | eng |
| recordid | cdi_ieee_primary_828016 |
| source | IEEE Electronic Library (IEL) Conference Proceedings |
| subjects | Control systems Integrated circuit manufacture Lithography Nanolithography Nanostructures Optical device fabrication Optical interferometry Optical sensors Optical signal processing Signal processing algorithms |
| title | Control systems for the nanolithography process |
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