Applications of control and signal processing to the microlithographic process

An overview is given describing applications of multivariable control, signal processing, optimization, modeling and computation to the lithography sequence. We discuss areas in the patterning process where mathematical methods can play a significant role including optical proximity correction, phas...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Schaper, C.D., Kailath, T., El-Awady, K., Tay, A.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Computational modeling Lithography Nanopositioning Optical control Optical design Optical polymers Optical signal processing Process control Resists Signal processing
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