Effects of Plasma Parameter on Morphological and Electrical Properties of Superconducting Nb-N Deposited by MO-PEALD

This paper describes the deposition of superconductive Nb-N thin films in a metal-organic plasma-enhanced atomic layer deposition process using (tert-butylimido)-tris (diethylamino)-niobium and hydrogen plasma as precursors. In extension of our previous work, which investigated the possibility to de...

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Veröffentlicht in:	IEEE transactions on applied superconductivity 2017-10, Vol.27 (7), p.1-7
Hauptverfasser:	Ziegler, Mario, Linzen, Sven, Goerke, Sebastian, Bruckner, Uwe, Plentz, Jonathan, Dellith, Jan, Himmerlich, Anja, Himmerlich, Marcel, Hubner, Uwe, Krischok, Stefan, Meyer, Hans-Georg
Format:	Artikel
Sprache:	eng
Schlagworte:	(tert-butylimido)-tris (diethylamino)-niobium (TBTDEN) Atomic layer deposition (ALD) critical current density Hydrogen niobium nitride Plasma temperature Substrates superconducting nanowire single photon detectors (SNSPD) Superconducting transition temperature superconductivity Temperature measurement
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