Efficient Layout Generation and Design Evaluation of Vertical Channel Devices

Vertical gate-all-around (VGAA) structure has been shown to be one of the most promising devices for the scaling beyond 10 nm for its reduced area, large driving current, and good gate control. Moreover, emerging devices such as heterojunction tunneling FETs are more amenable to vertical fabrication...

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Veröffentlicht in:	IEEE transactions on computer-aided design of integrated circuits and systems 2016-09, Vol.35 (9), p.1449-1460
Hauptverfasser:	Wei-Che Wang, Gupta, Puneet
Format:	Artikel
Sprache:	eng
Schlagworte:	Architecture Asymmetry Channels Computer aided design Computer architecture Contact Design analysis design rules Devices Diffusion FinFETs Layout layout optimization Logic gates Shape Symmetry technology assessment vertical channel device
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