Plasma-filled Ion Diode Experiments On PBFA-II

An Applied-B diode is used to generate a focussing light-ion beam on the PBFA-II accelerator at Sandia National Laboratories. This diode has an initial high-impedance phase, which can last up to 20 ns, during which the ions that form the beam are produced, and electron flow builds an electron sheath...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Renk, T.J., Johnston, R.R., Rochau, G.E., Desjarlais, M.R., Rosenthal, S.E., Lockner, T.R.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 163
container_issue
container_start_page 163
container_title
container_volume
creator Renk, T.J.
Johnston, R.R.
Rochau, G.E.
Desjarlais, M.R.
Rosenthal, S.E.
Lockner, T.R.
description An Applied-B diode is used to generate a focussing light-ion beam on the PBFA-II accelerator at Sandia National Laboratories. This diode has an initial high-impedance phase, which can last up to 20 ns, during which the ions that form the beam are produced, and electron flow builds an electron sheath that allows for enhanced ion emission. Because of this high impedance phase, current lags voltage in the diode. This impedance history also complicates the coupling of a Plasma Opening Switch (POS) to the diode, since the preferred load for a POS is one that reaches the desired impedance in less than 5 ns. One method of reducing the initial diode impedance is use of a plasma-filled load. A low density plasma prefill is supplied to the A-K gap prior to the power pulse arrival. Electrons from this plasma help to populate the electron sheath so that enhanced current flow can begin sooner. In addition, current flowing through this prefill can allow for magnetic insulation of the electron flow downstream of the opening POS to begin immediately, thus helping the POS to open more completely. MAGIC Applied-B diode simulations predict earlier ion current enhancement, and bigger dl/dt. Experiments on the LION accelerator at Cornell University using a prefilled Applied-B diode and a POS resulted in up to 80% more energy coupled to the load.
doi_str_mv 10.1109/PLASMA.1991.695655
format Conference Proceeding
fullrecord <record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_695655</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>695655</ieee_id><sourcerecordid>695655</sourcerecordid><originalsourceid>FETCH-LOGICAL-i87t-c5cd775d3bcfe237705af47d6d239889f6a57d766fa80b3fa8baf107aa0eaac73</originalsourceid><addsrcrecordid>eNotj8FqwzAQRAWl0JD6B3LSD9iVLEsrHd00aQ0OMTT3sLZWoOA4Icqh_fsa0mGYdxtmGFtJUUgp3FvX1t-7upDOycI4bbR-YpkDK2YrISuoXliW0knMqrQUpVuwohsxnTEPcRzJ8-Yy8Y948cQ3P1e6xTNN98T3E-_et3XeNK_sOeCYKPvnkh22m8P6K2_3n826bvNo4Z4PevAA2qt-CFQqAKExVOCNL5Wz1gWDGjwYE9CKXs3ZY5ACEAUhDqCWbPWojUR0vM478PZ7fHxSf_DKQP8</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Plasma-filled Ion Diode Experiments On PBFA-II</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Renk, T.J. ; Johnston, R.R. ; Rochau, G.E. ; Desjarlais, M.R. ; Rosenthal, S.E. ; Lockner, T.R.</creator><creatorcontrib>Renk, T.J. ; Johnston, R.R. ; Rochau, G.E. ; Desjarlais, M.R. ; Rosenthal, S.E. ; Lockner, T.R.</creatorcontrib><description>An Applied-B diode is used to generate a focussing light-ion beam on the PBFA-II accelerator at Sandia National Laboratories. This diode has an initial high-impedance phase, which can last up to 20 ns, during which the ions that form the beam are produced, and electron flow builds an electron sheath that allows for enhanced ion emission. Because of this high impedance phase, current lags voltage in the diode. This impedance history also complicates the coupling of a Plasma Opening Switch (POS) to the diode, since the preferred load for a POS is one that reaches the desired impedance in less than 5 ns. One method of reducing the initial diode impedance is use of a plasma-filled load. A low density plasma prefill is supplied to the A-K gap prior to the power pulse arrival. Electrons from this plasma help to populate the electron sheath so that enhanced current flow can begin sooner. In addition, current flowing through this prefill can allow for magnetic insulation of the electron flow downstream of the opening POS to begin immediately, thus helping the POS to open more completely. MAGIC Applied-B diode simulations predict earlier ion current enhancement, and bigger dl/dt. Experiments on the LION accelerator at Cornell University using a prefilled Applied-B diode and a POS resulted in up to 80% more energy coupled to the load.</description><identifier>ISBN: 9780780301474</identifier><identifier>ISBN: 0780301471</identifier><identifier>DOI: 10.1109/PLASMA.1991.695655</identifier><language>eng</language><publisher>IEEE</publisher><subject>Diodes ; Electrons ; Impedance ; Insulation ; Ion accelerators ; Laboratories ; Magnetic field measurement ; Plasma density ; Plasma measurements ; Plasma sheaths</subject><ispartof>IEEE Conference Record - Abstracts. 1991 IEEE International Conference on Plasma Science, 1991, p.163-163</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/695655$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,780,784,789,790,2058,4050,4051,27925,54920</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/695655$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Renk, T.J.</creatorcontrib><creatorcontrib>Johnston, R.R.</creatorcontrib><creatorcontrib>Rochau, G.E.</creatorcontrib><creatorcontrib>Desjarlais, M.R.</creatorcontrib><creatorcontrib>Rosenthal, S.E.</creatorcontrib><creatorcontrib>Lockner, T.R.</creatorcontrib><title>Plasma-filled Ion Diode Experiments On PBFA-II</title><title>IEEE Conference Record - Abstracts. 1991 IEEE International Conference on Plasma Science</title><addtitle>PLASMA</addtitle><description>An Applied-B diode is used to generate a focussing light-ion beam on the PBFA-II accelerator at Sandia National Laboratories. This diode has an initial high-impedance phase, which can last up to 20 ns, during which the ions that form the beam are produced, and electron flow builds an electron sheath that allows for enhanced ion emission. Because of this high impedance phase, current lags voltage in the diode. This impedance history also complicates the coupling of a Plasma Opening Switch (POS) to the diode, since the preferred load for a POS is one that reaches the desired impedance in less than 5 ns. One method of reducing the initial diode impedance is use of a plasma-filled load. A low density plasma prefill is supplied to the A-K gap prior to the power pulse arrival. Electrons from this plasma help to populate the electron sheath so that enhanced current flow can begin sooner. In addition, current flowing through this prefill can allow for magnetic insulation of the electron flow downstream of the opening POS to begin immediately, thus helping the POS to open more completely. MAGIC Applied-B diode simulations predict earlier ion current enhancement, and bigger dl/dt. Experiments on the LION accelerator at Cornell University using a prefilled Applied-B diode and a POS resulted in up to 80% more energy coupled to the load.</description><subject>Diodes</subject><subject>Electrons</subject><subject>Impedance</subject><subject>Insulation</subject><subject>Ion accelerators</subject><subject>Laboratories</subject><subject>Magnetic field measurement</subject><subject>Plasma density</subject><subject>Plasma measurements</subject><subject>Plasma sheaths</subject><isbn>9780780301474</isbn><isbn>0780301471</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>1991</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNotj8FqwzAQRAWl0JD6B3LSD9iVLEsrHd00aQ0OMTT3sLZWoOA4Icqh_fsa0mGYdxtmGFtJUUgp3FvX1t-7upDOycI4bbR-YpkDK2YrISuoXliW0knMqrQUpVuwohsxnTEPcRzJ8-Yy8Y948cQ3P1e6xTNN98T3E-_et3XeNK_sOeCYKPvnkh22m8P6K2_3n826bvNo4Z4PevAA2qt-CFQqAKExVOCNL5Wz1gWDGjwYE9CKXs3ZY5ACEAUhDqCWbPWojUR0vM478PZ7fHxSf_DKQP8</recordid><startdate>1991</startdate><enddate>1991</enddate><creator>Renk, T.J.</creator><creator>Johnston, R.R.</creator><creator>Rochau, G.E.</creator><creator>Desjarlais, M.R.</creator><creator>Rosenthal, S.E.</creator><creator>Lockner, T.R.</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>1991</creationdate><title>Plasma-filled Ion Diode Experiments On PBFA-II</title><author>Renk, T.J. ; Johnston, R.R. ; Rochau, G.E. ; Desjarlais, M.R. ; Rosenthal, S.E. ; Lockner, T.R.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i87t-c5cd775d3bcfe237705af47d6d239889f6a57d766fa80b3fa8baf107aa0eaac73</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>1991</creationdate><topic>Diodes</topic><topic>Electrons</topic><topic>Impedance</topic><topic>Insulation</topic><topic>Ion accelerators</topic><topic>Laboratories</topic><topic>Magnetic field measurement</topic><topic>Plasma density</topic><topic>Plasma measurements</topic><topic>Plasma sheaths</topic><toplevel>online_resources</toplevel><creatorcontrib>Renk, T.J.</creatorcontrib><creatorcontrib>Johnston, R.R.</creatorcontrib><creatorcontrib>Rochau, G.E.</creatorcontrib><creatorcontrib>Desjarlais, M.R.</creatorcontrib><creatorcontrib>Rosenthal, S.E.</creatorcontrib><creatorcontrib>Lockner, T.R.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library Online</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Renk, T.J.</au><au>Johnston, R.R.</au><au>Rochau, G.E.</au><au>Desjarlais, M.R.</au><au>Rosenthal, S.E.</au><au>Lockner, T.R.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Plasma-filled Ion Diode Experiments On PBFA-II</atitle><btitle>IEEE Conference Record - Abstracts. 1991 IEEE International Conference on Plasma Science</btitle><stitle>PLASMA</stitle><date>1991</date><risdate>1991</risdate><spage>163</spage><epage>163</epage><pages>163-163</pages><isbn>9780780301474</isbn><isbn>0780301471</isbn><abstract>An Applied-B diode is used to generate a focussing light-ion beam on the PBFA-II accelerator at Sandia National Laboratories. This diode has an initial high-impedance phase, which can last up to 20 ns, during which the ions that form the beam are produced, and electron flow builds an electron sheath that allows for enhanced ion emission. Because of this high impedance phase, current lags voltage in the diode. This impedance history also complicates the coupling of a Plasma Opening Switch (POS) to the diode, since the preferred load for a POS is one that reaches the desired impedance in less than 5 ns. One method of reducing the initial diode impedance is use of a plasma-filled load. A low density plasma prefill is supplied to the A-K gap prior to the power pulse arrival. Electrons from this plasma help to populate the electron sheath so that enhanced current flow can begin sooner. In addition, current flowing through this prefill can allow for magnetic insulation of the electron flow downstream of the opening POS to begin immediately, thus helping the POS to open more completely. MAGIC Applied-B diode simulations predict earlier ion current enhancement, and bigger dl/dt. Experiments on the LION accelerator at Cornell University using a prefilled Applied-B diode and a POS resulted in up to 80% more energy coupled to the load.</abstract><pub>IEEE</pub><doi>10.1109/PLASMA.1991.695655</doi><tpages>1</tpages></addata></record>
fulltext fulltext_linktorsrc
identifier ISBN: 9780780301474
ispartof IEEE Conference Record - Abstracts. 1991 IEEE International Conference on Plasma Science, 1991, p.163-163
issn
language eng
recordid cdi_ieee_primary_695655
source IEEE Electronic Library (IEL) Conference Proceedings
subjects Diodes
Electrons
Impedance
Insulation
Ion accelerators
Laboratories
Magnetic field measurement
Plasma density
Plasma measurements
Plasma sheaths
title Plasma-filled Ion Diode Experiments On PBFA-II
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-25T07%3A22%3A22IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Plasma-filled%20Ion%20Diode%20Experiments%20On%20PBFA-II&rft.btitle=IEEE%20Conference%20Record%20-%20Abstracts.%201991%20IEEE%20International%20Conference%20on%20Plasma%20Science&rft.au=Renk,%20T.J.&rft.date=1991&rft.spage=163&rft.epage=163&rft.pages=163-163&rft.isbn=9780780301474&rft.isbn_list=0780301471&rft_id=info:doi/10.1109/PLASMA.1991.695655&rft_dat=%3Cieee_6IE%3E695655%3C/ieee_6IE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=695655&rfr_iscdi=true