An Investigation Into the Role of Lead as a Suppressant for Tin Whisker Growth in Electronics
The effect on Sn electrodeposits of up to 10 wt.% codeposited Pb was investigated. The influence of Pb on cathodic polarization of the electrodeposition process, the microstructural and crystallographic characteristics of as-deposited films, the Sn-Cu intermetallic compound (IMC) formation between t...
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Veröffentlicht in: | IEEE transactions on components, packaging, and manufacturing technology (2011) packaging, and manufacturing technology (2011), 2014-04, Vol.4 (4), p.727-740 |
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description | The effect on Sn electrodeposits of up to 10 wt.% codeposited Pb was investigated. The influence of Pb on cathodic polarization of the electrodeposition process, the microstructural and crystallographic characteristics of as-deposited films, the Sn-Cu intermetallic compound (IMC) formation between the deposits and Cu substrate and surface oxidation after ambient storage were examined. During electrodeposition, the plumbous (Pb 2+ ) ions were observed to inhibit stannous (Sn 2+ ) ion reduction. The use of a metallographic cross sectioning approach enabled the observation of a grain structure evolution toward a more equiaxed morphology with increasing Pb content. This was accompanied by a duplex-phase structure consisting of isolated Pb-rich particles at grain boundary intersections together with a continuous Sn-rich phase. X-ray diffraction measurements corroborate the existence of the duplex-phase structure and also indicate an as-deposited texture transition from (112) through (200) and further toward (220) with an increase in Pb content from 0 to 8 wt.%. A marked topological transition of the interfacial Cu-Sn IMCs from wedge-shaped and discretely distributed to relatively even and uniformly distributed was found to occur concurrently. After tin whisker growth had occurred from low-Pb content (up to 5 wt.%) electrodeposits on brass, Pb was generally observed to be strongly associated with actual Sn whiskers themselves, thus the spontaneous redistribution of Pb after electrodeposition has been evidenced. X-ray photoelectron spectroscopy sputter profiling indicates the absence of Pb in the Sn oxide layer and the enrichment of metallic Pb beneath the Sn oxide from a 90Sn-10Pb deposit ambient stored for 270 days. The whisker-inhibiting effect of Pb codeposition is postulated to emanate from more than one source: not only those reflected in grain structure modification, grain texture transition, and changes in the growth mode of the interfacial Cu-Sn IMCs as prevailingly acknowledged, but also significantly, the universal distribution of the soft Pb-rich phase, providing simultaneous diffusion toward potential whisker sites as well as effective strain dissipation. |
doi_str_mv | 10.1109/TCPMT.2014.2302802 |
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The influence of Pb on cathodic polarization of the electrodeposition process, the microstructural and crystallographic characteristics of as-deposited films, the Sn-Cu intermetallic compound (IMC) formation between the deposits and Cu substrate and surface oxidation after ambient storage were examined. During electrodeposition, the plumbous (Pb 2+ ) ions were observed to inhibit stannous (Sn 2+ ) ion reduction. The use of a metallographic cross sectioning approach enabled the observation of a grain structure evolution toward a more equiaxed morphology with increasing Pb content. This was accompanied by a duplex-phase structure consisting of isolated Pb-rich particles at grain boundary intersections together with a continuous Sn-rich phase. X-ray diffraction measurements corroborate the existence of the duplex-phase structure and also indicate an as-deposited texture transition from (112) through (200) and further toward (220) with an increase in Pb content from 0 to 8 wt.%. A marked topological transition of the interfacial Cu-Sn IMCs from wedge-shaped and discretely distributed to relatively even and uniformly distributed was found to occur concurrently. After tin whisker growth had occurred from low-Pb content (up to 5 wt.%) electrodeposits on brass, Pb was generally observed to be strongly associated with actual Sn whiskers themselves, thus the spontaneous redistribution of Pb after electrodeposition has been evidenced. X-ray photoelectron spectroscopy sputter profiling indicates the absence of Pb in the Sn oxide layer and the enrichment of metallic Pb beneath the Sn oxide from a 90Sn-10Pb deposit ambient stored for 270 days. The whisker-inhibiting effect of Pb codeposition is postulated to emanate from more than one source: not only those reflected in grain structure modification, grain texture transition, and changes in the growth mode of the interfacial Cu-Sn IMCs as prevailingly acknowledged, but also significantly, the universal distribution of the soft Pb-rich phase, providing simultaneous diffusion toward potential whisker sites as well as effective strain dissipation.</description><identifier>ISSN: 2156-3950</identifier><identifier>EISSN: 2156-3985</identifier><identifier>DOI: 10.1109/TCPMT.2014.2302802</identifier><identifier>CODEN: ITCPC8</identifier><language>eng</language><publisher>Piscataway: IEEE</publisher><subject>Electrodeposit texture ; Intermetallic compounds ; intermetallics ; Lead ; lead diffusion ; Morphology ; Sn-Pb alloy electrodeposition ; Substrates ; Surface morphology ; surface oxides ; Surface treatment ; Tin ; tin whiskers</subject><ispartof>IEEE transactions on components, packaging, and manufacturing technology (2011), 2014-04, Vol.4 (4), p.727-740</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) Apr 2014</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c295t-ebc747cf0354a62dc06a76962fac4b994414a25adad83fb9769269066f2bd6923</citedby><cites>FETCH-LOGICAL-c295t-ebc747cf0354a62dc06a76962fac4b994414a25adad83fb9769269066f2bd6923</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/6734678$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,776,780,792,27901,27902,54733</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/6734678$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Jing Wang</creatorcontrib><creatorcontrib>Ashworth, Mark A.</creatorcontrib><creatorcontrib>Wilcox, Geoffrey D.</creatorcontrib><title>An Investigation Into the Role of Lead as a Suppressant for Tin Whisker Growth in Electronics</title><title>IEEE transactions on components, packaging, and manufacturing technology (2011)</title><addtitle>TCPMT</addtitle><description>The effect on Sn electrodeposits of up to 10 wt.% codeposited Pb was investigated. The influence of Pb on cathodic polarization of the electrodeposition process, the microstructural and crystallographic characteristics of as-deposited films, the Sn-Cu intermetallic compound (IMC) formation between the deposits and Cu substrate and surface oxidation after ambient storage were examined. During electrodeposition, the plumbous (Pb 2+ ) ions were observed to inhibit stannous (Sn 2+ ) ion reduction. The use of a metallographic cross sectioning approach enabled the observation of a grain structure evolution toward a more equiaxed morphology with increasing Pb content. This was accompanied by a duplex-phase structure consisting of isolated Pb-rich particles at grain boundary intersections together with a continuous Sn-rich phase. X-ray diffraction measurements corroborate the existence of the duplex-phase structure and also indicate an as-deposited texture transition from (112) through (200) and further toward (220) with an increase in Pb content from 0 to 8 wt.%. A marked topological transition of the interfacial Cu-Sn IMCs from wedge-shaped and discretely distributed to relatively even and uniformly distributed was found to occur concurrently. After tin whisker growth had occurred from low-Pb content (up to 5 wt.%) electrodeposits on brass, Pb was generally observed to be strongly associated with actual Sn whiskers themselves, thus the spontaneous redistribution of Pb after electrodeposition has been evidenced. X-ray photoelectron spectroscopy sputter profiling indicates the absence of Pb in the Sn oxide layer and the enrichment of metallic Pb beneath the Sn oxide from a 90Sn-10Pb deposit ambient stored for 270 days. The whisker-inhibiting effect of Pb codeposition is postulated to emanate from more than one source: not only those reflected in grain structure modification, grain texture transition, and changes in the growth mode of the interfacial Cu-Sn IMCs as prevailingly acknowledged, but also significantly, the universal distribution of the soft Pb-rich phase, providing simultaneous diffusion toward potential whisker sites as well as effective strain dissipation.</description><subject>Electrodeposit texture</subject><subject>Intermetallic compounds</subject><subject>intermetallics</subject><subject>Lead</subject><subject>lead diffusion</subject><subject>Morphology</subject><subject>Sn-Pb alloy electrodeposition</subject><subject>Substrates</subject><subject>Surface morphology</subject><subject>surface oxides</subject><subject>Surface treatment</subject><subject>Tin</subject><subject>tin whiskers</subject><issn>2156-3950</issn><issn>2156-3985</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2014</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNo9UE1LAzEQXUTBUvsH9BLwvDXf2RxLqbVQUXTFk4RsNrFb66YmqeK_d9eWzmXezLw3w7wsu0RwjBCUN-X08b4cY4joGBOIC4hPsgFGjOdEFuz0iBk8z0YxrmEXrIACkkH2NmnBov22MTXvOjW-r5IHaWXBk99Y4B1YWl0DHYEGz7vtNtgYdZuA8wGUTQteV038sAHMg_9JK9B1ZhtrUvBtY-JFdub0JtrRIQ-zl9tZOb3Llw_zxXSyzA2WLOW2MoIK4yBhVHNcG8i14JJjpw2tpKQUUY2ZrnVdEFfJboa5hJw7XNUdJsPser93G_zXrntGrf0utN1JhRhCgkkpehbes0zwMQbr1DY0nzr8KgRV76T6d1L1TqqDk53oai9qrLVHAReEclGQP0hvbmM</recordid><startdate>20140401</startdate><enddate>20140401</enddate><creator>Jing Wang</creator><creator>Ashworth, Mark A.</creator><creator>Wilcox, Geoffrey D.</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>F28</scope><scope>FR3</scope><scope>L7M</scope></search><sort><creationdate>20140401</creationdate><title>An Investigation Into the Role of Lead as a Suppressant for Tin Whisker Growth in Electronics</title><author>Jing Wang ; Ashworth, Mark A. ; Wilcox, Geoffrey D.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c295t-ebc747cf0354a62dc06a76962fac4b994414a25adad83fb9769269066f2bd6923</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2014</creationdate><topic>Electrodeposit texture</topic><topic>Intermetallic compounds</topic><topic>intermetallics</topic><topic>Lead</topic><topic>lead diffusion</topic><topic>Morphology</topic><topic>Sn-Pb alloy electrodeposition</topic><topic>Substrates</topic><topic>Surface morphology</topic><topic>surface oxides</topic><topic>Surface treatment</topic><topic>Tin</topic><topic>tin whiskers</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Jing Wang</creatorcontrib><creatorcontrib>Ashworth, Mark A.</creatorcontrib><creatorcontrib>Wilcox, Geoffrey D.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>ANTE: Abstracts in New Technology & Engineering</collection><collection>Engineering Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>IEEE transactions on components, packaging, and manufacturing technology (2011)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Jing Wang</au><au>Ashworth, Mark A.</au><au>Wilcox, Geoffrey D.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>An Investigation Into the Role of Lead as a Suppressant for Tin Whisker Growth in Electronics</atitle><jtitle>IEEE transactions on components, packaging, and manufacturing technology (2011)</jtitle><stitle>TCPMT</stitle><date>2014-04-01</date><risdate>2014</risdate><volume>4</volume><issue>4</issue><spage>727</spage><epage>740</epage><pages>727-740</pages><issn>2156-3950</issn><eissn>2156-3985</eissn><coden>ITCPC8</coden><abstract>The effect on Sn electrodeposits of up to 10 wt.% codeposited Pb was investigated. The influence of Pb on cathodic polarization of the electrodeposition process, the microstructural and crystallographic characteristics of as-deposited films, the Sn-Cu intermetallic compound (IMC) formation between the deposits and Cu substrate and surface oxidation after ambient storage were examined. During electrodeposition, the plumbous (Pb 2+ ) ions were observed to inhibit stannous (Sn 2+ ) ion reduction. The use of a metallographic cross sectioning approach enabled the observation of a grain structure evolution toward a more equiaxed morphology with increasing Pb content. This was accompanied by a duplex-phase structure consisting of isolated Pb-rich particles at grain boundary intersections together with a continuous Sn-rich phase. X-ray diffraction measurements corroborate the existence of the duplex-phase structure and also indicate an as-deposited texture transition from (112) through (200) and further toward (220) with an increase in Pb content from 0 to 8 wt.%. A marked topological transition of the interfacial Cu-Sn IMCs from wedge-shaped and discretely distributed to relatively even and uniformly distributed was found to occur concurrently. After tin whisker growth had occurred from low-Pb content (up to 5 wt.%) electrodeposits on brass, Pb was generally observed to be strongly associated with actual Sn whiskers themselves, thus the spontaneous redistribution of Pb after electrodeposition has been evidenced. X-ray photoelectron spectroscopy sputter profiling indicates the absence of Pb in the Sn oxide layer and the enrichment of metallic Pb beneath the Sn oxide from a 90Sn-10Pb deposit ambient stored for 270 days. The whisker-inhibiting effect of Pb codeposition is postulated to emanate from more than one source: not only those reflected in grain structure modification, grain texture transition, and changes in the growth mode of the interfacial Cu-Sn IMCs as prevailingly acknowledged, but also significantly, the universal distribution of the soft Pb-rich phase, providing simultaneous diffusion toward potential whisker sites as well as effective strain dissipation.</abstract><cop>Piscataway</cop><pub>IEEE</pub><doi>10.1109/TCPMT.2014.2302802</doi><tpages>14</tpages></addata></record> |
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subjects | Electrodeposit texture Intermetallic compounds intermetallics Lead lead diffusion Morphology Sn-Pb alloy electrodeposition Substrates Surface morphology surface oxides Surface treatment Tin tin whiskers |
title | An Investigation Into the Role of Lead as a Suppressant for Tin Whisker Growth in Electronics |
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