Process Optimization of Integrated SiCr Thin-Film Resistor for High-Performance Analog Circuits

We investigated the characteristic variation of an integrated thin-film resistor (TFR), which is composed of silicon chromium (SiCr), according to process conditions and its effects on analog circuits. To improve TFR properties, such as temperature coefficient of resistance (TCR) and mismatch, the i...

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Veröffentlicht in:	IEEE transactions on electron devices 2014-01, Vol.61 (1), p.8-14
Hauptverfasser:	Kwon, Young-Cheon, Seol, Hyeon-Cheon, Hong, Seong-Kwan, Kwon, Oh-Kyong
Format:	Artikel
Sprache:	eng
Schlagworte:	Annealing Etching Integrated thin-film resistor (TFR) low-pass filter (LPF) mismatch Resistance Resistors silicon chromium (SiCr) Sputtering temperature coefficient of resistance (TCR) Temperature measurement TFR TFR dummy pattern
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