Design for Manufacturing With Emerging Nanolithography

In this paper, we survey key design for manufacturing issues for extreme scaling with emerging nanolithography technologies, including double/multiple patterning lithography, extreme ultraviolet lithography, and electron-beam lithography. These nanolithography and nanopatterning technologies have di...

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Veröffentlicht in:	IEEE transactions on computer-aided design of integrated circuits and systems 2013-10, Vol.32 (10), p.1453-1472
Hauptverfasser:	Pan, D. Z., Bei Yu, Jhih-Rong Gao
Format:	Artikel
Sprache:	eng
Schlagworte:	Design engineering Design for manufacturing double patterning e-beam lithography (EBL) Electron beam lithography EUV lithography (EUVL) Integrated circuits Layout Lithography Logic gates multiple patterning Nanocomposites Nanolithography Nanomaterials Nanostructure Pattern matching physical design Ultraviolet sources Very large scale integration
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