Photocatalytic Titanium Oxide Film Deposition by Atmospheric TPCVD Using Air as the Working Gas

Thermal plasma chemical vapor deposition (TPCVD) is a rapid film deposition process using thermal plasma. Various functional material films, such as silicon carbide and titanium oxide ({\rm TiO}_{2}) , have been successfully deposited so far. In the case of oxide film deposition especially, film dep...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	IEEE transactions on plasma science 2013-08, Vol.41 (8), p.1850-1855
Hauptverfasser:	Ando, Yasutaka, Chen, Sheng Yuan, Noda, Yoshimasa
Format:	Artikel
Sprache:	eng
Schlagworte:	Anatase Chemical vapor deposition Photocatalysis Photovoltaic cells Plasma physics Silicon carbide solar cell Substrates Surface treatment thermal plasma CVD (TPCVD) thermal spray Titanium compounds titanium oxide
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!