A 3.3-V single power supply 16-Mb nonvolatile virtual DRAM using a NAND flash memory technology
A 3.3-V 16-Mb nonvolatile memory having operation virtually identical to DRAM with package pin compatibility has been developed. Read and write operations are fully DRAM compatible except for a longer RAS precharge time after write. Fast random access time of 63 ns with the NAND flash memory cell is...
Gespeichert in:
Veröffentlicht in: | IEEE journal of solid-state circuits 1997-11, Vol.32 (11), p.1748-1757 |
---|---|
Hauptverfasser: | , , , , , , , , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 1757 |
---|---|
container_issue | 11 |
container_start_page | 1748 |
container_title | IEEE journal of solid-state circuits |
container_volume | 32 |
creator | Tae-Sung Jung Do-Chan Choi Sung-Hee Cho Myong-Jae Kim Seung-Keun Lee Byung-Soon Choi Jin-Sun Yum San-Hong Kim Dong-Gi Lee Jong-Chang Son Myung-Sik Yong Heung-Kwun Oh Sung-Bu Jun Woung-Moo Lee Haq, E. Kang-Deog Suh Ali, S.B. Hyung-Kyu Lim |
description | A 3.3-V 16-Mb nonvolatile memory having operation virtually identical to DRAM with package pin compatibility has been developed. Read and write operations are fully DRAM compatible except for a longer RAS precharge time after write. Fast random access time of 63 ns with the NAND flash memory cell is achieved by using a hierarchical row decoder scheme and a unique folded bit-line architecture which also allows bit-by-bit program verify and inhibit operation. Fast page mode with a column address access time of 21 ns is achieved by sensing and latching 4 k cells simultaneously. To allow byte alterability, nonvolatile restore operation with self-contained erase is developed. Self-contained erase is word-line based, and increased cell disturb due to the word-line based erase is relaxed by adding a boosted bit-line scheme to a conventional self-boosting technique. The device is fabricated in a 0.5-/spl mu/m triple-well, p-substrate CMOS process using two-metal and three-poly interconnect layers. A resulting die size is 86.6 mm/sup 2/, and the effective cell size including the overhead of string select transistors is 2.0 /spl mu/m/sup 2/. |
doi_str_mv | 10.1109/4.641697 |
format | Article |
fullrecord | <record><control><sourceid>proquest_RIE</sourceid><recordid>TN_cdi_ieee_primary_641697</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>641697</ieee_id><sourcerecordid>28184917</sourcerecordid><originalsourceid>FETCH-LOGICAL-c372t-2dfe02ceb4875d067d0cc23dd4b551c9305788630dc6b714fc8b76672e48d6d53</originalsourceid><addsrcrecordid>eNqF0M9LwzAUB_AgCs4pePaUk3jpTJo0SY9l8xdsE0TFW2mTdKukTU3aSf97Ozu8eno8vp_3Dl8ALjGaYYziWzpjFLOYH4EJjiIRYE4-jsEEISyCOEToFJx5_zmslAo8AWkCyYwE79CX9cZo2Nhv7aDvmsb0ELNglcPa1jtrsrYc4l3p2i4zcPGSrGC3v4EZXCfrBSxM5rew0pV1PWy13NbW2E1_Dk6KzHh9cZhT8HZ_9zp_DJbPD0_zZBlIwsM2CFWhUSh1TgWPFGJcISlDohTNowjLmKCIC8EIUpLlHNNCipwzxkNNhWIqIlNwPf5tnP3qtG_TqvRSG5PV2nY-DYWIOR3K-B9iQeNfeDNC6az3Thdp48oqc32KUbqvOqXpWPVAr0Zaaq3_2CH8AZ7Sdvw</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>28184917</pqid></control><display><type>article</type><title>A 3.3-V single power supply 16-Mb nonvolatile virtual DRAM using a NAND flash memory technology</title><source>IEEE Electronic Library (IEL)</source><creator>Tae-Sung Jung ; Do-Chan Choi ; Sung-Hee Cho ; Myong-Jae Kim ; Seung-Keun Lee ; Byung-Soon Choi ; Jin-Sun Yum ; San-Hong Kim ; Dong-Gi Lee ; Jong-Chang Son ; Myung-Sik Yong ; Heung-Kwun Oh ; Sung-Bu Jun ; Woung-Moo Lee ; Haq, E. ; Kang-Deog Suh ; Ali, S.B. ; Hyung-Kyu Lim</creator><creatorcontrib>Tae-Sung Jung ; Do-Chan Choi ; Sung-Hee Cho ; Myong-Jae Kim ; Seung-Keun Lee ; Byung-Soon Choi ; Jin-Sun Yum ; San-Hong Kim ; Dong-Gi Lee ; Jong-Chang Son ; Myung-Sik Yong ; Heung-Kwun Oh ; Sung-Bu Jun ; Woung-Moo Lee ; Haq, E. ; Kang-Deog Suh ; Ali, S.B. ; Hyung-Kyu Lim</creatorcontrib><description>A 3.3-V 16-Mb nonvolatile memory having operation virtually identical to DRAM with package pin compatibility has been developed. Read and write operations are fully DRAM compatible except for a longer RAS precharge time after write. Fast random access time of 63 ns with the NAND flash memory cell is achieved by using a hierarchical row decoder scheme and a unique folded bit-line architecture which also allows bit-by-bit program verify and inhibit operation. Fast page mode with a column address access time of 21 ns is achieved by sensing and latching 4 k cells simultaneously. To allow byte alterability, nonvolatile restore operation with self-contained erase is developed. Self-contained erase is word-line based, and increased cell disturb due to the word-line based erase is relaxed by adding a boosted bit-line scheme to a conventional self-boosting technique. The device is fabricated in a 0.5-/spl mu/m triple-well, p-substrate CMOS process using two-metal and three-poly interconnect layers. A resulting die size is 86.6 mm/sup 2/, and the effective cell size including the overhead of string select transistors is 2.0 /spl mu/m/sup 2/.</description><identifier>ISSN: 0018-9200</identifier><identifier>EISSN: 1558-173X</identifier><identifier>DOI: 10.1109/4.641697</identifier><identifier>CODEN: IJSCBC</identifier><language>eng</language><publisher>IEEE</publisher><subject>Application software ; CMOS process ; Consumer electronics ; Decoding ; Flash memory ; Flash memory cells ; Nonvolatile memory ; Packaging ; Power supplies ; Random access memory</subject><ispartof>IEEE journal of solid-state circuits, 1997-11, Vol.32 (11), p.1748-1757</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c372t-2dfe02ceb4875d067d0cc23dd4b551c9305788630dc6b714fc8b76672e48d6d53</citedby><cites>FETCH-LOGICAL-c372t-2dfe02ceb4875d067d0cc23dd4b551c9305788630dc6b714fc8b76672e48d6d53</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/641697$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,776,780,792,27901,27902,54733</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/641697$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Tae-Sung Jung</creatorcontrib><creatorcontrib>Do-Chan Choi</creatorcontrib><creatorcontrib>Sung-Hee Cho</creatorcontrib><creatorcontrib>Myong-Jae Kim</creatorcontrib><creatorcontrib>Seung-Keun Lee</creatorcontrib><creatorcontrib>Byung-Soon Choi</creatorcontrib><creatorcontrib>Jin-Sun Yum</creatorcontrib><creatorcontrib>San-Hong Kim</creatorcontrib><creatorcontrib>Dong-Gi Lee</creatorcontrib><creatorcontrib>Jong-Chang Son</creatorcontrib><creatorcontrib>Myung-Sik Yong</creatorcontrib><creatorcontrib>Heung-Kwun Oh</creatorcontrib><creatorcontrib>Sung-Bu Jun</creatorcontrib><creatorcontrib>Woung-Moo Lee</creatorcontrib><creatorcontrib>Haq, E.</creatorcontrib><creatorcontrib>Kang-Deog Suh</creatorcontrib><creatorcontrib>Ali, S.B.</creatorcontrib><creatorcontrib>Hyung-Kyu Lim</creatorcontrib><title>A 3.3-V single power supply 16-Mb nonvolatile virtual DRAM using a NAND flash memory technology</title><title>IEEE journal of solid-state circuits</title><addtitle>JSSC</addtitle><description>A 3.3-V 16-Mb nonvolatile memory having operation virtually identical to DRAM with package pin compatibility has been developed. Read and write operations are fully DRAM compatible except for a longer RAS precharge time after write. Fast random access time of 63 ns with the NAND flash memory cell is achieved by using a hierarchical row decoder scheme and a unique folded bit-line architecture which also allows bit-by-bit program verify and inhibit operation. Fast page mode with a column address access time of 21 ns is achieved by sensing and latching 4 k cells simultaneously. To allow byte alterability, nonvolatile restore operation with self-contained erase is developed. Self-contained erase is word-line based, and increased cell disturb due to the word-line based erase is relaxed by adding a boosted bit-line scheme to a conventional self-boosting technique. The device is fabricated in a 0.5-/spl mu/m triple-well, p-substrate CMOS process using two-metal and three-poly interconnect layers. A resulting die size is 86.6 mm/sup 2/, and the effective cell size including the overhead of string select transistors is 2.0 /spl mu/m/sup 2/.</description><subject>Application software</subject><subject>CMOS process</subject><subject>Consumer electronics</subject><subject>Decoding</subject><subject>Flash memory</subject><subject>Flash memory cells</subject><subject>Nonvolatile memory</subject><subject>Packaging</subject><subject>Power supplies</subject><subject>Random access memory</subject><issn>0018-9200</issn><issn>1558-173X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1997</creationdate><recordtype>article</recordtype><recordid>eNqF0M9LwzAUB_AgCs4pePaUk3jpTJo0SY9l8xdsE0TFW2mTdKukTU3aSf97Ozu8eno8vp_3Dl8ALjGaYYziWzpjFLOYH4EJjiIRYE4-jsEEISyCOEToFJx5_zmslAo8AWkCyYwE79CX9cZo2Nhv7aDvmsb0ELNglcPa1jtrsrYc4l3p2i4zcPGSrGC3v4EZXCfrBSxM5rew0pV1PWy13NbW2E1_Dk6KzHh9cZhT8HZ_9zp_DJbPD0_zZBlIwsM2CFWhUSh1TgWPFGJcISlDohTNowjLmKCIC8EIUpLlHNNCipwzxkNNhWIqIlNwPf5tnP3qtG_TqvRSG5PV2nY-DYWIOR3K-B9iQeNfeDNC6az3Thdp48oqc32KUbqvOqXpWPVAr0Zaaq3_2CH8AZ7Sdvw</recordid><startdate>19971101</startdate><enddate>19971101</enddate><creator>Tae-Sung Jung</creator><creator>Do-Chan Choi</creator><creator>Sung-Hee Cho</creator><creator>Myong-Jae Kim</creator><creator>Seung-Keun Lee</creator><creator>Byung-Soon Choi</creator><creator>Jin-Sun Yum</creator><creator>San-Hong Kim</creator><creator>Dong-Gi Lee</creator><creator>Jong-Chang Son</creator><creator>Myung-Sik Yong</creator><creator>Heung-Kwun Oh</creator><creator>Sung-Bu Jun</creator><creator>Woung-Moo Lee</creator><creator>Haq, E.</creator><creator>Kang-Deog Suh</creator><creator>Ali, S.B.</creator><creator>Hyung-Kyu Lim</creator><general>IEEE</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope><scope>7U5</scope></search><sort><creationdate>19971101</creationdate><title>A 3.3-V single power supply 16-Mb nonvolatile virtual DRAM using a NAND flash memory technology</title><author>Tae-Sung Jung ; Do-Chan Choi ; Sung-Hee Cho ; Myong-Jae Kim ; Seung-Keun Lee ; Byung-Soon Choi ; Jin-Sun Yum ; San-Hong Kim ; Dong-Gi Lee ; Jong-Chang Son ; Myung-Sik Yong ; Heung-Kwun Oh ; Sung-Bu Jun ; Woung-Moo Lee ; Haq, E. ; Kang-Deog Suh ; Ali, S.B. ; Hyung-Kyu Lim</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c372t-2dfe02ceb4875d067d0cc23dd4b551c9305788630dc6b714fc8b76672e48d6d53</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1997</creationdate><topic>Application software</topic><topic>CMOS process</topic><topic>Consumer electronics</topic><topic>Decoding</topic><topic>Flash memory</topic><topic>Flash memory cells</topic><topic>Nonvolatile memory</topic><topic>Packaging</topic><topic>Power supplies</topic><topic>Random access memory</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Tae-Sung Jung</creatorcontrib><creatorcontrib>Do-Chan Choi</creatorcontrib><creatorcontrib>Sung-Hee Cho</creatorcontrib><creatorcontrib>Myong-Jae Kim</creatorcontrib><creatorcontrib>Seung-Keun Lee</creatorcontrib><creatorcontrib>Byung-Soon Choi</creatorcontrib><creatorcontrib>Jin-Sun Yum</creatorcontrib><creatorcontrib>San-Hong Kim</creatorcontrib><creatorcontrib>Dong-Gi Lee</creatorcontrib><creatorcontrib>Jong-Chang Son</creatorcontrib><creatorcontrib>Myung-Sik Yong</creatorcontrib><creatorcontrib>Heung-Kwun Oh</creatorcontrib><creatorcontrib>Sung-Bu Jun</creatorcontrib><creatorcontrib>Woung-Moo Lee</creatorcontrib><creatorcontrib>Haq, E.</creatorcontrib><creatorcontrib>Kang-Deog Suh</creatorcontrib><creatorcontrib>Ali, S.B.</creatorcontrib><creatorcontrib>Hyung-Kyu Lim</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Solid State and Superconductivity Abstracts</collection><jtitle>IEEE journal of solid-state circuits</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Tae-Sung Jung</au><au>Do-Chan Choi</au><au>Sung-Hee Cho</au><au>Myong-Jae Kim</au><au>Seung-Keun Lee</au><au>Byung-Soon Choi</au><au>Jin-Sun Yum</au><au>San-Hong Kim</au><au>Dong-Gi Lee</au><au>Jong-Chang Son</au><au>Myung-Sik Yong</au><au>Heung-Kwun Oh</au><au>Sung-Bu Jun</au><au>Woung-Moo Lee</au><au>Haq, E.</au><au>Kang-Deog Suh</au><au>Ali, S.B.</au><au>Hyung-Kyu Lim</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>A 3.3-V single power supply 16-Mb nonvolatile virtual DRAM using a NAND flash memory technology</atitle><jtitle>IEEE journal of solid-state circuits</jtitle><stitle>JSSC</stitle><date>1997-11-01</date><risdate>1997</risdate><volume>32</volume><issue>11</issue><spage>1748</spage><epage>1757</epage><pages>1748-1757</pages><issn>0018-9200</issn><eissn>1558-173X</eissn><coden>IJSCBC</coden><abstract>A 3.3-V 16-Mb nonvolatile memory having operation virtually identical to DRAM with package pin compatibility has been developed. Read and write operations are fully DRAM compatible except for a longer RAS precharge time after write. Fast random access time of 63 ns with the NAND flash memory cell is achieved by using a hierarchical row decoder scheme and a unique folded bit-line architecture which also allows bit-by-bit program verify and inhibit operation. Fast page mode with a column address access time of 21 ns is achieved by sensing and latching 4 k cells simultaneously. To allow byte alterability, nonvolatile restore operation with self-contained erase is developed. Self-contained erase is word-line based, and increased cell disturb due to the word-line based erase is relaxed by adding a boosted bit-line scheme to a conventional self-boosting technique. The device is fabricated in a 0.5-/spl mu/m triple-well, p-substrate CMOS process using two-metal and three-poly interconnect layers. A resulting die size is 86.6 mm/sup 2/, and the effective cell size including the overhead of string select transistors is 2.0 /spl mu/m/sup 2/.</abstract><pub>IEEE</pub><doi>10.1109/4.641697</doi><tpages>10</tpages></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | ISSN: 0018-9200 |
ispartof | IEEE journal of solid-state circuits, 1997-11, Vol.32 (11), p.1748-1757 |
issn | 0018-9200 1558-173X |
language | eng |
recordid | cdi_ieee_primary_641697 |
source | IEEE Electronic Library (IEL) |
subjects | Application software CMOS process Consumer electronics Decoding Flash memory Flash memory cells Nonvolatile memory Packaging Power supplies Random access memory |
title | A 3.3-V single power supply 16-Mb nonvolatile virtual DRAM using a NAND flash memory technology |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-02T11%3A00%3A16IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_RIE&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=A%203.3-V%20single%20power%20supply%2016-Mb%20nonvolatile%20virtual%20DRAM%20using%20a%20NAND%20flash%20memory%20technology&rft.jtitle=IEEE%20journal%20of%20solid-state%20circuits&rft.au=Tae-Sung%20Jung&rft.date=1997-11-01&rft.volume=32&rft.issue=11&rft.spage=1748&rft.epage=1757&rft.pages=1748-1757&rft.issn=0018-9200&rft.eissn=1558-173X&rft.coden=IJSCBC&rft_id=info:doi/10.1109/4.641697&rft_dat=%3Cproquest_RIE%3E28184917%3C/proquest_RIE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=28184917&rft_id=info:pmid/&rft_ieee_id=641697&rfr_iscdi=true |