Defect detection algorithm for wafer inspection based on laser scanning

A defect detection algorithm for wafer inspection based on laser scanning is presented. Microscopic anomalies, contaminants, and process induced pattern defects result in a two-dimensional (2-D) laser scattering signature, which closely resembles the coherent point-spread-function of the scanning la...

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Veröffentlicht in:	IEEE transactions on semiconductor manufacturing 1997-11, Vol.10 (4), p.459-468
Hauptverfasser:	Nikoonahad, M., Wayman, C.E., Biellak, S.A.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Design. Technologies. Operation analysis. Testing Detection algorithms Electronics Exact sciences and technology Inspection Integrated circuits Laser beams Light scattering Lighting Optical films Optical refraction Optical scattering Optical variables control Particle scattering Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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