Sensitivity improvement in FSI CIS using the M1ToP™ smart process technique
Using the W damascene process in the pixel area, M1Top pixel structure was developed. Because the M1Top pixel structure does not use the metal2 layer in the pixel block, total stack height becomes much thinner than normal pixels. From this new structure, sensitivity and QE in 1.75um pixels have been...
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creator | Manlyun Ha Sun Choi DongHun Cho Hosoo Kim Jungyeon Cho Youngsun Oh Jongman Kim Sangwon Yoon Changhoon Choi Juneseok Lee Juil Lee Joon Hwang |
description | Using the W damascene process in the pixel area, M1Top pixel structure was developed. Because the M1Top pixel structure does not use the metal2 layer in the pixel block, total stack height becomes much thinner than normal pixels. From this new structure, sensitivity and QE in 1.75um pixels have been improved by 50% from that of normal M2Top pixels in 0.11um CIS process. |
doi_str_mv | 10.1109/ISOCC.2012.6407104 |
format | Conference Proceeding |
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Because the M1Top pixel structure does not use the metal2 layer in the pixel block, total stack height becomes much thinner than normal pixels. From this new structure, sensitivity and QE in 1.75um pixels have been improved by 50% from that of normal M2Top pixels in 0.11um CIS process.</abstract><pub>IEEE</pub><doi>10.1109/ISOCC.2012.6407104</doi><tpages>3</tpages></addata></record> |
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identifier | ISBN: 1467329894 |
ispartof | 2012 International SoC Design Conference (ISOCC), 2012, p.317-319 |
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language | eng |
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source | IEEE Electronic Library (IEL) Conference Proceedings |
subjects | Angular Response Apertures Lenses Logic gates M1Top pixel M2Top pixel Metals Microoptics Optical sensors Sensitivity |
title | Sensitivity improvement in FSI CIS using the M1ToP™ smart process technique |
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