Sensitivity improvement in FSI CIS using the M1ToP™ smart process technique

Using the W damascene process in the pixel area, M1Top pixel structure was developed. Because the M1Top pixel structure does not use the metal2 layer in the pixel block, total stack height becomes much thinner than normal pixels. From this new structure, sensitivity and QE in 1.75um pixels have been...

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Hauptverfasser: Manlyun Ha, Sun Choi, DongHun Cho, Hosoo Kim, Jungyeon Cho, Youngsun Oh, Jongman Kim, Sangwon Yoon, Changhoon Choi, Juneseok Lee, Juil Lee, Joon Hwang
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creator Manlyun Ha
Sun Choi
DongHun Cho
Hosoo Kim
Jungyeon Cho
Youngsun Oh
Jongman Kim
Sangwon Yoon
Changhoon Choi
Juneseok Lee
Juil Lee
Joon Hwang
description Using the W damascene process in the pixel area, M1Top pixel structure was developed. Because the M1Top pixel structure does not use the metal2 layer in the pixel block, total stack height becomes much thinner than normal pixels. From this new structure, sensitivity and QE in 1.75um pixels have been improved by 50% from that of normal M2Top pixels in 0.11um CIS process.
doi_str_mv 10.1109/ISOCC.2012.6407104
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identifier ISBN: 1467329894
ispartof 2012 International SoC Design Conference (ISOCC), 2012, p.317-319
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subjects Angular Response
Apertures
Lenses
Logic gates
M1Top pixel
M2Top pixel
Metals
Microoptics
Optical sensors
Sensitivity
title Sensitivity improvement in FSI CIS using the M1ToP™ smart process technique
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