300-keV High-power ion-beam source: Practical applications

A 300-keV high-power ion-beam source has been evaluated. The results obtained are reported. An extra high-voltage pulse was applied to the anode to produce plasma of a certain species content. In particular, accelerator beam was used to prepare 0.01-1 m-thick metallic films.

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Bibliographische Detailangaben
Hauptverfasser:	Goncharov, O. I., Isakov, I. F., Kolodii, V. N., Matvienko, V. M., Opekunov, M. S., Remnev, G. E., Usov, Y. P., Zakutayev, A. N.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Ion beams Plasmas Rough surfaces Semiconductor diodes
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Beschreibung
Zusammenfassung:	A 300-keV high-power ion-beam source has been evaluated. The results obtained are reported. An extra high-voltage pulse was applied to the anode to produce plasma of a certain species content. In particular, accelerator beam was used to prepare 0.01-1 m-thick metallic films.