Optimization-based litho machine scheduling with load balancing and reticle expiration

The increasing demand for on-time delivery is forcing semiconductor manufacturers to seek more efficient schedules of machines and other resources to meet targets while making effective use of excess capacities. This paper presents the modeling and solution methodology of lithography machine schedul...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Bing Yan, Hsin Yuan Chen, Luh, P. B., Wang, Simon, Chang, J.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Job shop scheduling Linear programming Load management Load modeling Schedules Semiconductor device modeling Stacking
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