Doping of crystalline silicon solar cell by making use of atmospheric and sub-atmospheric plasma jet

Summary form only given. The doping process in the manufacturing of solar cell is to form a p-n junction by the injection of impurity materials into a silicon wafer. The elements of III or V group are used in the doping process during which the dopant materials are diffused thermally into the doping...

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Bibliographische Detailangaben

Hauptverfasser:	Junggil Kim, Junghyun Kim, Hanlim Kang, Myoungsoo Yun, Buil Jeon, Je Huan Koo, Gi-Chung Kwon, Guangsup Cho
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Doping Manufacturing Photovoltaic cells Plasmas Process control Silicon
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