Fast admittance computation for TSV arrays

A fast method to calculate the admittance matrix of Through Silicon Vias (TSVs) is proposed in this paper. The silicon dioxide layers are equivalently modelled using the bound charge on the conductor surfaces as well as on the dielectric interface between the silicon dioxide and the silicon regions....

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Dazhao Liu, Siming Pan, Achkir, B., Jun Fan
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A fast method to calculate the admittance matrix of Through Silicon Vias (TSVs) is proposed in this paper. The silicon dioxide layers are equivalently modelled using the bound charge on the conductor surfaces as well as on the dielectric interface between the silicon dioxide and the silicon regions. Unknown surface densities of both the free and bound charge are expanded using the axial harmonics. Galerkin's method is then applied to obtain the capacitance and conductance matrices. The proposed method is validated with a full-wave 2D cross-sectional analysis tool for a typical TSV pair structure. Comparisons with popular closed-form expressions are also discussed.
ISSN:2158-110X
2158-1118
DOI:10.1109/ISEMC.2012.6351755