A novel approach for modeling and simulation of a-Si/c-Si1−xGex/c-Si hetrostructure thin-film solar cells
Numerical simulation of a-Si/c-Si 1-x Ge x /c-Si hetrostructure was performed. Advanced modeling and simulation tools were used for this study. It was found that p-Si 1-x Ge x film can play a critical role to improve the light absorption properties of the design structure. Study was performed for va...
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creator | Khan, M. K. Ehsan, M. A. Keller, C. Dongming Mei |
description | Numerical simulation of a-Si/c-Si 1-x Ge x /c-Si hetrostructure was performed. Advanced modeling and simulation tools were used for this study. It was found that p-Si 1-x Ge x film can play a critical role to improve the light absorption properties of the design structure. Study was performed for varying thickness of Si 1-x Ge x alloyed layer, where, Ge composition was kept constant ~10% throughout. An approach relying on the phenomena of improved absorption properties that corresponds to the gain in the short-circuit current was explored. Numerical results showed that for p-Si 1-x Ge x thickness ~5°m, n + and p + doping concentrations ~2×10 19 cm -3 and ~2×10 18 cm -3 , an efficiency ~19.07% was obtained. |
doi_str_mv | 10.1109/PVSC.2012.6317979 |
format | Conference Proceeding |
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A. ; Keller, C. ; Dongming Mei</creator><creatorcontrib>Khan, M. K. ; Ehsan, M. A. ; Keller, C. ; Dongming Mei</creatorcontrib><description>Numerical simulation of a-Si/c-Si 1-x Ge x /c-Si hetrostructure was performed. Advanced modeling and simulation tools were used for this study. It was found that p-Si 1-x Ge x film can play a critical role to improve the light absorption properties of the design structure. Study was performed for varying thickness of Si 1-x Ge x alloyed layer, where, Ge composition was kept constant ~10% throughout. An approach relying on the phenomena of improved absorption properties that corresponds to the gain in the short-circuit current was explored. Numerical results showed that for p-Si 1-x Ge x thickness ~5°m, n + and p + doping concentrations ~2×10 19 cm -3 and ~2×10 18 cm -3 , an efficiency ~19.07% was obtained.</description><identifier>ISSN: 0160-8371</identifier><identifier>ISBN: 9781467300643</identifier><identifier>ISBN: 1467300640</identifier><identifier>EISBN: 1467300667</identifier><identifier>EISBN: 1467300659</identifier><identifier>EISBN: 9781467300650</identifier><identifier>EISBN: 9781467300667</identifier><identifier>DOI: 10.1109/PVSC.2012.6317979</identifier><language>eng</language><publisher>IEEE</publisher><subject>dark current ; Indexes ; multi-junction ; nanotechnologies ; number of junctions ; optical confinement ; photovoltaic ; Radiative recombination ; short circuit current ; Silicon</subject><ispartof>2012 38th IEEE Photovoltaic Specialists Conference, 2012, p.001958-001962</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/6317979$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,780,784,789,790,2058,27925,54920</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/6317979$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Khan, M. 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Numerical results showed that for p-Si 1-x Ge x thickness ~5°m, n + and p + doping concentrations ~2×10 19 cm -3 and ~2×10 18 cm -3 , an efficiency ~19.07% was obtained.</description><subject>dark current</subject><subject>Indexes</subject><subject>multi-junction</subject><subject>nanotechnologies</subject><subject>number of junctions</subject><subject>optical confinement</subject><subject>photovoltaic</subject><subject>Radiative recombination</subject><subject>short circuit current</subject><subject>Silicon</subject><issn>0160-8371</issn><isbn>9781467300643</isbn><isbn>1467300640</isbn><isbn>1467300667</isbn><isbn>1467300659</isbn><isbn>9781467300650</isbn><isbn>9781467300667</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2012</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNp9j01OwzAQRo0oEm3pARCbuUDSmbiymyWq-FkiFbGtrHRCDI4d2Q4qN2DNETkJCJUtm_fp6Vs9IS4JSyKslw9P201ZIVWlkqRrXZ-IGa2UlohK6VOxqPX6z1dyIqZICou11HQuZim9IFYoFU3F6zX48MYOzDDEYJoO2hChD3t21j-D8XtIth-dyTZ4CC2YYmuXzQ_o6-PzcMeHX4GOcwwpx7HJY2TInfVFa10PKTgToWHn0oU4a41LvDjuXFzd3jxu7gvLzLsh2t7E990xSP7_fgPOzUz8</recordid><startdate>201206</startdate><enddate>201206</enddate><creator>Khan, M. 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A. ; Keller, C. ; Dongming Mei</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-ieee_primary_63179793</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2012</creationdate><topic>dark current</topic><topic>Indexes</topic><topic>multi-junction</topic><topic>nanotechnologies</topic><topic>number of junctions</topic><topic>optical confinement</topic><topic>photovoltaic</topic><topic>Radiative recombination</topic><topic>short circuit current</topic><topic>Silicon</topic><toplevel>online_resources</toplevel><creatorcontrib>Khan, M. K.</creatorcontrib><creatorcontrib>Ehsan, M. A.</creatorcontrib><creatorcontrib>Keller, C.</creatorcontrib><creatorcontrib>Dongming Mei</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Khan, M. K.</au><au>Ehsan, M. A.</au><au>Keller, C.</au><au>Dongming Mei</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>A novel approach for modeling and simulation of a-Si/c-Si1−xGex/c-Si hetrostructure thin-film solar cells</atitle><btitle>2012 38th IEEE Photovoltaic Specialists Conference</btitle><stitle>PVSC</stitle><date>2012-06</date><risdate>2012</risdate><spage>001958</spage><epage>001962</epage><pages>001958-001962</pages><issn>0160-8371</issn><isbn>9781467300643</isbn><isbn>1467300640</isbn><eisbn>1467300667</eisbn><eisbn>1467300659</eisbn><eisbn>9781467300650</eisbn><eisbn>9781467300667</eisbn><abstract>Numerical simulation of a-Si/c-Si 1-x Ge x /c-Si hetrostructure was performed. Advanced modeling and simulation tools were used for this study. It was found that p-Si 1-x Ge x film can play a critical role to improve the light absorption properties of the design structure. Study was performed for varying thickness of Si 1-x Ge x alloyed layer, where, Ge composition was kept constant ~10% throughout. An approach relying on the phenomena of improved absorption properties that corresponds to the gain in the short-circuit current was explored. Numerical results showed that for p-Si 1-x Ge x thickness ~5°m, n + and p + doping concentrations ~2×10 19 cm -3 and ~2×10 18 cm -3 , an efficiency ~19.07% was obtained.</abstract><pub>IEEE</pub><doi>10.1109/PVSC.2012.6317979</doi></addata></record> |
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subjects | dark current Indexes multi-junction nanotechnologies number of junctions optical confinement photovoltaic Radiative recombination short circuit current Silicon |
title | A novel approach for modeling and simulation of a-Si/c-Si1−xGex/c-Si hetrostructure thin-film solar cells |
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