Fabrication and electrical properties of 0.9PMN-0.1PT MIM capacitors

This paper describes the fabrication and characterization of 0.9PMN-0.1PT MIM capacitors with platinum electrodes. The films have been deposited by Pulsed Laser Deposition (PLD) on a buffer layer (SrRuO 3 ) which has been demonstrated to be essential to enhance the growth of PMN-PT instead of pyroch...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Leuliet, A., Jamond, N., Bisaro, R., Garry, G., Pham-Thi, M., Ziaei, A., Michalas, L., Koutsoureli, M., Papaioannou, G.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	0.9PMN-0.1PT Buffer layers Current measurement Electrodes MIM capacitors Platinum PLD high k dielectric film Pulsed laser deposition Schottky barrier Temperature
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