Low loss waveguide integration within a thin-SOI CMOS foundry

By requiring zero process changes and by complying with established electronic circuit design rules, photonic devices formed with 3dB/cm waveguides were fabricated alongside transistors achieving 4ps stage delay in a 45nm thin-SOI CMOS foundry.

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Hauptverfasser:	Orcutt, J. S., Moss, B., Chen Sun, Leu, J., Georgas, M., Urosevic, S., Hanqing Li, Jie Sun, Weaver, M., Zgraggen, E., Ram, R. J., Stojanovic, V., Shainline, J., Popovic, M.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	CMOS integrated circuits CMOS process CMOS technology Foundries Optical waveguides Photonics Silicon Transistors
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creator	Orcutt, J. S. Moss, B. Chen Sun Leu, J. Georgas, M. Urosevic, S. Hanqing Li Jie Sun Weaver, M. Zgraggen, E. Ram, R. J. Stojanovic, V. Shainline, J. Popovic, M.
description	By requiring zero process changes and by complying with established electronic circuit design rules, photonic devices formed with 3dB/cm waveguides were fabricated alongside transistors achieving 4ps stage delay in a 45nm thin-SOI CMOS foundry.
doi_str_mv	10.1109/OIC.2012.6224465
format	Conference Proceeding
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subjects	CMOS integrated circuits CMOS process CMOS technology Foundries Optical waveguides Photonics Silicon Transistors
title	Low loss waveguide integration within a thin-SOI CMOS foundry
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