Generation of intense pulsed heavy ion beam by By type magnetically insulated ion diode with active ion source
Intense pulsed heavy ion beam (PHIB) of ion current density more than several tens of A/cm 2 can be applied to materials processes. To apply PHIB to materials processes purity of the beam is very important. For the purpose a new type of ion beam diode was developed. In the diode a new acceleration g...
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creator | Masugata, K. Tejima, R. Kawai, J. Kitamura, I. Tanoue, H. Arai, K. |
description | Intense pulsed heavy ion beam (PHIB) of ion current density more than several tens of A/cm 2 can be applied to materials processes. To apply PHIB to materials processes purity of the beam is very important. For the purpose a new type of ion beam diode was developed. In the diode a new acceleration gap configuration is used with active ion source of pulsed plasma guns. Two types of plasma guns were developed to generate variety of ion beams, i. e. a gas puff plasma gun and a vacuum arc ion source. With the gas puff plasma gun, source plasma of nitrogen ions was produced. The current density of the plasma was evaluated to be ≈28 A/cm 2 at 90 mm downstream from the top of the plasma gun. The plasma was injected into the acceleration gap of the diode and the ion diode was successfully operated at diode voltage ≈200 kV, diode current ≈2.0 kA, pulse duration ~150 ns. Ion beam of ion current density ~13 A/cm 2 was obtained at 55 mm downstream from the anode. The energy and species of the beam was evaluated by a Thomson parabola spectrometer and found that N + and N 2+ beam of energy 60-300 keV were accelerated with impurity of protons of energy 60-150 keV. The purity of the beam was estimated to be 87 %. To generate metallic ions vacuum arc plasma gun was developed. The characteristics of the plasma gun were evaluated and source plasma of current density 8 A/cm 2 , plasma drift velocity 4.7 × 10 4 m/s was found to be obtained. |
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To apply PHIB to materials processes purity of the beam is very important. For the purpose a new type of ion beam diode was developed. In the diode a new acceleration gap configuration is used with active ion source of pulsed plasma guns. Two types of plasma guns were developed to generate variety of ion beams, i. e. a gas puff plasma gun and a vacuum arc ion source. With the gas puff plasma gun, source plasma of nitrogen ions was produced. The current density of the plasma was evaluated to be ≈28 A/cm 2 at 90 mm downstream from the top of the plasma gun. The plasma was injected into the acceleration gap of the diode and the ion diode was successfully operated at diode voltage ≈200 kV, diode current ≈2.0 kA, pulse duration ~150 ns. Ion beam of ion current density ~13 A/cm 2 was obtained at 55 mm downstream from the anode. The energy and species of the beam was evaluated by a Thomson parabola spectrometer and found that N + and N 2+ beam of energy 60-300 keV were accelerated with impurity of protons of energy 60-150 keV. The purity of the beam was estimated to be 87 %. To generate metallic ions vacuum arc plasma gun was developed. The characteristics of the plasma gun were evaluated and source plasma of current density 8 A/cm 2 , plasma drift velocity 4.7 × 10 4 m/s was found to be obtained.</description><identifier>ISBN: 9785879110883</identifier><identifier>ISBN: 5879110885</identifier><language>eng</language><publisher>IEEE</publisher><subject>Anodes ; Cathodes ; Coaxial cables</subject><ispartof>2004 International Conference on High-Power Particle Beams (BEAMS 2004), 2004, p.267-270</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/6220536$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,780,784,789,790,2058,54920</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/6220536$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Masugata, K.</creatorcontrib><creatorcontrib>Tejima, R.</creatorcontrib><creatorcontrib>Kawai, J.</creatorcontrib><creatorcontrib>Kitamura, I.</creatorcontrib><creatorcontrib>Tanoue, H.</creatorcontrib><creatorcontrib>Arai, K.</creatorcontrib><title>Generation of intense pulsed heavy ion beam by By type magnetically insulated ion diode with active ion source</title><title>2004 International Conference on High-Power Particle Beams (BEAMS 2004)</title><addtitle>BEAMS</addtitle><description>Intense pulsed heavy ion beam (PHIB) of ion current density more than several tens of A/cm 2 can be applied to materials processes. To apply PHIB to materials processes purity of the beam is very important. For the purpose a new type of ion beam diode was developed. In the diode a new acceleration gap configuration is used with active ion source of pulsed plasma guns. Two types of plasma guns were developed to generate variety of ion beams, i. e. a gas puff plasma gun and a vacuum arc ion source. With the gas puff plasma gun, source plasma of nitrogen ions was produced. The current density of the plasma was evaluated to be ≈28 A/cm 2 at 90 mm downstream from the top of the plasma gun. The plasma was injected into the acceleration gap of the diode and the ion diode was successfully operated at diode voltage ≈200 kV, diode current ≈2.0 kA, pulse duration ~150 ns. Ion beam of ion current density ~13 A/cm 2 was obtained at 55 mm downstream from the anode. The energy and species of the beam was evaluated by a Thomson parabola spectrometer and found that N + and N 2+ beam of energy 60-300 keV were accelerated with impurity of protons of energy 60-150 keV. The purity of the beam was estimated to be 87 %. To generate metallic ions vacuum arc plasma gun was developed. The characteristics of the plasma gun were evaluated and source plasma of current density 8 A/cm 2 , plasma drift velocity 4.7 × 10 4 m/s was found to be obtained.</description><subject>Anodes</subject><subject>Cathodes</subject><subject>Coaxial cables</subject><isbn>9785879110883</isbn><isbn>5879110885</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2004</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNp9jE0OgjAUhJsYE41yAjfvAiYFApStxp8DuCcPeEhNKaQtmN5eMK5dTTLfN7NiQZ6JRGR5GHIh4g0LrH1xzsM8zWIRbZm-kSaDTvYa-gakdqQtwTAqSzW0hJOHhZWEHZQeTh6cHwg6fGpyskKlZkHbUaGbB4tay74meEvXAlZOTvRtbT-aivZs3eB8Hfxyxw7Xy-N8P0oiKgYjOzS-SKOIJ3Ea_6cfciRFOQ</recordid><startdate>200407</startdate><enddate>200407</enddate><creator>Masugata, K.</creator><creator>Tejima, R.</creator><creator>Kawai, J.</creator><creator>Kitamura, I.</creator><creator>Tanoue, H.</creator><creator>Arai, K.</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>200407</creationdate><title>Generation of intense pulsed heavy ion beam by By type magnetically insulated ion diode with active ion source</title><author>Masugata, K. ; Tejima, R. ; Kawai, J. ; Kitamura, I. ; Tanoue, H. ; Arai, K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-ieee_primary_62205363</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2004</creationdate><topic>Anodes</topic><topic>Cathodes</topic><topic>Coaxial cables</topic><toplevel>online_resources</toplevel><creatorcontrib>Masugata, K.</creatorcontrib><creatorcontrib>Tejima, R.</creatorcontrib><creatorcontrib>Kawai, J.</creatorcontrib><creatorcontrib>Kitamura, I.</creatorcontrib><creatorcontrib>Tanoue, H.</creatorcontrib><creatorcontrib>Arai, K.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Masugata, K.</au><au>Tejima, R.</au><au>Kawai, J.</au><au>Kitamura, I.</au><au>Tanoue, H.</au><au>Arai, K.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Generation of intense pulsed heavy ion beam by By type magnetically insulated ion diode with active ion source</atitle><btitle>2004 International Conference on High-Power Particle Beams (BEAMS 2004)</btitle><stitle>BEAMS</stitle><date>2004-07</date><risdate>2004</risdate><spage>267</spage><epage>270</epage><pages>267-270</pages><isbn>9785879110883</isbn><isbn>5879110885</isbn><abstract>Intense pulsed heavy ion beam (PHIB) of ion current density more than several tens of A/cm 2 can be applied to materials processes. To apply PHIB to materials processes purity of the beam is very important. For the purpose a new type of ion beam diode was developed. In the diode a new acceleration gap configuration is used with active ion source of pulsed plasma guns. Two types of plasma guns were developed to generate variety of ion beams, i. e. a gas puff plasma gun and a vacuum arc ion source. With the gas puff plasma gun, source plasma of nitrogen ions was produced. The current density of the plasma was evaluated to be ≈28 A/cm 2 at 90 mm downstream from the top of the plasma gun. The plasma was injected into the acceleration gap of the diode and the ion diode was successfully operated at diode voltage ≈200 kV, diode current ≈2.0 kA, pulse duration ~150 ns. Ion beam of ion current density ~13 A/cm 2 was obtained at 55 mm downstream from the anode. The energy and species of the beam was evaluated by a Thomson parabola spectrometer and found that N + and N 2+ beam of energy 60-300 keV were accelerated with impurity of protons of energy 60-150 keV. The purity of the beam was estimated to be 87 %. To generate metallic ions vacuum arc plasma gun was developed. The characteristics of the plasma gun were evaluated and source plasma of current density 8 A/cm 2 , plasma drift velocity 4.7 × 10 4 m/s was found to be obtained.</abstract><pub>IEEE</pub></addata></record> |
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ispartof | 2004 International Conference on High-Power Particle Beams (BEAMS 2004), 2004, p.267-270 |
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language | eng |
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source | IEEE Electronic Library (IEL) Conference Proceedings |
subjects | Anodes Cathodes Coaxial cables |
title | Generation of intense pulsed heavy ion beam by By type magnetically insulated ion diode with active ion source |
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