Base transit time of a heterojunction bipolar transistor (HBT) with Gaussian doped base under high-level of injection
Base transit time for an npn SiGe HBT has been analysed assuming Gaussian doped base considering doping dependent mobility. Band-gap narrowing (BGN) effects due to heavy doping, due to presence of Germanium and due to change in the density of states (DOS) have also been considered. The presence of G...
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creator | Islam, S. M. Moududul Chowdhury, M. I. B. Arafat, Y. Khan, M. Z. R. |
description | Base transit time for an npn SiGe HBT has been analysed assuming Gaussian doped base considering doping dependent mobility. Band-gap narrowing (BGN) effects due to heavy doping, due to presence of Germanium and due to change in the density of states (DOS) have also been considered. The presence of Ge has been incorporated by using a different saturation velocity for the SiGe alloy. A generalized profile for Ge mole fraction distribution is used, where Ge profile variation has been illustrated by varying a single parameter for box, trapezoidal and triangular forms. Base transit time of SiGe HBT has been calculated for these three Ge profiles under high level of injection. |
doi_str_mv | 10.1109/ICDCSyst.2012.6188685 |
format | Conference Proceeding |
fullrecord | <record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_6188685</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>6188685</ieee_id><sourcerecordid>6188685</sourcerecordid><originalsourceid>FETCH-LOGICAL-i90t-aa558262fbca9c5a5f8b0a7a5111863007d8d51edca95255ae9405689482afaa3</originalsourceid><addsrcrecordid>eNo1kEFLw0AQhVdEUGt-gQh71EPqbpJJNkebalsoeDD3MkkmZkOalN2N0n9vqnVgeDze8MEbxh6kmEsp0udNtsw-jtbNAyGDeSyVihVcMC9NlIwgSSREcXTJbv8NJNfMs7YV0yQinPaGjQu0xJ3B3mrHnd4TH2qOvCFHZmjHvnR66HmhD0OH5nxo3WD443qRP_Fv7Rq-wtFajT2vhgNVvDghx74iwxv92fgdfVF3wuq-pV_eHbuqsbPknXXG8rfXPFv72_fVJnvZ-joVzkcEUEEc1EWJaQkItSoEJghSShWHU4lKVSCpmmIIAJDSSECs0kgFWCOGM3b_h9VEtDsYvUdz3J0fFf4AXhhe9w</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Base transit time of a heterojunction bipolar transistor (HBT) with Gaussian doped base under high-level of injection</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Islam, S. M. Moududul ; Chowdhury, M. I. B. ; Arafat, Y. ; Khan, M. Z. R.</creator><creatorcontrib>Islam, S. M. Moududul ; Chowdhury, M. I. B. ; Arafat, Y. ; Khan, M. Z. R.</creatorcontrib><description>Base transit time for an npn SiGe HBT has been analysed assuming Gaussian doped base considering doping dependent mobility. Band-gap narrowing (BGN) effects due to heavy doping, due to presence of Germanium and due to change in the density of states (DOS) have also been considered. The presence of Ge has been incorporated by using a different saturation velocity for the SiGe alloy. A generalized profile for Ge mole fraction distribution is used, where Ge profile variation has been illustrated by varying a single parameter for box, trapezoidal and triangular forms. Base transit time of SiGe HBT has been calculated for these three Ge profiles under high level of injection.</description><identifier>ISBN: 1457715457</identifier><identifier>ISBN: 9781457715457</identifier><identifier>EISBN: 9781457715464</identifier><identifier>EISBN: 9781457715440</identifier><identifier>EISBN: 1457715449</identifier><identifier>EISBN: 1457715430</identifier><identifier>EISBN: 1457715465</identifier><identifier>EISBN: 9781457715433</identifier><identifier>DOI: 10.1109/ICDCSyst.2012.6188685</identifier><language>eng</language><publisher>IEEE</publisher><subject>Band gap narrowing ; Base transit time ; Density of states ; Gaussian doping ; HBT</subject><ispartof>2012 International Conference on Devices, Circuits and Systems (ICDCS), 2012, p.114-118</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/6188685$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,776,780,785,786,2052,27902,54895</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/6188685$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Islam, S. M. Moududul</creatorcontrib><creatorcontrib>Chowdhury, M. I. B.</creatorcontrib><creatorcontrib>Arafat, Y.</creatorcontrib><creatorcontrib>Khan, M. Z. R.</creatorcontrib><title>Base transit time of a heterojunction bipolar transistor (HBT) with Gaussian doped base under high-level of injection</title><title>2012 International Conference on Devices, Circuits and Systems (ICDCS)</title><addtitle>ICDCSyst</addtitle><description>Base transit time for an npn SiGe HBT has been analysed assuming Gaussian doped base considering doping dependent mobility. Band-gap narrowing (BGN) effects due to heavy doping, due to presence of Germanium and due to change in the density of states (DOS) have also been considered. The presence of Ge has been incorporated by using a different saturation velocity for the SiGe alloy. A generalized profile for Ge mole fraction distribution is used, where Ge profile variation has been illustrated by varying a single parameter for box, trapezoidal and triangular forms. Base transit time of SiGe HBT has been calculated for these three Ge profiles under high level of injection.</description><subject>Band gap narrowing</subject><subject>Base transit time</subject><subject>Density of states</subject><subject>Gaussian doping</subject><subject>HBT</subject><isbn>1457715457</isbn><isbn>9781457715457</isbn><isbn>9781457715464</isbn><isbn>9781457715440</isbn><isbn>1457715449</isbn><isbn>1457715430</isbn><isbn>1457715465</isbn><isbn>9781457715433</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2012</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNo1kEFLw0AQhVdEUGt-gQh71EPqbpJJNkebalsoeDD3MkkmZkOalN2N0n9vqnVgeDze8MEbxh6kmEsp0udNtsw-jtbNAyGDeSyVihVcMC9NlIwgSSREcXTJbv8NJNfMs7YV0yQinPaGjQu0xJ3B3mrHnd4TH2qOvCFHZmjHvnR66HmhD0OH5nxo3WD443qRP_Fv7Rq-wtFajT2vhgNVvDghx74iwxv92fgdfVF3wuq-pV_eHbuqsbPknXXG8rfXPFv72_fVJnvZ-joVzkcEUEEc1EWJaQkItSoEJghSShWHU4lKVSCpmmIIAJDSSECs0kgFWCOGM3b_h9VEtDsYvUdz3J0fFf4AXhhe9w</recordid><startdate>201203</startdate><enddate>201203</enddate><creator>Islam, S. M. Moududul</creator><creator>Chowdhury, M. I. B.</creator><creator>Arafat, Y.</creator><creator>Khan, M. Z. R.</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>201203</creationdate><title>Base transit time of a heterojunction bipolar transistor (HBT) with Gaussian doped base under high-level of injection</title><author>Islam, S. M. Moududul ; Chowdhury, M. I. B. ; Arafat, Y. ; Khan, M. Z. R.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i90t-aa558262fbca9c5a5f8b0a7a5111863007d8d51edca95255ae9405689482afaa3</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2012</creationdate><topic>Band gap narrowing</topic><topic>Base transit time</topic><topic>Density of states</topic><topic>Gaussian doping</topic><topic>HBT</topic><toplevel>online_resources</toplevel><creatorcontrib>Islam, S. M. Moududul</creatorcontrib><creatorcontrib>Chowdhury, M. I. B.</creatorcontrib><creatorcontrib>Arafat, Y.</creatorcontrib><creatorcontrib>Khan, M. Z. R.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE/IET Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Islam, S. M. Moududul</au><au>Chowdhury, M. I. B.</au><au>Arafat, Y.</au><au>Khan, M. Z. R.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Base transit time of a heterojunction bipolar transistor (HBT) with Gaussian doped base under high-level of injection</atitle><btitle>2012 International Conference on Devices, Circuits and Systems (ICDCS)</btitle><stitle>ICDCSyst</stitle><date>2012-03</date><risdate>2012</risdate><spage>114</spage><epage>118</epage><pages>114-118</pages><isbn>1457715457</isbn><isbn>9781457715457</isbn><eisbn>9781457715464</eisbn><eisbn>9781457715440</eisbn><eisbn>1457715449</eisbn><eisbn>1457715430</eisbn><eisbn>1457715465</eisbn><eisbn>9781457715433</eisbn><abstract>Base transit time for an npn SiGe HBT has been analysed assuming Gaussian doped base considering doping dependent mobility. Band-gap narrowing (BGN) effects due to heavy doping, due to presence of Germanium and due to change in the density of states (DOS) have also been considered. The presence of Ge has been incorporated by using a different saturation velocity for the SiGe alloy. A generalized profile for Ge mole fraction distribution is used, where Ge profile variation has been illustrated by varying a single parameter for box, trapezoidal and triangular forms. Base transit time of SiGe HBT has been calculated for these three Ge profiles under high level of injection.</abstract><pub>IEEE</pub><doi>10.1109/ICDCSyst.2012.6188685</doi><tpages>5</tpages></addata></record> |
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subjects | Band gap narrowing Base transit time Density of states Gaussian doping HBT |
title | Base transit time of a heterojunction bipolar transistor (HBT) with Gaussian doped base under high-level of injection |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-29T08%3A04%3A55IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Base%20transit%20time%20of%20a%20heterojunction%20bipolar%20transistor%20(HBT)%20with%20Gaussian%20doped%20base%20under%20high-level%20of%20injection&rft.btitle=2012%20International%20Conference%20on%20Devices,%20Circuits%20and%20Systems%20(ICDCS)&rft.au=Islam,%20S.%20M.%20Moududul&rft.date=2012-03&rft.spage=114&rft.epage=118&rft.pages=114-118&rft.isbn=1457715457&rft.isbn_list=9781457715457&rft_id=info:doi/10.1109/ICDCSyst.2012.6188685&rft_dat=%3Cieee_6IE%3E6188685%3C/ieee_6IE%3E%3Curl%3E%3C/url%3E&rft.eisbn=9781457715464&rft.eisbn_list=9781457715440&rft.eisbn_list=1457715449&rft.eisbn_list=1457715430&rft.eisbn_list=1457715465&rft.eisbn_list=9781457715433&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=6188685&rfr_iscdi=true |