N-type boron emitter solar cells with implantation industrial process

The use of ion implantation for PV application could be an innovative way of developing advanced cell structures with respect to a very simple fabrication process. Its application on p-type silicon solar cells has already showed its potential with the achievement of efficiency above 19% with selecti...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Veschetti, Y., Sanzone, V., Cabal, R., Bateman, N.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Annealing Boron Fabrication Firing Implants Photovoltaic cells Temperature measurement
Online-Zugang:	Volltext bestellen
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