Process development for dry etching polydimethylsiloxane for neural electrodes

In order to create high density electrode arrays, a reactive ion (dry) etching process was developed using sulphur hexafluoride (SF 6 ) and oxygen (O 2 ) plasma to pattern micro-structures in medical grade polydimethylsiloxane (PDMS). The surface topography and etch performance were analyzed by empl...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Anenden, M. P., Svehla, M., Lovell, N. H., Suaning, G. J.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Dimethylpolysiloxanes - chemistry Electrodes Etching Microscopy, Atomic Force Microscopy, Electron, Scanning Photoelectron Spectroscopy Plasmas Rough surfaces Surface morphology Surface roughness
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