New method of particle management by high-sensitivity ISPM
A collection of slides from the authors' conference presentation about New method of particle management by high-sensitivity ISPM is presented.
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| creator | Matsui, H. Miyauchi, K. Nagaike, H. Moriya, T. Oshima, C. Hayamizu, T. Sakamori, S. Watanabe, S. |
| description | A collection of slides from the authors' conference presentation about New method of particle management by high-sensitivity ISPM is presented. |
| format | Conference Proceeding |
| fullrecord | <record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_6086069</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>6086069</ieee_id><sourcerecordid>6086069</sourcerecordid><originalsourceid>FETCH-LOGICAL-i175t-f50ae537826b2727791c83d0111c9944979bb069379ef7dddb735e80f826a34f3</originalsourceid><addsrcrecordid>eNotjMtKAzEUQAMqWNr5Ajf5gYFk8riJOyk-Cq0KVXBXkslNJ9KZlklQ5u-t6Nmc1TkXpLJguFQAXEswl2TGVSNqpcTHNaly_mRntLag5YzcPuM37bF0x0CPkZ7cWFJ7QNq7we2xx6FQP9Eu7bs645BTSV-pTHS1fd0syFV0h4zVv-fk_eH-bflUr18eV8u7dZ04qFJHxRwqAabRvoEGwPLWiMA45621Ulqw3jNtBViMEELwIBQaFs-BEzKKObn5-yZE3J3G1Ltx2mlm9G_1A-fLQZU</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>New method of particle management by high-sensitivity ISPM</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Matsui, H. ; Miyauchi, K. ; Nagaike, H. ; Moriya, T. ; Oshima, C. ; Hayamizu, T. ; Sakamori, S. ; Watanabe, S.</creator><creatorcontrib>Matsui, H. ; Miyauchi, K. ; Nagaike, H. ; Moriya, T. ; Oshima, C. ; Hayamizu, T. ; Sakamori, S. ; Watanabe, S.</creatorcontrib><description>A collection of slides from the authors' conference presentation about New method of particle management by high-sensitivity ISPM is presented.</description><identifier>ISSN: 1523-553X</identifier><identifier>ISBN: 9781457716478</identifier><identifier>ISBN: 145771647X</identifier><language>eng</language><publisher>IEEE</publisher><subject>Collaboration ; Dry etching ; Joints ; Manufacturing ; Semiconductor lasers ; Sensitivity ; Vacuum systems</subject><ispartof>2011 e-Manufacturing & Design Collaboration Symposium & International Symposium on Semiconductor Manufacturing (eMDC & ISSM), 2011, p.1-11</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/6086069$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,780,784,789,790,2058,54920</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/6086069$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Matsui, H.</creatorcontrib><creatorcontrib>Miyauchi, K.</creatorcontrib><creatorcontrib>Nagaike, H.</creatorcontrib><creatorcontrib>Moriya, T.</creatorcontrib><creatorcontrib>Oshima, C.</creatorcontrib><creatorcontrib>Hayamizu, T.</creatorcontrib><creatorcontrib>Sakamori, S.</creatorcontrib><creatorcontrib>Watanabe, S.</creatorcontrib><title>New method of particle management by high-sensitivity ISPM</title><title>2011 e-Manufacturing & Design Collaboration Symposium & International Symposium on Semiconductor Manufacturing (eMDC & ISSM)</title><addtitle>ISSM-eMDC</addtitle><description>A collection of slides from the authors' conference presentation about New method of particle management by high-sensitivity ISPM is presented.</description><subject>Collaboration</subject><subject>Dry etching</subject><subject>Joints</subject><subject>Manufacturing</subject><subject>Semiconductor lasers</subject><subject>Sensitivity</subject><subject>Vacuum systems</subject><issn>1523-553X</issn><isbn>9781457716478</isbn><isbn>145771647X</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2011</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNotjMtKAzEUQAMqWNr5Ajf5gYFk8riJOyk-Cq0KVXBXkslNJ9KZlklQ5u-t6Nmc1TkXpLJguFQAXEswl2TGVSNqpcTHNaly_mRntLag5YzcPuM37bF0x0CPkZ7cWFJ7QNq7we2xx6FQP9Eu7bs645BTSV-pTHS1fd0syFV0h4zVv-fk_eH-bflUr18eV8u7dZ04qFJHxRwqAabRvoEGwPLWiMA45621Ulqw3jNtBViMEELwIBQaFs-BEzKKObn5-yZE3J3G1Ltx2mlm9G_1A-fLQZU</recordid><startdate>201109</startdate><enddate>201109</enddate><creator>Matsui, H.</creator><creator>Miyauchi, K.</creator><creator>Nagaike, H.</creator><creator>Moriya, T.</creator><creator>Oshima, C.</creator><creator>Hayamizu, T.</creator><creator>Sakamori, S.</creator><creator>Watanabe, S.</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope></search><sort><creationdate>201109</creationdate><title>New method of particle management by high-sensitivity ISPM</title><author>Matsui, H. ; Miyauchi, K. ; Nagaike, H. ; Moriya, T. ; Oshima, C. ; Hayamizu, T. ; Sakamori, S. ; Watanabe, S.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i175t-f50ae537826b2727791c83d0111c9944979bb069379ef7dddb735e80f826a34f3</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2011</creationdate><topic>Collaboration</topic><topic>Dry etching</topic><topic>Joints</topic><topic>Manufacturing</topic><topic>Semiconductor lasers</topic><topic>Sensitivity</topic><topic>Vacuum systems</topic><toplevel>online_resources</toplevel><creatorcontrib>Matsui, H.</creatorcontrib><creatorcontrib>Miyauchi, K.</creatorcontrib><creatorcontrib>Nagaike, H.</creatorcontrib><creatorcontrib>Moriya, T.</creatorcontrib><creatorcontrib>Oshima, C.</creatorcontrib><creatorcontrib>Hayamizu, T.</creatorcontrib><creatorcontrib>Sakamori, S.</creatorcontrib><creatorcontrib>Watanabe, S.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Matsui, H.</au><au>Miyauchi, K.</au><au>Nagaike, H.</au><au>Moriya, T.</au><au>Oshima, C.</au><au>Hayamizu, T.</au><au>Sakamori, S.</au><au>Watanabe, S.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>New method of particle management by high-sensitivity ISPM</atitle><btitle>2011 e-Manufacturing & Design Collaboration Symposium & International Symposium on Semiconductor Manufacturing (eMDC & ISSM)</btitle><stitle>ISSM-eMDC</stitle><date>2011-09</date><risdate>2011</risdate><spage>1</spage><epage>11</epage><pages>1-11</pages><issn>1523-553X</issn><isbn>9781457716478</isbn><isbn>145771647X</isbn><abstract>A collection of slides from the authors' conference presentation about New method of particle management by high-sensitivity ISPM is presented.</abstract><pub>IEEE</pub><tpages>11</tpages></addata></record> |
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| identifier | ISSN: 1523-553X |
| ispartof | 2011 e-Manufacturing & Design Collaboration Symposium & International Symposium on Semiconductor Manufacturing (eMDC & ISSM), 2011, p.1-11 |
| issn | 1523-553X |
| language | eng |
| recordid | cdi_ieee_primary_6086069 |
| source | IEEE Electronic Library (IEL) Conference Proceedings |
| subjects | Collaboration Dry etching Joints Manufacturing Semiconductor lasers Sensitivity Vacuum systems |
| title | New method of particle management by high-sensitivity ISPM |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-04T08%3A30%3A16IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=New%20method%20of%20particle%20management%20by%20high-sensitivity%20ISPM&rft.btitle=2011%20e-Manufacturing%20&%20Design%20Collaboration%20Symposium%20&%20International%20Symposium%20on%20Semiconductor%20Manufacturing%20(eMDC%20&%20ISSM)&rft.au=Matsui,%20H.&rft.date=2011-09&rft.spage=1&rft.epage=11&rft.pages=1-11&rft.issn=1523-553X&rft.isbn=9781457716478&rft.isbn_list=145771647X&rft_id=info:doi/&rft_dat=%3Cieee_6IE%3E6086069%3C/ieee_6IE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=6086069&rfr_iscdi=true |