Capacitance Compact Model for Ultrathin Low-Electron-Effective-Mass Materials

We present a compact model to calculate the capacitance of undoped high-mobility low-density-of-states materials in double-gate device architecture. Analytical equations for estimating the subband energies, while taking the effect of wavefunction penetration into the gate oxide and the effective mas...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:IEEE transactions on electron devices 2011-12, Vol.58 (12), p.4204-4211
Hauptverfasser: Mudanai, S., Roy, A., Kotlyar, R., Rakshit, T., Stettler, M.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 4211
container_issue 12
container_start_page 4204
container_title IEEE transactions on electron devices
container_volume 58
creator Mudanai, S.
Roy, A.
Kotlyar, R.
Rakshit, T.
Stettler, M.
description We present a compact model to calculate the capacitance of undoped high-mobility low-density-of-states materials in double-gate device architecture. Analytical equations for estimating the subband energies, while taking the effect of wavefunction penetration into the gate oxide and the effective mass discontinuity, are presented for the first time in a compact modeling framework. The surface potential equation for a two subband system is solved, assuming Fermi-Dirac statistics, and compared to numerical Schrodinger-Poisson simulations. The importance of accurately treating the charge profile distribution is illustrated, and an analytical expression for the effective oxide thickness to model the charge centroid is developed.
doi_str_mv 10.1109/TED.2011.2168529
format Article
fullrecord <record><control><sourceid>proquest_RIE</sourceid><recordid>TN_cdi_ieee_primary_6035965</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>6035965</ieee_id><sourcerecordid>2518657551</sourcerecordid><originalsourceid>FETCH-LOGICAL-c320t-3932800a0e00403b3a9729d67c09a847038749ffd5bb6282508525fa01e96dd53</originalsourceid><addsrcrecordid>eNo9kM1LxDAQxYMouK7eBS9F8Jh1kjRpcpRaP2CLl91zyLYJdum2axIV_3tTdtnTm2HevGF-CN0SWBAC6nFVPS8oELKgREhO1RmaEc4LrEQuztEMgEismGSX6CqEbWpFntMZqkuzN00XzdDYrBx3qYlZPba2z9zos3UfvYmf3ZAtx19c9baJfhxw5Vyquh-LaxNCVptofWf6cI0uXBJ7c9Q5Wr9Uq_INLz9e38unJW4YhYiZYlQCGLAAObANM6qgqhVFA8rIvAAmi1w51_LNRlBJOaSPuDNArBJty9kc3R9y9378-rYh6u347Yd0UivgUuRMTiY4mBo_huCt03vf7Yz_0wT0xEwnZnpipo_M0srDMdeExvTOJyxdOO1RzgrBYYq-O_g6a-1pLIBxJTj7B13UcqE</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>905864385</pqid></control><display><type>article</type><title>Capacitance Compact Model for Ultrathin Low-Electron-Effective-Mass Materials</title><source>IEEE Electronic Library (IEL)</source><creator>Mudanai, S. ; Roy, A. ; Kotlyar, R. ; Rakshit, T. ; Stettler, M.</creator><creatorcontrib>Mudanai, S. ; Roy, A. ; Kotlyar, R. ; Rakshit, T. ; Stettler, M.</creatorcontrib><description>We present a compact model to calculate the capacitance of undoped high-mobility low-density-of-states materials in double-gate device architecture. Analytical equations for estimating the subband energies, while taking the effect of wavefunction penetration into the gate oxide and the effective mass discontinuity, are presented for the first time in a compact modeling framework. The surface potential equation for a two subband system is solved, assuming Fermi-Dirac statistics, and compared to numerical Schrodinger-Poisson simulations. The importance of accurately treating the charge profile distribution is illustrated, and an analytical expression for the effective oxide thickness to model the charge centroid is developed.</description><identifier>ISSN: 0018-9383</identifier><identifier>EISSN: 1557-9646</identifier><identifier>DOI: 10.1109/TED.2011.2168529</identifier><identifier>CODEN: IETDAI</identifier><language>eng</language><publisher>New York, NY: IEEE</publisher><subject>Applied sciences ; Compact model ; density of states (DOS) ; Effective mass ; Electronics ; Equations ; Exact sciences and technology ; III-V ; Logic gates ; Mathematical model ; Numerical simulation ; Quantum capacitance ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Transistors</subject><ispartof>IEEE transactions on electron devices, 2011-12, Vol.58 (12), p.4204-4211</ispartof><rights>2015 INIST-CNRS</rights><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) Dec 2011</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c320t-3932800a0e00403b3a9729d67c09a847038749ffd5bb6282508525fa01e96dd53</citedby><cites>FETCH-LOGICAL-c320t-3932800a0e00403b3a9729d67c09a847038749ffd5bb6282508525fa01e96dd53</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/6035965$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,776,780,792,27901,27902,54733</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/6035965$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=25376505$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Mudanai, S.</creatorcontrib><creatorcontrib>Roy, A.</creatorcontrib><creatorcontrib>Kotlyar, R.</creatorcontrib><creatorcontrib>Rakshit, T.</creatorcontrib><creatorcontrib>Stettler, M.</creatorcontrib><title>Capacitance Compact Model for Ultrathin Low-Electron-Effective-Mass Materials</title><title>IEEE transactions on electron devices</title><addtitle>TED</addtitle><description>We present a compact model to calculate the capacitance of undoped high-mobility low-density-of-states materials in double-gate device architecture. Analytical equations for estimating the subband energies, while taking the effect of wavefunction penetration into the gate oxide and the effective mass discontinuity, are presented for the first time in a compact modeling framework. The surface potential equation for a two subband system is solved, assuming Fermi-Dirac statistics, and compared to numerical Schrodinger-Poisson simulations. The importance of accurately treating the charge profile distribution is illustrated, and an analytical expression for the effective oxide thickness to model the charge centroid is developed.</description><subject>Applied sciences</subject><subject>Compact model</subject><subject>density of states (DOS)</subject><subject>Effective mass</subject><subject>Electronics</subject><subject>Equations</subject><subject>Exact sciences and technology</subject><subject>III-V</subject><subject>Logic gates</subject><subject>Mathematical model</subject><subject>Numerical simulation</subject><subject>Quantum capacitance</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Transistors</subject><issn>0018-9383</issn><issn>1557-9646</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2011</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNo9kM1LxDAQxYMouK7eBS9F8Jh1kjRpcpRaP2CLl91zyLYJdum2axIV_3tTdtnTm2HevGF-CN0SWBAC6nFVPS8oELKgREhO1RmaEc4LrEQuztEMgEismGSX6CqEbWpFntMZqkuzN00XzdDYrBx3qYlZPba2z9zos3UfvYmf3ZAtx19c9baJfhxw5Vyquh-LaxNCVptofWf6cI0uXBJ7c9Q5Wr9Uq_INLz9e38unJW4YhYiZYlQCGLAAObANM6qgqhVFA8rIvAAmi1w51_LNRlBJOaSPuDNArBJty9kc3R9y9378-rYh6u347Yd0UivgUuRMTiY4mBo_huCt03vf7Yz_0wT0xEwnZnpipo_M0srDMdeExvTOJyxdOO1RzgrBYYq-O_g6a-1pLIBxJTj7B13UcqE</recordid><startdate>20111201</startdate><enddate>20111201</enddate><creator>Mudanai, S.</creator><creator>Roy, A.</creator><creator>Kotlyar, R.</creator><creator>Rakshit, T.</creator><creator>Stettler, M.</creator><general>IEEE</general><general>Institute of Electrical and Electronics Engineers</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20111201</creationdate><title>Capacitance Compact Model for Ultrathin Low-Electron-Effective-Mass Materials</title><author>Mudanai, S. ; Roy, A. ; Kotlyar, R. ; Rakshit, T. ; Stettler, M.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c320t-3932800a0e00403b3a9729d67c09a847038749ffd5bb6282508525fa01e96dd53</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2011</creationdate><topic>Applied sciences</topic><topic>Compact model</topic><topic>density of states (DOS)</topic><topic>Effective mass</topic><topic>Electronics</topic><topic>Equations</topic><topic>Exact sciences and technology</topic><topic>III-V</topic><topic>Logic gates</topic><topic>Mathematical model</topic><topic>Numerical simulation</topic><topic>Quantum capacitance</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Transistors</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Mudanai, S.</creatorcontrib><creatorcontrib>Roy, A.</creatorcontrib><creatorcontrib>Kotlyar, R.</creatorcontrib><creatorcontrib>Rakshit, T.</creatorcontrib><creatorcontrib>Stettler, M.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>IEEE transactions on electron devices</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Mudanai, S.</au><au>Roy, A.</au><au>Kotlyar, R.</au><au>Rakshit, T.</au><au>Stettler, M.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Capacitance Compact Model for Ultrathin Low-Electron-Effective-Mass Materials</atitle><jtitle>IEEE transactions on electron devices</jtitle><stitle>TED</stitle><date>2011-12-01</date><risdate>2011</risdate><volume>58</volume><issue>12</issue><spage>4204</spage><epage>4211</epage><pages>4204-4211</pages><issn>0018-9383</issn><eissn>1557-9646</eissn><coden>IETDAI</coden><abstract>We present a compact model to calculate the capacitance of undoped high-mobility low-density-of-states materials in double-gate device architecture. Analytical equations for estimating the subband energies, while taking the effect of wavefunction penetration into the gate oxide and the effective mass discontinuity, are presented for the first time in a compact modeling framework. The surface potential equation for a two subband system is solved, assuming Fermi-Dirac statistics, and compared to numerical Schrodinger-Poisson simulations. The importance of accurately treating the charge profile distribution is illustrated, and an analytical expression for the effective oxide thickness to model the charge centroid is developed.</abstract><cop>New York, NY</cop><pub>IEEE</pub><doi>10.1109/TED.2011.2168529</doi><tpages>8</tpages></addata></record>
fulltext fulltext_linktorsrc
identifier ISSN: 0018-9383
ispartof IEEE transactions on electron devices, 2011-12, Vol.58 (12), p.4204-4211
issn 0018-9383
1557-9646
language eng
recordid cdi_ieee_primary_6035965
source IEEE Electronic Library (IEL)
subjects Applied sciences
Compact model
density of states (DOS)
Effective mass
Electronics
Equations
Exact sciences and technology
III-V
Logic gates
Mathematical model
Numerical simulation
Quantum capacitance
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Transistors
title Capacitance Compact Model for Ultrathin Low-Electron-Effective-Mass Materials
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-29T21%3A33%3A49IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_RIE&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Capacitance%20Compact%20Model%20for%20Ultrathin%20Low-Electron-Effective-Mass%20Materials&rft.jtitle=IEEE%20transactions%20on%20electron%20devices&rft.au=Mudanai,%20S.&rft.date=2011-12-01&rft.volume=58&rft.issue=12&rft.spage=4204&rft.epage=4211&rft.pages=4204-4211&rft.issn=0018-9383&rft.eissn=1557-9646&rft.coden=IETDAI&rft_id=info:doi/10.1109/TED.2011.2168529&rft_dat=%3Cproquest_RIE%3E2518657551%3C/proquest_RIE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=905864385&rft_id=info:pmid/&rft_ieee_id=6035965&rfr_iscdi=true