Drain resistance degradation under high fields in AlInAs/GaInAs MODFETs
Lattice-matched AlInAs/GaInAs modulation-doped FETs (MODFETs) demonstrate excellent high-frequency, small-signal performance. However, high-power, large-signal applications of these devices may be limited. Impact ionization and tunneling reduce the breakdown voltage, which limits the upper end of th...
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creator | Wakita, A.S. Rohdin, H. Su, C.-Y. Moll, N. Nagy, A. Robbins, V.M. |
description | Lattice-matched AlInAs/GaInAs modulation-doped FETs (MODFETs) demonstrate excellent high-frequency, small-signal performance. However, high-power, large-signal applications of these devices may be limited. Impact ionization and tunneling reduce the breakdown voltage, which limits the upper end of the output voltage swing, thus reducing the output power. Our results indicate that the lower end of the voltage swing (knee voltage) is also degraded by increased drain resistance when impact ionization occurs. In this work, we correlate R/sub d/ degradation in the AlInAs/GaInAs material system to the presence of impact ionization. The magnitude of R/sub d/ degradation depends on the applied drain bias and drain current. These factors affect the degree of impact ionization, and thus the extent of the degradation. Since R/sub d/ increases and R/sub s/ does not, only the high field side of the FET is affected. This increase in R/sub d/ is attributed to a wider carrier depletion region between the gate and drain after stress, which results in reduced device performance. |
doi_str_mv | 10.1109/ICIPRM.1997.600164 |
format | Conference Proceeding |
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However, high-power, large-signal applications of these devices may be limited. Impact ionization and tunneling reduce the breakdown voltage, which limits the upper end of the output voltage swing, thus reducing the output power. Our results indicate that the lower end of the voltage swing (knee voltage) is also degraded by increased drain resistance when impact ionization occurs. In this work, we correlate R/sub d/ degradation in the AlInAs/GaInAs material system to the presence of impact ionization. The magnitude of R/sub d/ degradation depends on the applied drain bias and drain current. These factors affect the degree of impact ionization, and thus the extent of the degradation. Since R/sub d/ increases and R/sub s/ does not, only the high field side of the FET is affected. This increase in R/sub d/ is attributed to a wider carrier depletion region between the gate and drain after stress, which results in reduced device performance.</description><identifier>ISSN: 1092-8669</identifier><identifier>ISBN: 9780780338982</identifier><identifier>ISBN: 0780338987</identifier><identifier>DOI: 10.1109/ICIPRM.1997.600164</identifier><language>eng</language><publisher>IEEE</publisher><subject>Breakdown voltage ; Degradation ; Epitaxial layers ; FETs ; HEMTs ; Impact ionization ; Knee ; MODFETs ; Power generation ; Tunneling</subject><ispartof>Conference Proceedings. 1997 International Conference on Indium Phosphide and Related Materials, 1997, p.376-379</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/600164$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,776,780,785,786,2051,4035,4036,27904,54898</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/600164$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Wakita, A.S.</creatorcontrib><creatorcontrib>Rohdin, H.</creatorcontrib><creatorcontrib>Su, C.-Y.</creatorcontrib><creatorcontrib>Moll, N.</creatorcontrib><creatorcontrib>Nagy, A.</creatorcontrib><creatorcontrib>Robbins, V.M.</creatorcontrib><title>Drain resistance degradation under high fields in AlInAs/GaInAs MODFETs</title><title>Conference Proceedings. 1997 International Conference on Indium Phosphide and Related Materials</title><addtitle>ICIPRM</addtitle><description>Lattice-matched AlInAs/GaInAs modulation-doped FETs (MODFETs) demonstrate excellent high-frequency, small-signal performance. However, high-power, large-signal applications of these devices may be limited. Impact ionization and tunneling reduce the breakdown voltage, which limits the upper end of the output voltage swing, thus reducing the output power. Our results indicate that the lower end of the voltage swing (knee voltage) is also degraded by increased drain resistance when impact ionization occurs. In this work, we correlate R/sub d/ degradation in the AlInAs/GaInAs material system to the presence of impact ionization. The magnitude of R/sub d/ degradation depends on the applied drain bias and drain current. These factors affect the degree of impact ionization, and thus the extent of the degradation. Since R/sub d/ increases and R/sub s/ does not, only the high field side of the FET is affected. This increase in R/sub d/ is attributed to a wider carrier depletion region between the gate and drain after stress, which results in reduced device performance.</description><subject>Breakdown voltage</subject><subject>Degradation</subject><subject>Epitaxial layers</subject><subject>FETs</subject><subject>HEMTs</subject><subject>Impact ionization</subject><subject>Knee</subject><subject>MODFETs</subject><subject>Power generation</subject><subject>Tunneling</subject><issn>1092-8669</issn><isbn>9780780338982</isbn><isbn>0780338987</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>1997</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNotj1FLwzAUhQMqOOf-wJ7yB9rdJG2TPJZOa2FjIvo8bprbLVKrNPXBf29lwoEPDh8HDmNrAakQYDdN1Ty_7FNhrU4LAFFkV2xltYE5Shlr5DVbzKJMTFHYW3YX4zsA5FqaBau3I4aBjxRDnHBoiXs6jehxCp8D_x48jfwcTmfeBep95LNb9s1Qxk2Nf-D7w_bx4TXes5sO-0irfy7Z21xXT8nuUDdVuUuC0HJKPGDbKSAlSQJhjkWeEZJrPWTQacwkKqep7ZzLnPI5ajAOO9Aid9YJo5ZsfdkNRHT8GsMHjj_Hy231CyEqTEo</recordid><startdate>1997</startdate><enddate>1997</enddate><creator>Wakita, A.S.</creator><creator>Rohdin, H.</creator><creator>Su, C.-Y.</creator><creator>Moll, N.</creator><creator>Nagy, A.</creator><creator>Robbins, V.M.</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>1997</creationdate><title>Drain resistance degradation under high fields in AlInAs/GaInAs MODFETs</title><author>Wakita, A.S. ; Rohdin, H. ; Su, C.-Y. ; Moll, N. ; Nagy, A. ; Robbins, V.M.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i172t-d0acf30e32e20ea5a654eaebcd040f7a42a3b7ecfbb4b3d5a708baf0715b9b183</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>1997</creationdate><topic>Breakdown voltage</topic><topic>Degradation</topic><topic>Epitaxial layers</topic><topic>FETs</topic><topic>HEMTs</topic><topic>Impact ionization</topic><topic>Knee</topic><topic>MODFETs</topic><topic>Power generation</topic><topic>Tunneling</topic><toplevel>online_resources</toplevel><creatorcontrib>Wakita, A.S.</creatorcontrib><creatorcontrib>Rohdin, H.</creatorcontrib><creatorcontrib>Su, C.-Y.</creatorcontrib><creatorcontrib>Moll, N.</creatorcontrib><creatorcontrib>Nagy, A.</creatorcontrib><creatorcontrib>Robbins, V.M.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Wakita, A.S.</au><au>Rohdin, H.</au><au>Su, C.-Y.</au><au>Moll, N.</au><au>Nagy, A.</au><au>Robbins, V.M.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Drain resistance degradation under high fields in AlInAs/GaInAs MODFETs</atitle><btitle>Conference Proceedings. 1997 International Conference on Indium Phosphide and Related Materials</btitle><stitle>ICIPRM</stitle><date>1997</date><risdate>1997</risdate><spage>376</spage><epage>379</epage><pages>376-379</pages><issn>1092-8669</issn><isbn>9780780338982</isbn><isbn>0780338987</isbn><abstract>Lattice-matched AlInAs/GaInAs modulation-doped FETs (MODFETs) demonstrate excellent high-frequency, small-signal performance. However, high-power, large-signal applications of these devices may be limited. Impact ionization and tunneling reduce the breakdown voltage, which limits the upper end of the output voltage swing, thus reducing the output power. Our results indicate that the lower end of the voltage swing (knee voltage) is also degraded by increased drain resistance when impact ionization occurs. In this work, we correlate R/sub d/ degradation in the AlInAs/GaInAs material system to the presence of impact ionization. The magnitude of R/sub d/ degradation depends on the applied drain bias and drain current. These factors affect the degree of impact ionization, and thus the extent of the degradation. Since R/sub d/ increases and R/sub s/ does not, only the high field side of the FET is affected. This increase in R/sub d/ is attributed to a wider carrier depletion region between the gate and drain after stress, which results in reduced device performance.</abstract><pub>IEEE</pub><doi>10.1109/ICIPRM.1997.600164</doi><tpages>4</tpages></addata></record> |
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issn | 1092-8669 |
language | eng |
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subjects | Breakdown voltage Degradation Epitaxial layers FETs HEMTs Impact ionization Knee MODFETs Power generation Tunneling |
title | Drain resistance degradation under high fields in AlInAs/GaInAs MODFETs |
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