Electrical Recovery After Laser-Assisted Discharge for Highly Repetitive Plasma EUV Source

Extreme ultraviolet (EUV) light source is still the key issue for the industrial application of EUV lithography. For the discharge-produced-plasma EUV source, highly repetitive discharge up to tens of kilohertz is required to achieve the sufficient average radiation power at intermediate focus. Elec...

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Veröffentlicht in:	IEEE transactions on plasma science 2011-09, Vol.39 (9), p.1849-1854
Hauptverfasser:	Peng Lu, Katsuki, S., Watanebe, T., Akiyama, H.
Format:	Artikel
Sprache:	eng
Schlagworte:	Density Discharges Droplets Electric potential Electrical recovery Electrodes Fault location high-repetition-rate extreme ultraviolet (EUV) source laser-assisted discharge (LAD) laser-induced fluorescence (LIF) Lasers Mie scattering Offset printing Political power Recovery Repetition Shot Tin Ultraviolet radiation Voltage Voltage measurement
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