Effective start up study and factor analysis for lithography process filter
In order to drive reduced chemical consumption, effective tool operation, effective utilization of next-generation filtration products, and environmental benefits, greater demands will be placed on the development of effective start up procedures for point-of-use filters in advanced lithography resi...
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creator | Umeda, T Tsuzuki, S Numaguchi, T |
description | In order to drive reduced chemical consumption, effective tool operation, effective utilization of next-generation filtration products, and environmental benefits, greater demands will be placed on the development of effective start up procedures for point-of-use filters in advanced lithography resist coating processes. The current study evaluates the effectiveness of two procedural methods, static pressure driven fluid delivery and fluid deaeration, on filter start up improvement. Further, factor analysis revealed inlet pressure to have a significant impact on filter start up quality. |
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fullrecord | <record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_5750243</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>5750243</ieee_id><sourcerecordid>5750243</sourcerecordid><originalsourceid>FETCH-LOGICAL-i90t-528eb32806990fce5d50ac177138d87bd53066af65efd9505918e08468d266d13</originalsourceid><addsrcrecordid>eNotjstKAzEYhSMqWOs8gZu8wEBufy5LKfWCBTdduCvp5I-NjM6QpMK8vQE9m3NZHL4L0jljlXNMcWklXJJbrsAYJp1gV2TFQcgeQL7fkK6UT9aktTMaVuR1GyMONf0gLdXnSs9zC-ewUP8daPRDnXKLflxKKjS2MqZ6mj6yn08LnfM0YGl7GivmO3Id_Viw-_c12T9u95vnfvf29LJ52PXJsdqDsHiUwjLdeOOAEID5gRvT0IM1xwCy0fmoAWNwwMBxi8wqbYPQOnC5Jvd_twkRD3NOXz4vBzDAhJLyF-jfSpw</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Effective start up study and factor analysis for lithography process filter</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Umeda, T ; Tsuzuki, S ; Numaguchi, T</creator><creatorcontrib>Umeda, T ; Tsuzuki, S ; Numaguchi, T</creatorcontrib><description>In order to drive reduced chemical consumption, effective tool operation, effective utilization of next-generation filtration products, and environmental benefits, greater demands will be placed on the development of effective start up procedures for point-of-use filters in advanced lithography resist coating processes. The current study evaluates the effectiveness of two procedural methods, static pressure driven fluid delivery and fluid deaeration, on filter start up improvement. Further, factor analysis revealed inlet pressure to have a significant impact on filter start up quality.</description><identifier>ISSN: 1523-553X</identifier><identifier>ISBN: 1457703920</identifier><identifier>ISBN: 9781457703928</identifier><identifier>EISBN: 9784990413835</identifier><identifier>EISBN: 4990413830</identifier><language>eng</language><publisher>IEEE</publisher><subject>Fluids ; Regulators ; Transducers ; Valves</subject><ispartof>2010 International Symposium on Semiconductor Manufacturing (ISSM), 2010, p.1-4</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/5750243$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,780,784,789,790,2058,54920</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/5750243$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Umeda, T</creatorcontrib><creatorcontrib>Tsuzuki, S</creatorcontrib><creatorcontrib>Numaguchi, T</creatorcontrib><title>Effective start up study and factor analysis for lithography process filter</title><title>2010 International Symposium on Semiconductor Manufacturing (ISSM)</title><addtitle>ISSM</addtitle><description>In order to drive reduced chemical consumption, effective tool operation, effective utilization of next-generation filtration products, and environmental benefits, greater demands will be placed on the development of effective start up procedures for point-of-use filters in advanced lithography resist coating processes. The current study evaluates the effectiveness of two procedural methods, static pressure driven fluid delivery and fluid deaeration, on filter start up improvement. Further, factor analysis revealed inlet pressure to have a significant impact on filter start up quality.</description><subject>Fluids</subject><subject>Regulators</subject><subject>Transducers</subject><subject>Valves</subject><issn>1523-553X</issn><isbn>1457703920</isbn><isbn>9781457703928</isbn><isbn>9784990413835</isbn><isbn>4990413830</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2010</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNotjstKAzEYhSMqWOs8gZu8wEBufy5LKfWCBTdduCvp5I-NjM6QpMK8vQE9m3NZHL4L0jljlXNMcWklXJJbrsAYJp1gV2TFQcgeQL7fkK6UT9aktTMaVuR1GyMONf0gLdXnSs9zC-ewUP8daPRDnXKLflxKKjS2MqZ6mj6yn08LnfM0YGl7GivmO3Id_Viw-_c12T9u95vnfvf29LJ52PXJsdqDsHiUwjLdeOOAEID5gRvT0IM1xwCy0fmoAWNwwMBxi8wqbYPQOnC5Jvd_twkRD3NOXz4vBzDAhJLyF-jfSpw</recordid><startdate>201010</startdate><enddate>201010</enddate><creator>Umeda, T</creator><creator>Tsuzuki, S</creator><creator>Numaguchi, T</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope></search><sort><creationdate>201010</creationdate><title>Effective start up study and factor analysis for lithography process filter</title><author>Umeda, T ; Tsuzuki, S ; Numaguchi, T</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i90t-528eb32806990fce5d50ac177138d87bd53066af65efd9505918e08468d266d13</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Fluids</topic><topic>Regulators</topic><topic>Transducers</topic><topic>Valves</topic><toplevel>online_resources</toplevel><creatorcontrib>Umeda, T</creatorcontrib><creatorcontrib>Tsuzuki, S</creatorcontrib><creatorcontrib>Numaguchi, T</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE/IET Electronic Library</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Umeda, T</au><au>Tsuzuki, S</au><au>Numaguchi, T</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Effective start up study and factor analysis for lithography process filter</atitle><btitle>2010 International Symposium on Semiconductor Manufacturing (ISSM)</btitle><stitle>ISSM</stitle><date>2010-10</date><risdate>2010</risdate><spage>1</spage><epage>4</epage><pages>1-4</pages><issn>1523-553X</issn><isbn>1457703920</isbn><isbn>9781457703928</isbn><eisbn>9784990413835</eisbn><eisbn>4990413830</eisbn><abstract>In order to drive reduced chemical consumption, effective tool operation, effective utilization of next-generation filtration products, and environmental benefits, greater demands will be placed on the development of effective start up procedures for point-of-use filters in advanced lithography resist coating processes. The current study evaluates the effectiveness of two procedural methods, static pressure driven fluid delivery and fluid deaeration, on filter start up improvement. Further, factor analysis revealed inlet pressure to have a significant impact on filter start up quality.</abstract><pub>IEEE</pub><tpages>4</tpages></addata></record> |
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source | IEEE Electronic Library (IEL) Conference Proceedings |
subjects | Fluids Regulators Transducers Valves |
title | Effective start up study and factor analysis for lithography process filter |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-01T07%3A37%3A43IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Effective%20start%20up%20study%20and%20factor%20analysis%20for%20lithography%20process%20filter&rft.btitle=2010%20International%20Symposium%20on%20Semiconductor%20Manufacturing%20(ISSM)&rft.au=Umeda,%20T&rft.date=2010-10&rft.spage=1&rft.epage=4&rft.pages=1-4&rft.issn=1523-553X&rft.isbn=1457703920&rft.isbn_list=9781457703928&rft_id=info:doi/&rft_dat=%3Cieee_6IE%3E5750243%3C/ieee_6IE%3E%3Curl%3E%3C/url%3E&rft.eisbn=9784990413835&rft.eisbn_list=4990413830&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=5750243&rfr_iscdi=true |