Automated metrology qualification strategy [IC measurement]

This paper presents the methodology used to perform qualification of critical dimension (CD) SEM (Scanning Electron Microscope) tools for sub-0.5 /spl mu/m process control. A submicron pitch standard has been characterized and incorporated into an automated tool calibration and qualification procedu...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	Chain, E.E.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Calibration Fabrication Metrology NIST Pollution measurement Process control Production facilities Qualifications Scanning electron microscopy Ultra large scale integration
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