A 2-D Micromachined SOI MEMS Mirror With Sidewall Electrodes for Biomedical Imaging
This paper presents a 2 DOF silicon-on-insulator (SOI) microelectromechanical systems (MEMS) mirror with sidewall (SW) electrodes for biomedical imaging. The MEMS mirror is actuated by electrostatic actuators, and the mirror plate is 1000 μm × 1000 μm with a thickness of 35 μm. The paper analyzes th...
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| Veröffentlicht in: | IEEE/ASME transactions on mechatronics 2010-08, Vol.15 (4), p.501-510 |
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| creator | Yanhui Bai Yeow, John T W Constantinou, Paul Damaskinos, Savvas Wilson, Brian C |
| description | This paper presents a 2 DOF silicon-on-insulator (SOI) microelectromechanical systems (MEMS) mirror with sidewall (SW) electrodes for biomedical imaging. The MEMS mirror is actuated by electrostatic actuators, and the mirror plate is 1000 μm × 1000 μm with a thickness of 35 μm. The paper analyzes the effects of the single-crystal serpentine torsion bar width and bottom electrodes and SW electrodes on the performance of the micromirror. A new fabrication process based on SOI wafer, hybrid bulk/surface micromachined technology, and a high aspect-ratio shadow mask is presented. In comparison to the previous fabrication process and the Optical iMEMS process, the process is novel, easily understood, and simple to realize. Static and dynamic experiments indicate that a MEMS mirror with SW can provide a large scanning angle under low-drive voltage. The MEMS mirror is developed for a confocal MACROscope system for biomedical imaging. This mirror is also well suited for applications where large linear angular scan at low-driving voltage is required. |
| doi_str_mv | 10.1109/TMECH.2010.2051451 |
| format | Article |
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The MEMS mirror is actuated by electrostatic actuators, and the mirror plate is 1000 μm × 1000 μm with a thickness of 35 μm. The paper analyzes the effects of the single-crystal serpentine torsion bar width and bottom electrodes and SW electrodes on the performance of the micromirror. A new fabrication process based on SOI wafer, hybrid bulk/surface micromachined technology, and a high aspect-ratio shadow mask is presented. In comparison to the previous fabrication process and the Optical iMEMS process, the process is novel, easily understood, and simple to realize. Static and dynamic experiments indicate that a MEMS mirror with SW can provide a large scanning angle under low-drive voltage. The MEMS mirror is developed for a confocal MACROscope system for biomedical imaging. This mirror is also well suited for applications where large linear angular scan at low-driving voltage is required.</description><identifier>ISSN: 1083-4435</identifier><identifier>EISSN: 1941-014X</identifier><identifier>DOI: 10.1109/TMECH.2010.2051451</identifier><identifier>CODEN: IATEFW</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Biomedical electrodes ; Biomedical imaging ; Biomedical optical imaging ; Dynamics ; Electric potential ; Electrodes ; Electrostatic actuators ; Imaging ; MACROscope ; Mechatronics ; Microelectromechanical systems ; microelectromechanical systems (MEMS) ; Micromachining ; Micromechanical devices ; Micromechanics ; micromirror ; Mirrors ; Optical device fabrication ; serpentine ; sidewall (SW) ; Silicon on insulator technology ; silicon-on-insulator (SOI) ; Voltage</subject><ispartof>IEEE/ASME transactions on mechatronics, 2010-08, Vol.15 (4), p.501-510</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) Aug 2010</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c327t-8fc737b5863708d82e2f7b8ae811c1f016289c6ab0febecd54cc04116faed6a13</citedby><cites>FETCH-LOGICAL-c327t-8fc737b5863708d82e2f7b8ae811c1f016289c6ab0febecd54cc04116faed6a13</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/5508425$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,776,780,792,27903,27904,54736</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/5508425$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Yanhui Bai</creatorcontrib><creatorcontrib>Yeow, John T W</creatorcontrib><creatorcontrib>Constantinou, Paul</creatorcontrib><creatorcontrib>Damaskinos, Savvas</creatorcontrib><creatorcontrib>Wilson, Brian C</creatorcontrib><title>A 2-D Micromachined SOI MEMS Mirror With Sidewall Electrodes for Biomedical Imaging</title><title>IEEE/ASME transactions on mechatronics</title><addtitle>TMECH</addtitle><description>This paper presents a 2 DOF silicon-on-insulator (SOI) microelectromechanical systems (MEMS) mirror with sidewall (SW) electrodes for biomedical imaging. 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This mirror is also well suited for applications where large linear angular scan at low-driving voltage is required.</description><subject>Biomedical electrodes</subject><subject>Biomedical imaging</subject><subject>Biomedical optical imaging</subject><subject>Dynamics</subject><subject>Electric potential</subject><subject>Electrodes</subject><subject>Electrostatic actuators</subject><subject>Imaging</subject><subject>MACROscope</subject><subject>Mechatronics</subject><subject>Microelectromechanical systems</subject><subject>microelectromechanical systems (MEMS)</subject><subject>Micromachining</subject><subject>Micromechanical devices</subject><subject>Micromechanics</subject><subject>micromirror</subject><subject>Mirrors</subject><subject>Optical device fabrication</subject><subject>serpentine</subject><subject>sidewall (SW)</subject><subject>Silicon on insulator technology</subject><subject>silicon-on-insulator (SOI)</subject><subject>Voltage</subject><issn>1083-4435</issn><issn>1941-014X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNpdkEFPwjAYhhejiYj-Ab008eBp2K9r1-6IiEIC4QBGb0vpvkHJxrAdMf57ixAPntp-fd4vb54ougXaA6DZ42I6HIx6jIY3owK4gLOoAxmHmAL_OA93qpKY80RcRlfebyilHCh0onmfsPiZTK1xTa3N2m6xIPPZmEyH03kYO9c48m7bNZnbAr90VZFhhaZ1TYGelOHzyTY1FtboioxrvbLb1XV0UerK483p7EZvL8PFYBRPZq_jQX8Sm4TJNlalkYlcCpUmkqpCMWSlXCqNCsBASSFlKjOpXtISl2gKwY0JrSEtNRaphqQbPRz37lzzuUff5rX1BqtKb7HZ-1wqyZKUiiyQ9__ITbN321AuB8qklBnjLFDsSAUX3jss852ztXbfAcoPmvNfzflBc37SHEJ3x5BFxL-AEFRxJpIfKKB26w</recordid><startdate>201008</startdate><enddate>201008</enddate><creator>Yanhui Bai</creator><creator>Yeow, John T W</creator><creator>Constantinou, Paul</creator><creator>Damaskinos, Savvas</creator><creator>Wilson, Brian C</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. 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The MEMS mirror is actuated by electrostatic actuators, and the mirror plate is 1000 μm × 1000 μm with a thickness of 35 μm. The paper analyzes the effects of the single-crystal serpentine torsion bar width and bottom electrodes and SW electrodes on the performance of the micromirror. A new fabrication process based on SOI wafer, hybrid bulk/surface micromachined technology, and a high aspect-ratio shadow mask is presented. In comparison to the previous fabrication process and the Optical iMEMS process, the process is novel, easily understood, and simple to realize. Static and dynamic experiments indicate that a MEMS mirror with SW can provide a large scanning angle under low-drive voltage. The MEMS mirror is developed for a confocal MACROscope system for biomedical imaging. This mirror is also well suited for applications where large linear angular scan at low-driving voltage is required.</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/TMECH.2010.2051451</doi><tpages>10</tpages></addata></record> |
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| source | IEEE Electronic Library (IEL) |
| subjects | Biomedical electrodes Biomedical imaging Biomedical optical imaging Dynamics Electric potential Electrodes Electrostatic actuators Imaging MACROscope Mechatronics Microelectromechanical systems microelectromechanical systems (MEMS) Micromachining Micromechanical devices Micromechanics micromirror Mirrors Optical device fabrication serpentine sidewall (SW) Silicon on insulator technology silicon-on-insulator (SOI) Voltage |
| title | A 2-D Micromachined SOI MEMS Mirror With Sidewall Electrodes for Biomedical Imaging |
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