Technology options for 22nm and beyond

This paper explores the challenges facing the 22nm process generation and beyond. CMOS transistor architectures such as ultra-thin body, FinFET, and nanowire will be compared and contrasted. Mobility enhancements such as channel stress, alternative orientations, and exotic materials will be explored...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Kuhn, Kelin J, Liu, Mark Y, Kennel, Harold
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	CMOS technology Degradation Doping Electrostatics FinFETs Immune system Manufacturing Moore's Law Resource description framework Stress
Online-Zugang:	Volltext bestellen
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