High mobility ambipolar field effect transistors made from large-scale CVD graphitic thin films

Ultrathin graphitic films containing only one or a few graphene layers have received great attention as a promising channel material to make "carbon-based" transistors, particularly for high speed and/or low power electronic devices. Back-gated or front-gated graphene field effect transist...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Helin Cao, Qingkai Yu, Childres, I., Pei, S.S., Chen, Y.P.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 134
container_issue
container_start_page 133
container_title
container_volume
creator Helin Cao
Qingkai Yu
Childres, I.
Pei, S.S.
Chen, Y.P.
description Ultrathin graphitic films containing only one or a few graphene layers have received great attention as a promising channel material to make "carbon-based" transistors, particularly for high speed and/or low power electronic devices. Back-gated or front-gated graphene field effect transistors (GFET) made from exfoliated (from bulk graphite) or epitaxially-grown (by surface decomposition of SiC) graphene layers can show electron and hole mobilities approaching 104 cm2/Vs or higher.
doi_str_mv 10.1109/DRC.2009.5354876
format Conference Proceeding
fullrecord <record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_5354876</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>5354876</ieee_id><sourcerecordid>5354876</sourcerecordid><originalsourceid>FETCH-LOGICAL-i90t-c63e4ef0e322523022f3f6b3630771038b219548f1809850ad84635c526754cc3</originalsourceid><addsrcrecordid>eNo1kE1LAzEYhOMX2NbeBS_5A1vf5M3nUbZqhYIgxWvJbpM2ststSS799y5YT3OYmQdmCHlksGAM7PPyq15wALuQKIXR6opMmeBCoORaX5MJVwIqZSTekLnV5t8z9pZM2NioUGu4J9OcfwAkMiMnZLuK-wPthyZ2sZyp65t4GjqXaIi-21Efgm8LLckdc8xlSJn2budpSENPx9jeV7l1naf195LukzsdYoktLYd4HAldnx_IXXBd9vOLzsjm7XVTr6r15_tH_bKuooVStQq98AE8ci45AucBg2pQIWjNAE3DmR0XBGbAGgluZ4RC2UqutBRtizPy9IeN3vvtKcXepfP28hP-AvDBVq4</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>High mobility ambipolar field effect transistors made from large-scale CVD graphitic thin films</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Helin Cao ; Qingkai Yu ; Childres, I. ; Pei, S.S. ; Chen, Y.P.</creator><creatorcontrib>Helin Cao ; Qingkai Yu ; Childres, I. ; Pei, S.S. ; Chen, Y.P.</creatorcontrib><description>Ultrathin graphitic films containing only one or a few graphene layers have received great attention as a promising channel material to make "carbon-based" transistors, particularly for high speed and/or low power electronic devices. Back-gated or front-gated graphene field effect transistors (GFET) made from exfoliated (from bulk graphite) or epitaxially-grown (by surface decomposition of SiC) graphene layers can show electron and hole mobilities approaching 104 cm2/Vs or higher.</description><identifier>ISSN: 1548-3770</identifier><identifier>ISBN: 9781424435289</identifier><identifier>ISBN: 1424435285</identifier><identifier>EISSN: 2640-6853</identifier><identifier>EISBN: 1424435277</identifier><identifier>EISBN: 9781424435272</identifier><identifier>DOI: 10.1109/DRC.2009.5354876</identifier><language>eng</language><publisher>IEEE</publisher><subject>Electron optics ; Etching ; FETs ; Large-scale systems ; Nanotechnology ; Optical films ; Optical microscopy ; Physics computing ; Semiconductor films ; Thin film transistors</subject><ispartof>2009 Device Research Conference, 2009, p.133-134</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/5354876$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,776,780,785,786,2052,27902,54895</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/5354876$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Helin Cao</creatorcontrib><creatorcontrib>Qingkai Yu</creatorcontrib><creatorcontrib>Childres, I.</creatorcontrib><creatorcontrib>Pei, S.S.</creatorcontrib><creatorcontrib>Chen, Y.P.</creatorcontrib><title>High mobility ambipolar field effect transistors made from large-scale CVD graphitic thin films</title><title>2009 Device Research Conference</title><addtitle>DRC</addtitle><description>Ultrathin graphitic films containing only one or a few graphene layers have received great attention as a promising channel material to make "carbon-based" transistors, particularly for high speed and/or low power electronic devices. Back-gated or front-gated graphene field effect transistors (GFET) made from exfoliated (from bulk graphite) or epitaxially-grown (by surface decomposition of SiC) graphene layers can show electron and hole mobilities approaching 104 cm2/Vs or higher.</description><subject>Electron optics</subject><subject>Etching</subject><subject>FETs</subject><subject>Large-scale systems</subject><subject>Nanotechnology</subject><subject>Optical films</subject><subject>Optical microscopy</subject><subject>Physics computing</subject><subject>Semiconductor films</subject><subject>Thin film transistors</subject><issn>1548-3770</issn><issn>2640-6853</issn><isbn>9781424435289</isbn><isbn>1424435285</isbn><isbn>1424435277</isbn><isbn>9781424435272</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2009</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNo1kE1LAzEYhOMX2NbeBS_5A1vf5M3nUbZqhYIgxWvJbpM2ststSS799y5YT3OYmQdmCHlksGAM7PPyq15wALuQKIXR6opMmeBCoORaX5MJVwIqZSTekLnV5t8z9pZM2NioUGu4J9OcfwAkMiMnZLuK-wPthyZ2sZyp65t4GjqXaIi-21Efgm8LLckdc8xlSJn2budpSENPx9jeV7l1naf195LukzsdYoktLYd4HAldnx_IXXBd9vOLzsjm7XVTr6r15_tH_bKuooVStQq98AE8ci45AucBg2pQIWjNAE3DmR0XBGbAGgluZ4RC2UqutBRtizPy9IeN3vvtKcXepfP28hP-AvDBVq4</recordid><startdate>200906</startdate><enddate>200906</enddate><creator>Helin Cao</creator><creator>Qingkai Yu</creator><creator>Childres, I.</creator><creator>Pei, S.S.</creator><creator>Chen, Y.P.</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>200906</creationdate><title>High mobility ambipolar field effect transistors made from large-scale CVD graphitic thin films</title><author>Helin Cao ; Qingkai Yu ; Childres, I. ; Pei, S.S. ; Chen, Y.P.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i90t-c63e4ef0e322523022f3f6b3630771038b219548f1809850ad84635c526754cc3</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2009</creationdate><topic>Electron optics</topic><topic>Etching</topic><topic>FETs</topic><topic>Large-scale systems</topic><topic>Nanotechnology</topic><topic>Optical films</topic><topic>Optical microscopy</topic><topic>Physics computing</topic><topic>Semiconductor films</topic><topic>Thin film transistors</topic><toplevel>online_resources</toplevel><creatorcontrib>Helin Cao</creatorcontrib><creatorcontrib>Qingkai Yu</creatorcontrib><creatorcontrib>Childres, I.</creatorcontrib><creatorcontrib>Pei, S.S.</creatorcontrib><creatorcontrib>Chen, Y.P.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Helin Cao</au><au>Qingkai Yu</au><au>Childres, I.</au><au>Pei, S.S.</au><au>Chen, Y.P.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>High mobility ambipolar field effect transistors made from large-scale CVD graphitic thin films</atitle><btitle>2009 Device Research Conference</btitle><stitle>DRC</stitle><date>2009-06</date><risdate>2009</risdate><spage>133</spage><epage>134</epage><pages>133-134</pages><issn>1548-3770</issn><eissn>2640-6853</eissn><isbn>9781424435289</isbn><isbn>1424435285</isbn><eisbn>1424435277</eisbn><eisbn>9781424435272</eisbn><abstract>Ultrathin graphitic films containing only one or a few graphene layers have received great attention as a promising channel material to make "carbon-based" transistors, particularly for high speed and/or low power electronic devices. Back-gated or front-gated graphene field effect transistors (GFET) made from exfoliated (from bulk graphite) or epitaxially-grown (by surface decomposition of SiC) graphene layers can show electron and hole mobilities approaching 104 cm2/Vs or higher.</abstract><pub>IEEE</pub><doi>10.1109/DRC.2009.5354876</doi><tpages>2</tpages></addata></record>
fulltext fulltext_linktorsrc
identifier ISSN: 1548-3770
ispartof 2009 Device Research Conference, 2009, p.133-134
issn 1548-3770
2640-6853
language eng
recordid cdi_ieee_primary_5354876
source IEEE Electronic Library (IEL) Conference Proceedings
subjects Electron optics
Etching
FETs
Large-scale systems
Nanotechnology
Optical films
Optical microscopy
Physics computing
Semiconductor films
Thin film transistors
title High mobility ambipolar field effect transistors made from large-scale CVD graphitic thin films
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-05T17%3A40%3A13IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=High%20mobility%20ambipolar%20field%20effect%20transistors%20made%20from%20large-scale%20CVD%20graphitic%20thin%20films&rft.btitle=2009%20Device%20Research%20Conference&rft.au=Helin%20Cao&rft.date=2009-06&rft.spage=133&rft.epage=134&rft.pages=133-134&rft.issn=1548-3770&rft.eissn=2640-6853&rft.isbn=9781424435289&rft.isbn_list=1424435285&rft_id=info:doi/10.1109/DRC.2009.5354876&rft_dat=%3Cieee_6IE%3E5354876%3C/ieee_6IE%3E%3Curl%3E%3C/url%3E&rft.eisbn=1424435277&rft.eisbn_list=9781424435272&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=5354876&rfr_iscdi=true