Challenges for silicon technology scaling in the nanoscale era

The continuous and systematic increase in transistor density and performance, as described in ldquoMoore's Lawrdquo and guided by CMOS scaling theory, has been remarkably successful for the development of silicon technology for the past 40 years. As the silicon industry moves into sub-ten nanom...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	Tze-chiang Chen
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	CMOS technology Composite materials Compressive stress Inorganic materials Moore's Law MOSFETs Nanoscale devices Semiconductor materials Silicon Tensile stress
Online-Zugang:	Volltext bestellen
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