variable frequency microwave excited plasma

Summary form only given, as follows. This paper reports on the use of an agile frequency source in generating plasma. A traveling wave tube (TWT) provides approximately one octave bandwidth and variable power level up to 2 KW. By controlling the frequency, efficient coupling to the load (materials a...

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Hauptverfasser:	Fathi, Z., Wei, J., Garard, R.S., Lauf, R.J., Clausing, R., McMillan, A.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Bandwidth Fault location Frequency Microwave generation Plasma materials processing Plasma properties Plasma sources Plasma waves Position control Surface discharges
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creator	Fathi, Z. Wei, J. Garard, R.S. Lauf, R.J. Clausing, R. McMillan, A.
description	Summary form only given, as follows. This paper reports on the use of an agile frequency source in generating plasma. A traveling wave tube (TWT) provides approximately one octave bandwidth and variable power level up to 2 KW. By controlling the frequency, efficient coupling to the load (materials and/or plasma) can be maintained even as the load is changing in properties or position. Furthermore, the variable frequency power source allows the localization of the plasma discharge in precise areas of interest to specific processes. The excitation frequencies can be continuously swept to scan the plasma across an arbitrary-shaped target surface. Plasma generation and position control is reviewed and experimental results on variable frequency microwave excited plasma are presented.
doi_str_mv	10.1109/PLASMA.1995.531751
format	Conference Proceeding
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This paper reports on the use of an agile frequency source in generating plasma. A traveling wave tube (TWT) provides approximately one octave bandwidth and variable power level up to 2 KW. By controlling the frequency, efficient coupling to the load (materials and/or plasma) can be maintained even as the load is changing in properties or position. Furthermore, the variable frequency power source allows the localization of the plasma discharge in precise areas of interest to specific processes. The excitation frequencies can be continuously swept to scan the plasma across an arbitrary-shaped target surface. Plasma generation and position control is reviewed and experimental results on variable frequency microwave excited plasma are presented.</description><identifier>ISSN: 0730-9244</identifier><identifier>ISBN: 0780326695</identifier><identifier>ISBN: 9780780326699</identifier><identifier>EISSN: 2576-7208</identifier><identifier>DOI: 10.1109/PLASMA.1995.531751</identifier><language>eng</language><publisher>IEEE</publisher><subject>Bandwidth ; Fault location ; Frequency ; Microwave generation ; Plasma materials processing ; Plasma properties ; Plasma sources ; Plasma waves ; Position control ; Surface discharges</subject><ispartof>International Conference on Plasma Science (papers in summary form only received), 1995, p.213</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/531751$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,780,784,789,790,2057,4049,4050,27924,54919</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/531751$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Fathi, Z.</creatorcontrib><creatorcontrib>Wei, J.</creatorcontrib><creatorcontrib>Garard, R.S.</creatorcontrib><creatorcontrib>Lauf, R.J.</creatorcontrib><creatorcontrib>Clausing, R.</creatorcontrib><creatorcontrib>McMillan, A.</creatorcontrib><title>variable frequency microwave excited plasma</title><title>International Conference on Plasma Science (papers in summary form only received)</title><addtitle>PLASMA</addtitle><description>Summary form only given, as follows. This paper reports on the use of an agile frequency source in generating plasma. A traveling wave tube (TWT) provides approximately one octave bandwidth and variable power level up to 2 KW. By controlling the frequency, efficient coupling to the load (materials and/or plasma) can be maintained even as the load is changing in properties or position. Furthermore, the variable frequency power source allows the localization of the plasma discharge in precise areas of interest to specific processes. The excitation frequencies can be continuously swept to scan the plasma across an arbitrary-shaped target surface. Plasma generation and position control is reviewed and experimental results on variable frequency microwave excited plasma are presented.</description><subject>Bandwidth</subject><subject>Fault location</subject><subject>Frequency</subject><subject>Microwave generation</subject><subject>Plasma materials processing</subject><subject>Plasma properties</subject><subject>Plasma sources</subject><subject>Plasma waves</subject><subject>Position control</subject><subject>Surface discharges</subject><issn>0730-9244</issn><issn>2576-7208</issn><isbn>0780326695</isbn><isbn>9780780326699</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>1995</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNp9jssKgkAUQC89ICt_wJX70ObhOM5SomhRENReJrvChJaNZfn3BbXubM7ibA6AR0lIKVHz3Sbdb9OQKiVCwakUtAcOEzIOJCNJH8ZEJoSzOFZiAA6RnASKRdEI3KY5kw-RoJxJB2attkYfS_QLi7cHXvLOr0xur0_doo-v3Nzx5Nelbio9hWGhywbdnyfgrZaHxTowiJjV1lTadtl3h_-Nb8jpNSo</recordid><startdate>1995</startdate><enddate>1995</enddate><creator>Fathi, Z.</creator><creator>Wei, J.</creator><creator>Garard, R.S.</creator><creator>Lauf, R.J.</creator><creator>Clausing, R.</creator><creator>McMillan, A.</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>1995</creationdate><title>variable frequency microwave excited plasma</title><author>Fathi, Z. ; Wei, J. ; Garard, R.S. ; Lauf, R.J. ; Clausing, R. ; McMillan, A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-ieee_primary_5317513</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>1995</creationdate><topic>Bandwidth</topic><topic>Fault location</topic><topic>Frequency</topic><topic>Microwave generation</topic><topic>Plasma materials processing</topic><topic>Plasma properties</topic><topic>Plasma sources</topic><topic>Plasma waves</topic><topic>Position control</topic><topic>Surface discharges</topic><toplevel>online_resources</toplevel><creatorcontrib>Fathi, Z.</creatorcontrib><creatorcontrib>Wei, J.</creatorcontrib><creatorcontrib>Garard, R.S.</creatorcontrib><creatorcontrib>Lauf, R.J.</creatorcontrib><creatorcontrib>Clausing, R.</creatorcontrib><creatorcontrib>McMillan, A.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Fathi, Z.</au><au>Wei, J.</au><au>Garard, R.S.</au><au>Lauf, R.J.</au><au>Clausing, R.</au><au>McMillan, A.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>variable frequency microwave excited plasma</atitle><btitle>International Conference on Plasma Science (papers in summary form only received)</btitle><stitle>PLASMA</stitle><date>1995</date><risdate>1995</risdate><spage>213</spage><pages>213-</pages><issn>0730-9244</issn><eissn>2576-7208</eissn><isbn>0780326695</isbn><isbn>9780780326699</isbn><abstract>Summary form only given, as follows. This paper reports on the use of an agile frequency source in generating plasma. A traveling wave tube (TWT) provides approximately one octave bandwidth and variable power level up to 2 KW. By controlling the frequency, efficient coupling to the load (materials and/or plasma) can be maintained even as the load is changing in properties or position. Furthermore, the variable frequency power source allows the localization of the plasma discharge in precise areas of interest to specific processes. The excitation frequencies can be continuously swept to scan the plasma across an arbitrary-shaped target surface. Plasma generation and position control is reviewed and experimental results on variable frequency microwave excited plasma are presented.</abstract><pub>IEEE</pub><doi>10.1109/PLASMA.1995.531751</doi></addata></record>
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identifier	ISSN: 0730-9244
ispartof	International Conference on Plasma Science (papers in summary form only received), 1995, p.213
issn	0730-9244 2576-7208
language	eng
recordid	cdi_ieee_primary_531751
source	IEEE Electronic Library (IEL) Conference Proceedings
subjects	Bandwidth Fault location Frequency Microwave generation Plasma materials processing Plasma properties Plasma sources Plasma waves Position control Surface discharges
title	variable frequency microwave excited plasma
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