PECVD deposition of a-B/C on Si using a surface-ECR plasma source and o-carborane precursor gas
Summary form only given, as follows. Vacuum wall deposition of a-B/C films has had tremendous positive impact on the performance of tokamak fusion reactors. In the present work, sublimed gas from o-carborane and helium carrier gas are used to create a plasma using the surface-ECR source. The plasma...
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