Kinematic analysis of the reticle stage for lithography with gamma ratio mapping method

This paper presents kinematic analysis of a vertical type 6 DOF reticle stage for lithography process and a novel mapping method using a ratio of input-output relationship. The vertical type reticle stage system was designed for installing masks in photo-lithography process, and controlled using six...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Min-taek Oh, Jung-han Kim
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	algorithm Coils Control systems Gap sensor Hysteresis motors Kinematics Lithography Mapping Mechanical sensors Micromotors Process control Reticle stage Sensor systems Springs
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