Effects of guard bands and well contacts in mitigating long SETs in advanced CMOS processes
Mixed mode TCAD simulations are used to show the effects of guard bands and high density well contacts in maintaining the well potential after a single event strike and thus reduce the width of long transients in a 130-nm CMOS process. Experimental verification of the effectiveness in mitigating lon...
Gespeichert in:
Hauptverfasser: | , , , , , , , , , , |
---|---|
Format: | Tagungsbericht |
Sprache: | eng ; jpn |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!