Growth of n-type multicrystalline silicon ingots from recycled CZ silicon feedstock

5 Ω·cm recycled n-type CZ silicon feedstock is used to grow n-type multicrystalline silicon to investigate the possibilities of using other feedstock resources available from the rejected silicon of the semiconductor industry. High diffusion lengths were realized near the bottom region due to the le...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Dhamrin, M., Uzum, A., Saitoh, T., Yamaga, I., Kamisako, K.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 4
container_issue
container_start_page 1
container_title
container_volume
creator Dhamrin, M.
Uzum, A.
Saitoh, T.
Yamaga, I.
Kamisako, K.
description 5 Ω·cm recycled n-type CZ silicon feedstock is used to grow n-type multicrystalline silicon to investigate the possibilities of using other feedstock resources available from the rejected silicon of the semiconductor industry. High diffusion lengths were realized near the bottom region due to the less impurity contamination and relatively high resistivity. The heavy accumulation of metal impurities and lower resistivity at the top of the ingot resulted in a poor diffusion length. The edges have lower diffusion lengths due to the different metallic contaminations diffused from the silicon nitride coating layer during the growth cycle. The response of the wafers to p-gettering was ascertained and carrier lifetimes improved further especially at the bottom of the ingot. The improvement was realized for a total of 80% of the ingot height with higher lifetimes exceeding values above 250 μs at Δn = 10 15 cm −3 and 400 ·s at Δn = 10 14 cm −3 .
doi_str_mv 10.1109/PVSC.2008.4922784
format Conference Proceeding
fullrecord <record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_4922784</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>4922784</ieee_id><sourcerecordid>4922784</sourcerecordid><originalsourceid>FETCH-LOGICAL-i90t-499fac830ed949051c9f5e6d6bd240e32af45a7f503cf2129a67d58f771db823</originalsourceid><addsrcrecordid>eNo9kM1KAzEUhSNasK19AHGTF5h6b5KZJEsZtAoFhREXbkqaH41OZ8okIvP2FayuDuc78C0OIZcIS0TQ108vTb1kAGopNGNSiRMyQ8GEwEqgOiULLdVfBzgjU8AKCsUlTshUieKHomLnZJbSBwADXuGUNKuh_87vtA-0K_K493T31eZohzFl07ax8zTFNtq-o7F763OiYeh3dPB2tK13tH7934P3LuXefl6QSTBt8otjzklzd_tc3xfrx9VDfbMuooZcCK2DsYqDd1poKNHqUPrKVVvHBHjOTBClkaEEbgNDpk0lXamClOi2ivE5ufq1Ru_9Zj_EnRnGzfEafgAVE1R8</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Growth of n-type multicrystalline silicon ingots from recycled CZ silicon feedstock</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Dhamrin, M. ; Uzum, A. ; Saitoh, T. ; Yamaga, I. ; Kamisako, K.</creator><creatorcontrib>Dhamrin, M. ; Uzum, A. ; Saitoh, T. ; Yamaga, I. ; Kamisako, K.</creatorcontrib><description>5 Ω·cm recycled n-type CZ silicon feedstock is used to grow n-type multicrystalline silicon to investigate the possibilities of using other feedstock resources available from the rejected silicon of the semiconductor industry. High diffusion lengths were realized near the bottom region due to the less impurity contamination and relatively high resistivity. The heavy accumulation of metal impurities and lower resistivity at the top of the ingot resulted in a poor diffusion length. The edges have lower diffusion lengths due to the different metallic contaminations diffused from the silicon nitride coating layer during the growth cycle. The response of the wafers to p-gettering was ascertained and carrier lifetimes improved further especially at the bottom of the ingot. The improvement was realized for a total of 80% of the ingot height with higher lifetimes exceeding values above 250 μs at Δn = 10 15 cm −3 and 400 ·s at Δn = 10 14 cm −3 .</description><identifier>ISSN: 0160-8371</identifier><identifier>ISBN: 9781424416400</identifier><identifier>ISBN: 142441640X</identifier><identifier>EISBN: 1424416418</identifier><identifier>EISBN: 9781424416417</identifier><identifier>DOI: 10.1109/PVSC.2008.4922784</identifier><identifier>LCCN: 84-640182</identifier><language>eng</language><publisher>IEEE</publisher><subject>Charge carrier lifetime ; Coatings ; Conductivity ; Contamination ; Crystalline materials ; Electronics industry ; Furnaces ; Photovoltaic cells ; Semiconductor impurities ; Silicon</subject><ispartof>2008 33rd IEEE Photovoltaic Specialists Conference, 2008, p.1-4</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/4922784$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>310,311,781,785,790,791,2059,27930,54925</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/4922784$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Dhamrin, M.</creatorcontrib><creatorcontrib>Uzum, A.</creatorcontrib><creatorcontrib>Saitoh, T.</creatorcontrib><creatorcontrib>Yamaga, I.</creatorcontrib><creatorcontrib>Kamisako, K.</creatorcontrib><title>Growth of n-type multicrystalline silicon ingots from recycled CZ silicon feedstock</title><title>2008 33rd IEEE Photovoltaic Specialists Conference</title><addtitle>PVSC</addtitle><description>5 Ω·cm recycled n-type CZ silicon feedstock is used to grow n-type multicrystalline silicon to investigate the possibilities of using other feedstock resources available from the rejected silicon of the semiconductor industry. High diffusion lengths were realized near the bottom region due to the less impurity contamination and relatively high resistivity. The heavy accumulation of metal impurities and lower resistivity at the top of the ingot resulted in a poor diffusion length. The edges have lower diffusion lengths due to the different metallic contaminations diffused from the silicon nitride coating layer during the growth cycle. The response of the wafers to p-gettering was ascertained and carrier lifetimes improved further especially at the bottom of the ingot. The improvement was realized for a total of 80% of the ingot height with higher lifetimes exceeding values above 250 μs at Δn = 10 15 cm −3 and 400 ·s at Δn = 10 14 cm −3 .</description><subject>Charge carrier lifetime</subject><subject>Coatings</subject><subject>Conductivity</subject><subject>Contamination</subject><subject>Crystalline materials</subject><subject>Electronics industry</subject><subject>Furnaces</subject><subject>Photovoltaic cells</subject><subject>Semiconductor impurities</subject><subject>Silicon</subject><issn>0160-8371</issn><isbn>9781424416400</isbn><isbn>142441640X</isbn><isbn>1424416418</isbn><isbn>9781424416417</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2008</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNo9kM1KAzEUhSNasK19AHGTF5h6b5KZJEsZtAoFhREXbkqaH41OZ8okIvP2FayuDuc78C0OIZcIS0TQ108vTb1kAGopNGNSiRMyQ8GEwEqgOiULLdVfBzgjU8AKCsUlTshUieKHomLnZJbSBwADXuGUNKuh_87vtA-0K_K493T31eZohzFl07ax8zTFNtq-o7F763OiYeh3dPB2tK13tH7934P3LuXefl6QSTBt8otjzklzd_tc3xfrx9VDfbMuooZcCK2DsYqDd1poKNHqUPrKVVvHBHjOTBClkaEEbgNDpk0lXamClOi2ivE5ufq1Ru_9Zj_EnRnGzfEafgAVE1R8</recordid><startdate>200805</startdate><enddate>200805</enddate><creator>Dhamrin, M.</creator><creator>Uzum, A.</creator><creator>Saitoh, T.</creator><creator>Yamaga, I.</creator><creator>Kamisako, K.</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope></search><sort><creationdate>200805</creationdate><title>Growth of n-type multicrystalline silicon ingots from recycled CZ silicon feedstock</title><author>Dhamrin, M. ; Uzum, A. ; Saitoh, T. ; Yamaga, I. ; Kamisako, K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i90t-499fac830ed949051c9f5e6d6bd240e32af45a7f503cf2129a67d58f771db823</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2008</creationdate><topic>Charge carrier lifetime</topic><topic>Coatings</topic><topic>Conductivity</topic><topic>Contamination</topic><topic>Crystalline materials</topic><topic>Electronics industry</topic><topic>Furnaces</topic><topic>Photovoltaic cells</topic><topic>Semiconductor impurities</topic><topic>Silicon</topic><toplevel>online_resources</toplevel><creatorcontrib>Dhamrin, M.</creatorcontrib><creatorcontrib>Uzum, A.</creatorcontrib><creatorcontrib>Saitoh, T.</creatorcontrib><creatorcontrib>Yamaga, I.</creatorcontrib><creatorcontrib>Kamisako, K.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Dhamrin, M.</au><au>Uzum, A.</au><au>Saitoh, T.</au><au>Yamaga, I.</au><au>Kamisako, K.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Growth of n-type multicrystalline silicon ingots from recycled CZ silicon feedstock</atitle><btitle>2008 33rd IEEE Photovoltaic Specialists Conference</btitle><stitle>PVSC</stitle><date>2008-05</date><risdate>2008</risdate><spage>1</spage><epage>4</epage><pages>1-4</pages><issn>0160-8371</issn><isbn>9781424416400</isbn><isbn>142441640X</isbn><eisbn>1424416418</eisbn><eisbn>9781424416417</eisbn><abstract>5 Ω·cm recycled n-type CZ silicon feedstock is used to grow n-type multicrystalline silicon to investigate the possibilities of using other feedstock resources available from the rejected silicon of the semiconductor industry. High diffusion lengths were realized near the bottom region due to the less impurity contamination and relatively high resistivity. The heavy accumulation of metal impurities and lower resistivity at the top of the ingot resulted in a poor diffusion length. The edges have lower diffusion lengths due to the different metallic contaminations diffused from the silicon nitride coating layer during the growth cycle. The response of the wafers to p-gettering was ascertained and carrier lifetimes improved further especially at the bottom of the ingot. The improvement was realized for a total of 80% of the ingot height with higher lifetimes exceeding values above 250 μs at Δn = 10 15 cm −3 and 400 ·s at Δn = 10 14 cm −3 .</abstract><pub>IEEE</pub><doi>10.1109/PVSC.2008.4922784</doi><tpages>4</tpages></addata></record>
fulltext fulltext_linktorsrc
identifier ISSN: 0160-8371
ispartof 2008 33rd IEEE Photovoltaic Specialists Conference, 2008, p.1-4
issn 0160-8371
language eng
recordid cdi_ieee_primary_4922784
source IEEE Electronic Library (IEL) Conference Proceedings
subjects Charge carrier lifetime
Coatings
Conductivity
Contamination
Crystalline materials
Electronics industry
Furnaces
Photovoltaic cells
Semiconductor impurities
Silicon
title Growth of n-type multicrystalline silicon ingots from recycled CZ silicon feedstock
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-12T03%3A59%3A44IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Growth%20of%20n-type%20multicrystalline%20silicon%20ingots%20from%20recycled%20CZ%20silicon%20feedstock&rft.btitle=2008%2033rd%20IEEE%20Photovoltaic%20Specialists%20Conference&rft.au=Dhamrin,%20M.&rft.date=2008-05&rft.spage=1&rft.epage=4&rft.pages=1-4&rft.issn=0160-8371&rft.isbn=9781424416400&rft.isbn_list=142441640X&rft_id=info:doi/10.1109/PVSC.2008.4922784&rft_dat=%3Cieee_6IE%3E4922784%3C/ieee_6IE%3E%3Curl%3E%3C/url%3E&rft.eisbn=1424416418&rft.eisbn_list=9781424416417&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=4922784&rfr_iscdi=true