Optimization of 3D-SMODFETs on GaAs and InP substrates with a simple analytical model

Using a simple analytical method followed by a computer program that solves the detailed quantum-mechanics, it is possible to design the optimum material structures for pseudomorphic MODFETs with full channels. Using a MODFET with a pseudomorphic graded channel, and atomic planar doped pseudomorphic...

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Hauptverfasser: Martin, G.H., Seaford, M.L., Spencer, R., Braunstein, J., Eastman, L.F.
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Braunstein, J.
Eastman, L.F.
description Using a simple analytical method followed by a computer program that solves the detailed quantum-mechanics, it is possible to design the optimum material structures for pseudomorphic MODFETs with full channels. Using a MODFET with a pseudomorphic graded channel, and atomic planar doped pseudomorphic barriers on both sides of the channel, it is possible to achieve record-breaking electron sheet densities in the channel without having carriers in the barrier (Double-Doped Double-Strained MODFET, 3D-SMODFET). This theory is used to predicted the optimum material designs (quantum-mechanical solution) for GaAs, InP and GaN based structures.
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subjects Analytical models
Gallium arsenide
HEMTs
Impurities
Indium phosphide
Lattices
MODFETs
Photonic band gap
Sheet materials
Substrates
title Optimization of 3D-SMODFETs on GaAs and InP substrates with a simple analytical model
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