Deposition, processing and characterization of P(VDF-TrFE) thin films for sensing applications
This work presents wafer level deposition of thin polyvinylidene fluoride-trifluoroethylene P(VDF-TrFE) films by spin coating and their further patterning by dry etching. Uniform and controlled thicknesses were obtained over a large area (4 inch Si wafer) by varying the concentration of solution and...
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| creator | Dahiya, R.S. Valle, M. Metta, G. Lorenzelli, L. Pedrotti, S. |
| description | This work presents wafer level deposition of thin polyvinylidene fluoride-trifluoroethylene P(VDF-TrFE) films by spin coating and their further patterning by dry etching. Uniform and controlled thicknesses were obtained over a large area (4 inch Si wafer) by varying the concentration of solution and the spinnerpsilas speed. Absence of any standard method makes it difficult to etch the polymer films from places like pads. A new dry etch recipe, developed for this purpose was used for the selective etching of polymer films. In situ polarization of the polymer film has also been addressed. |
| doi_str_mv | 10.1109/ICSENS.2008.4716484 |
| format | Conference Proceeding |
| fullrecord | <record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_4716484</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>4716484</ieee_id><sourcerecordid>4716484</sourcerecordid><originalsourceid>FETCH-LOGICAL-i90t-e2132b28342a4bff81431832f2603098b19a9372684c73cfdefb31d378060ef3</originalsourceid><addsrcrecordid>eNpFkD1PwzAURc2XRFv4BV08gkTKe89uYo8oTaFSBUitGKmcxKZGbRLZWeDXI2glpjuce-5wGRsjTBBB3y_yVfG8mhCAmsgMU6nkCRuiJClpqjA9ZQPCVCWaSJ_9A1DnbIBaQAJCTy_ZMMZPAIIpqQF7n9mujb73bXPHu9BWNkbffHDT1LzammCq3gb_bX4LvHX89eZtNk_WYV7c8n7rG-78bh-5awOPtjmoXbfz1Z8Rr9iFM7tor485Yqt5sc6fkuXL4yJ_WCZeQ59YQkElKSHJyNI5hVKgEuQoBQFalaiNFhmlSlaZqFxtXSmwFpmCFKwTIzY-rHpr7aYLfm_C1-Z4kfgBS2tWpQ</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Deposition, processing and characterization of P(VDF-TrFE) thin films for sensing applications</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Dahiya, R.S. ; Valle, M. ; Metta, G. ; Lorenzelli, L. ; Pedrotti, S.</creator><creatorcontrib>Dahiya, R.S. ; Valle, M. ; Metta, G. ; Lorenzelli, L. ; Pedrotti, S.</creatorcontrib><description>This work presents wafer level deposition of thin polyvinylidene fluoride-trifluoroethylene P(VDF-TrFE) films by spin coating and their further patterning by dry etching. Uniform and controlled thicknesses were obtained over a large area (4 inch Si wafer) by varying the concentration of solution and the spinnerpsilas speed. Absence of any standard method makes it difficult to etch the polymer films from places like pads. A new dry etch recipe, developed for this purpose was used for the selective etching of polymer films. In situ polarization of the polymer film has also been addressed.</description><identifier>ISSN: 1930-0395</identifier><identifier>ISBN: 1424425808</identifier><identifier>ISBN: 9781424425808</identifier><identifier>EISSN: 2168-9229</identifier><identifier>EISBN: 1424425816</identifier><identifier>EISBN: 9781424425815</identifier><identifier>DOI: 10.1109/ICSENS.2008.4716484</identifier><language>eng</language><publisher>IEEE</publisher><subject>Coatings ; Dry etching ; FETs ; Mechanical sensors ; Piezoelectric films ; Polarization ; Polymer films ; Sensor arrays ; Sputtering ; Thickness control</subject><ispartof>2008 IEEE Sensors, 2008, p.490-493</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/4716484$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,776,780,785,786,2052,27902,54895</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/4716484$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Dahiya, R.S.</creatorcontrib><creatorcontrib>Valle, M.</creatorcontrib><creatorcontrib>Metta, G.</creatorcontrib><creatorcontrib>Lorenzelli, L.</creatorcontrib><creatorcontrib>Pedrotti, S.</creatorcontrib><title>Deposition, processing and characterization of P(VDF-TrFE) thin films for sensing applications</title><title>2008 IEEE Sensors</title><addtitle>ICSENS</addtitle><description>This work presents wafer level deposition of thin polyvinylidene fluoride-trifluoroethylene P(VDF-TrFE) films by spin coating and their further patterning by dry etching. Uniform and controlled thicknesses were obtained over a large area (4 inch Si wafer) by varying the concentration of solution and the spinnerpsilas speed. Absence of any standard method makes it difficult to etch the polymer films from places like pads. A new dry etch recipe, developed for this purpose was used for the selective etching of polymer films. In situ polarization of the polymer film has also been addressed.</description><subject>Coatings</subject><subject>Dry etching</subject><subject>FETs</subject><subject>Mechanical sensors</subject><subject>Piezoelectric films</subject><subject>Polarization</subject><subject>Polymer films</subject><subject>Sensor arrays</subject><subject>Sputtering</subject><subject>Thickness control</subject><issn>1930-0395</issn><issn>2168-9229</issn><isbn>1424425808</isbn><isbn>9781424425808</isbn><isbn>1424425816</isbn><isbn>9781424425815</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2008</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNpFkD1PwzAURc2XRFv4BV08gkTKe89uYo8oTaFSBUitGKmcxKZGbRLZWeDXI2glpjuce-5wGRsjTBBB3y_yVfG8mhCAmsgMU6nkCRuiJClpqjA9ZQPCVCWaSJ_9A1DnbIBaQAJCTy_ZMMZPAIIpqQF7n9mujb73bXPHu9BWNkbffHDT1LzammCq3gb_bX4LvHX89eZtNk_WYV7c8n7rG-78bh-5awOPtjmoXbfz1Z8Rr9iFM7tor485Yqt5sc6fkuXL4yJ_WCZeQ59YQkElKSHJyNI5hVKgEuQoBQFalaiNFhmlSlaZqFxtXSmwFpmCFKwTIzY-rHpr7aYLfm_C1-Z4kfgBS2tWpQ</recordid><startdate>200810</startdate><enddate>200810</enddate><creator>Dahiya, R.S.</creator><creator>Valle, M.</creator><creator>Metta, G.</creator><creator>Lorenzelli, L.</creator><creator>Pedrotti, S.</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope></search><sort><creationdate>200810</creationdate><title>Deposition, processing and characterization of P(VDF-TrFE) thin films for sensing applications</title><author>Dahiya, R.S. ; Valle, M. ; Metta, G. ; Lorenzelli, L. ; Pedrotti, S.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i90t-e2132b28342a4bff81431832f2603098b19a9372684c73cfdefb31d378060ef3</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2008</creationdate><topic>Coatings</topic><topic>Dry etching</topic><topic>FETs</topic><topic>Mechanical sensors</topic><topic>Piezoelectric films</topic><topic>Polarization</topic><topic>Polymer films</topic><topic>Sensor arrays</topic><topic>Sputtering</topic><topic>Thickness control</topic><toplevel>online_resources</toplevel><creatorcontrib>Dahiya, R.S.</creatorcontrib><creatorcontrib>Valle, M.</creatorcontrib><creatorcontrib>Metta, G.</creatorcontrib><creatorcontrib>Lorenzelli, L.</creatorcontrib><creatorcontrib>Pedrotti, S.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Dahiya, R.S.</au><au>Valle, M.</au><au>Metta, G.</au><au>Lorenzelli, L.</au><au>Pedrotti, S.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Deposition, processing and characterization of P(VDF-TrFE) thin films for sensing applications</atitle><btitle>2008 IEEE Sensors</btitle><stitle>ICSENS</stitle><date>2008-10</date><risdate>2008</risdate><spage>490</spage><epage>493</epage><pages>490-493</pages><issn>1930-0395</issn><eissn>2168-9229</eissn><isbn>1424425808</isbn><isbn>9781424425808</isbn><eisbn>1424425816</eisbn><eisbn>9781424425815</eisbn><abstract>This work presents wafer level deposition of thin polyvinylidene fluoride-trifluoroethylene P(VDF-TrFE) films by spin coating and their further patterning by dry etching. Uniform and controlled thicknesses were obtained over a large area (4 inch Si wafer) by varying the concentration of solution and the spinnerpsilas speed. Absence of any standard method makes it difficult to etch the polymer films from places like pads. A new dry etch recipe, developed for this purpose was used for the selective etching of polymer films. In situ polarization of the polymer film has also been addressed.</abstract><pub>IEEE</pub><doi>10.1109/ICSENS.2008.4716484</doi><tpages>4</tpages></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | ISSN: 1930-0395 |
| ispartof | 2008 IEEE Sensors, 2008, p.490-493 |
| issn | 1930-0395 2168-9229 |
| language | eng |
| recordid | cdi_ieee_primary_4716484 |
| source | IEEE Electronic Library (IEL) Conference Proceedings |
| subjects | Coatings Dry etching FETs Mechanical sensors Piezoelectric films Polarization Polymer films Sensor arrays Sputtering Thickness control |
| title | Deposition, processing and characterization of P(VDF-TrFE) thin films for sensing applications |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-09T07%3A22%3A22IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Deposition,%20processing%20and%20characterization%20of%20P(VDF-TrFE)%20thin%20films%20for%20sensing%20applications&rft.btitle=2008%20IEEE%20Sensors&rft.au=Dahiya,%20R.S.&rft.date=2008-10&rft.spage=490&rft.epage=493&rft.pages=490-493&rft.issn=1930-0395&rft.eissn=2168-9229&rft.isbn=1424425808&rft.isbn_list=9781424425808&rft_id=info:doi/10.1109/ICSENS.2008.4716484&rft_dat=%3Cieee_6IE%3E4716484%3C/ieee_6IE%3E%3Curl%3E%3C/url%3E&rft.eisbn=1424425816&rft.eisbn_list=9781424425815&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=4716484&rfr_iscdi=true |