A new cell structure for very thin high-efficiency silicon solar cells

The cell has a corrugated structure, which is formed by aligned V grooves on both the front and back surfaces. The substrate thickness is reduced to 50 mu m while retaining high mechanical strength. This permits ease of handling during the fabrication process and subsequent procedures. This thin sub...

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Veröffentlicht in:IEEE transactions on electron devices 1990-02, Vol.37 (2), p.344-347
Hauptverfasser: Uematsu, T., Ida, M., Hane, K., Kokunai, S., Saitoh, T.
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container_end_page 347
container_issue 2
container_start_page 344
container_title IEEE transactions on electron devices
container_volume 37
creator Uematsu, T.
Ida, M.
Hane, K.
Kokunai, S.
Saitoh, T.
description The cell has a corrugated structure, which is formed by aligned V grooves on both the front and back surfaces. The substrate thickness is reduced to 50 mu m while retaining high mechanical strength. This permits ease of handling during the fabrication process and subsequent procedures. This thin substrate promises a very high open-circuit voltage, and the structure is also beneficial to high optical performance. The surface reflectance is reduced in the same manner as that of V-grooved cells, but the optical path is lengthened by a minimum of four times the substrate thickness. Performance of experimental cells is also discussed.< >
doi_str_mv 10.1109/16.46363
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fullrecord <record><control><sourceid>proquest_RIE</sourceid><recordid>TN_cdi_ieee_primary_46363</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>46363</ieee_id><sourcerecordid>25806885</sourcerecordid><originalsourceid>FETCH-LOGICAL-c365t-1b9cf45c7ba2383b9d161992f3ba26e7fb4135f1d85409827a8c04f055c41ecc3</originalsourceid><addsrcrecordid>eNqNkE1LAzEQhoMoWKvg1VsOIl62ZjYfmxxLsSoUvOg5ZNPERra7NdlV-u_ddkuvehpm5pmHl0HoGsgEgKgHEBMmqKAnaAScF5kSTJyiESEgM0UlPUcXKX32rWAsH6H5FNfuB1tXVTi1sbNtFx32TcTfLm5xuwo1XoWPVea8Dza42m5xClWwTY1TU5m4P02X6MybKrmrQx2j9_nj2-w5W7w-vcymi8xSwdsMSmU947YoTd5nKdUSBCiVe9oPhCt8yYByD0vJGVEyL4y0hHnCuWXgrKVjdDd4N7H56lxq9TqkXQJTu6ZLOpesoMDl3yCXREjJ_wEWSgnFevB-AG1sUorO600MaxO3GojevV6D0PvX9-jtwWmSNZWPprYhHfnexpjYGW8GLDjnjttB8QvK1Ilv</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>25799694</pqid></control><display><type>article</type><title>A new cell structure for very thin high-efficiency silicon solar cells</title><source>IEEE Electronic Library (IEL)</source><creator>Uematsu, T. ; Ida, M. ; Hane, K. ; Kokunai, S. ; Saitoh, T.</creator><creatorcontrib>Uematsu, T. ; Ida, M. ; Hane, K. ; Kokunai, S. ; Saitoh, T.</creatorcontrib><description>The cell has a corrugated structure, which is formed by aligned V grooves on both the front and back surfaces. The substrate thickness is reduced to 50 mu m while retaining high mechanical strength. This permits ease of handling during the fabrication process and subsequent procedures. This thin substrate promises a very high open-circuit voltage, and the structure is also beneficial to high optical performance. The surface reflectance is reduced in the same manner as that of V-grooved cells, but the optical path is lengthened by a minimum of four times the substrate thickness. Performance of experimental cells is also discussed.&lt; &gt;</description><identifier>ISSN: 0018-9383</identifier><identifier>EISSN: 1557-9646</identifier><identifier>DOI: 10.1109/16.46363</identifier><identifier>CODEN: IETDAI</identifier><language>eng</language><publisher>New York, NY: IEEE</publisher><subject>Applied sciences ; Charge carrier lifetime ; Corrugated surfaces ; Energy ; Etching ; Exact sciences and technology ; Laboratories ; Natural energy ; Optical device fabrication ; Photovoltaic cells ; Reflectivity ; Silicon ; Solar energy ; Solar thermal conversion ; Stress ; Voltage</subject><ispartof>IEEE transactions on electron devices, 1990-02, Vol.37 (2), p.344-347</ispartof><rights>1990 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c365t-1b9cf45c7ba2383b9d161992f3ba26e7fb4135f1d85409827a8c04f055c41ecc3</citedby><cites>FETCH-LOGICAL-c365t-1b9cf45c7ba2383b9d161992f3ba26e7fb4135f1d85409827a8c04f055c41ecc3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/46363$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,776,780,792,27901,27902,54733</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/46363$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=6944464$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Uematsu, T.</creatorcontrib><creatorcontrib>Ida, M.</creatorcontrib><creatorcontrib>Hane, K.</creatorcontrib><creatorcontrib>Kokunai, S.</creatorcontrib><creatorcontrib>Saitoh, T.</creatorcontrib><title>A new cell structure for very thin high-efficiency silicon solar cells</title><title>IEEE transactions on electron devices</title><addtitle>TED</addtitle><description>The cell has a corrugated structure, which is formed by aligned V grooves on both the front and back surfaces. The substrate thickness is reduced to 50 mu m while retaining high mechanical strength. This permits ease of handling during the fabrication process and subsequent procedures. This thin substrate promises a very high open-circuit voltage, and the structure is also beneficial to high optical performance. The surface reflectance is reduced in the same manner as that of V-grooved cells, but the optical path is lengthened by a minimum of four times the substrate thickness. Performance of experimental cells is also discussed.&lt; &gt;</description><subject>Applied sciences</subject><subject>Charge carrier lifetime</subject><subject>Corrugated surfaces</subject><subject>Energy</subject><subject>Etching</subject><subject>Exact sciences and technology</subject><subject>Laboratories</subject><subject>Natural energy</subject><subject>Optical device fabrication</subject><subject>Photovoltaic cells</subject><subject>Reflectivity</subject><subject>Silicon</subject><subject>Solar energy</subject><subject>Solar thermal conversion</subject><subject>Stress</subject><subject>Voltage</subject><issn>0018-9383</issn><issn>1557-9646</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1990</creationdate><recordtype>article</recordtype><recordid>eNqNkE1LAzEQhoMoWKvg1VsOIl62ZjYfmxxLsSoUvOg5ZNPERra7NdlV-u_ddkuvehpm5pmHl0HoGsgEgKgHEBMmqKAnaAScF5kSTJyiESEgM0UlPUcXKX32rWAsH6H5FNfuB1tXVTi1sbNtFx32TcTfLm5xuwo1XoWPVea8Dza42m5xClWwTY1TU5m4P02X6MybKrmrQx2j9_nj2-w5W7w-vcymi8xSwdsMSmU947YoTd5nKdUSBCiVe9oPhCt8yYByD0vJGVEyL4y0hHnCuWXgrKVjdDd4N7H56lxq9TqkXQJTu6ZLOpesoMDl3yCXREjJ_wEWSgnFevB-AG1sUorO600MaxO3GojevV6D0PvX9-jtwWmSNZWPprYhHfnexpjYGW8GLDjnjttB8QvK1Ilv</recordid><startdate>19900201</startdate><enddate>19900201</enddate><creator>Uematsu, T.</creator><creator>Ida, M.</creator><creator>Hane, K.</creator><creator>Kokunai, S.</creator><creator>Saitoh, T.</creator><general>IEEE</general><general>Institute of Electrical and Electronics Engineers</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope><scope>7SP</scope></search><sort><creationdate>19900201</creationdate><title>A new cell structure for very thin high-efficiency silicon solar cells</title><author>Uematsu, T. ; Ida, M. ; Hane, K. ; Kokunai, S. ; Saitoh, T.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c365t-1b9cf45c7ba2383b9d161992f3ba26e7fb4135f1d85409827a8c04f055c41ecc3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1990</creationdate><topic>Applied sciences</topic><topic>Charge carrier lifetime</topic><topic>Corrugated surfaces</topic><topic>Energy</topic><topic>Etching</topic><topic>Exact sciences and technology</topic><topic>Laboratories</topic><topic>Natural energy</topic><topic>Optical device fabrication</topic><topic>Photovoltaic cells</topic><topic>Reflectivity</topic><topic>Silicon</topic><topic>Solar energy</topic><topic>Solar thermal conversion</topic><topic>Stress</topic><topic>Voltage</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Uematsu, T.</creatorcontrib><creatorcontrib>Ida, M.</creatorcontrib><creatorcontrib>Hane, K.</creatorcontrib><creatorcontrib>Kokunai, S.</creatorcontrib><creatorcontrib>Saitoh, T.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Electronics &amp; Communications Abstracts</collection><jtitle>IEEE transactions on electron devices</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Uematsu, T.</au><au>Ida, M.</au><au>Hane, K.</au><au>Kokunai, S.</au><au>Saitoh, T.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>A new cell structure for very thin high-efficiency silicon solar cells</atitle><jtitle>IEEE transactions on electron devices</jtitle><stitle>TED</stitle><date>1990-02-01</date><risdate>1990</risdate><volume>37</volume><issue>2</issue><spage>344</spage><epage>347</epage><pages>344-347</pages><issn>0018-9383</issn><eissn>1557-9646</eissn><coden>IETDAI</coden><abstract>The cell has a corrugated structure, which is formed by aligned V grooves on both the front and back surfaces. The substrate thickness is reduced to 50 mu m while retaining high mechanical strength. This permits ease of handling during the fabrication process and subsequent procedures. This thin substrate promises a very high open-circuit voltage, and the structure is also beneficial to high optical performance. The surface reflectance is reduced in the same manner as that of V-grooved cells, but the optical path is lengthened by a minimum of four times the substrate thickness. Performance of experimental cells is also discussed.&lt; &gt;</abstract><cop>New York, NY</cop><pub>IEEE</pub><doi>10.1109/16.46363</doi><tpages>4</tpages></addata></record>
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subjects Applied sciences
Charge carrier lifetime
Corrugated surfaces
Energy
Etching
Exact sciences and technology
Laboratories
Natural energy
Optical device fabrication
Photovoltaic cells
Reflectivity
Silicon
Solar energy
Solar thermal conversion
Stress
Voltage
title A new cell structure for very thin high-efficiency silicon solar cells
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-12T21%3A09%3A01IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_RIE&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=A%20new%20cell%20structure%20for%20very%20thin%20high-efficiency%20silicon%20solar%20cells&rft.jtitle=IEEE%20transactions%20on%20electron%20devices&rft.au=Uematsu,%20T.&rft.date=1990-02-01&rft.volume=37&rft.issue=2&rft.spage=344&rft.epage=347&rft.pages=344-347&rft.issn=0018-9383&rft.eissn=1557-9646&rft.coden=IETDAI&rft_id=info:doi/10.1109/16.46363&rft_dat=%3Cproquest_RIE%3E25806885%3C/proquest_RIE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=25799694&rft_id=info:pmid/&rft_ieee_id=46363&rfr_iscdi=true