Effect of single grain boundary position on surrounding-gate polysilicon thin film transistors

In this paper, single-grain-boundary-position-induced electrical characteristic variations in 300 nm surrounding-gate (i.e, gate-all-around, GAA) polysilicon thin film transistors (TFTs) are numerically investigated. For a 2T1C active-matrix circuit, a three-dimensional device-circuit coupled mixed-...

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Hauptverfasser: Yiming Li, Huang, J.Y., Bo-Shian Lee, Chih-Hong Hwang
Format: Tagungsbericht
Sprache:eng
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