A simple modeling of the early voltage of MOSFETs in weak and moderate inversion
This paper presents a simple model of the Early voltage for the MOS transistor operating in weak and moderate inversion. The model is based on a decomposition of the transistor channel into a region where the gradual-channel approximation holds and a region that is modeled as a reverse-biased juntio...
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creator | Radin, R. L. Moreira, G. L. Galup-Montoro, C. Schneider, M. C. |
description | This paper presents a simple model of the Early voltage for the MOS transistor operating in weak and moderate inversion. The model is based on a decomposition of the transistor channel into a region where the gradual-channel approximation holds and a region that is modeled as a reverse-biased juntion. Measurements of the characteristics of both nand p-channel transistors with different channel lengths in a 0.35 μm technology demonstrate the feasibility of the proposed model. |
doi_str_mv | 10.1109/ISCAS.2008.4541769 |
format | Conference Proceeding |
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L. ; Moreira, G. L. ; Galup-Montoro, C. ; Schneider, M. C.</creator><creatorcontrib>Radin, R. L. ; Moreira, G. L. ; Galup-Montoro, C. ; Schneider, M. C.</creatorcontrib><description>This paper presents a simple model of the Early voltage for the MOS transistor operating in weak and moderate inversion. The model is based on a decomposition of the transistor channel into a region where the gradual-channel approximation holds and a region that is modeled as a reverse-biased juntion. Measurements of the characteristics of both nand p-channel transistors with different channel lengths in a 0.35 μm technology demonstrate the feasibility of the proposed model.</description><identifier>ISSN: 0271-4302</identifier><identifier>ISBN: 9781424416837</identifier><identifier>ISBN: 1424416833</identifier><identifier>EISSN: 2158-1525</identifier><identifier>EISBN: 1424416841</identifier><identifier>EISBN: 9781424416844</identifier><identifier>DOI: 10.1109/ISCAS.2008.4541769</identifier><identifier>LCCN: 80-646530</identifier><language>eng</language><publisher>IEEE</publisher><subject>Capacitance measurement ; Channel bank filters ; Current measurement ; Electrostatic analysis ; Electrostatic measurements ; Length measurement ; MOSFETs ; Semiconductor device modeling ; Surface fitting ; Voltage</subject><ispartof>2008 IEEE International Symposium on Circuits and Systems, 2008, p.1720-1723</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/4541769$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,314,776,780,785,786,2051,27903,27904,54899</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/4541769$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Radin, R. L.</creatorcontrib><creatorcontrib>Moreira, G. L.</creatorcontrib><creatorcontrib>Galup-Montoro, C.</creatorcontrib><creatorcontrib>Schneider, M. C.</creatorcontrib><title>A simple modeling of the early voltage of MOSFETs in weak and moderate inversion</title><title>2008 IEEE International Symposium on Circuits and Systems</title><addtitle>ISCAS</addtitle><description>This paper presents a simple model of the Early voltage for the MOS transistor operating in weak and moderate inversion. The model is based on a decomposition of the transistor channel into a region where the gradual-channel approximation holds and a region that is modeled as a reverse-biased juntion. Measurements of the characteristics of both nand p-channel transistors with different channel lengths in a 0.35 μm technology demonstrate the feasibility of the proposed model.</description><subject>Capacitance measurement</subject><subject>Channel bank filters</subject><subject>Current measurement</subject><subject>Electrostatic analysis</subject><subject>Electrostatic measurements</subject><subject>Length measurement</subject><subject>MOSFETs</subject><subject>Semiconductor device modeling</subject><subject>Surface fitting</subject><subject>Voltage</subject><issn>0271-4302</issn><issn>2158-1525</issn><isbn>9781424416837</isbn><isbn>1424416833</isbn><isbn>1424416841</isbn><isbn>9781424416844</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2008</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNo1kElPwzAQhc1SiVD6B-DiE7cUr4l9rCqWSkVFCpwjJxkXQ5YSp0X99xhaZg4jffPeSPMQuqZkSinRd4tsPsumjBA1FVLQNNEn6JIKJgRNlKCnKGJUqphKJs_QRKfqf8fTcxQRltJYcMJGKFIkTkQiOblAE-8_SCghOZMsQi8z7F2zqQE3XQW1a9e4s3h4Bwymr_d419WDWcMvfF5lD_evHrsWf4P5xKat_ky9GSDAHfTede0VGllTe5gc5xi9Bdf8KV6uHhfz2TJ2jCRDbApQlFcgpQnNrYLwEuGsAE5sKaitwPJSASsKrlNrjeGgNSM0oLTUlo_R7eHupu--tuCHvHG-hLo2LXRbn3MRcuGJDsKbg9ABQL7pXWP6fX5MlP8AAJpjOw</recordid><startdate>20080101</startdate><enddate>20080101</enddate><creator>Radin, R. 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C.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection><collection>Computer and Information Systems Abstracts</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>ProQuest Computer Science Collection</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Computer and Information Systems Abstracts Academic</collection><collection>Computer and Information Systems Abstracts Professional</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Radin, R. L.</au><au>Moreira, G. L.</au><au>Galup-Montoro, C.</au><au>Schneider, M. C.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>A simple modeling of the early voltage of MOSFETs in weak and moderate inversion</atitle><btitle>2008 IEEE International Symposium on Circuits and Systems</btitle><stitle>ISCAS</stitle><date>2008-01-01</date><risdate>2008</risdate><spage>1720</spage><epage>1723</epage><pages>1720-1723</pages><issn>0271-4302</issn><eissn>2158-1525</eissn><isbn>9781424416837</isbn><isbn>1424416833</isbn><eisbn>1424416841</eisbn><eisbn>9781424416844</eisbn><abstract>This paper presents a simple model of the Early voltage for the MOS transistor operating in weak and moderate inversion. The model is based on a decomposition of the transistor channel into a region where the gradual-channel approximation holds and a region that is modeled as a reverse-biased juntion. Measurements of the characteristics of both nand p-channel transistors with different channel lengths in a 0.35 μm technology demonstrate the feasibility of the proposed model.</abstract><pub>IEEE</pub><doi>10.1109/ISCAS.2008.4541769</doi><tpages>4</tpages></addata></record> |
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source | IEEE Electronic Library (IEL) Conference Proceedings |
subjects | Capacitance measurement Channel bank filters Current measurement Electrostatic analysis Electrostatic measurements Length measurement MOSFETs Semiconductor device modeling Surface fitting Voltage |
title | A simple modeling of the early voltage of MOSFETs in weak and moderate inversion |
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