FIB-Sputtering Characteristic of Mold Material and Nano Grid Pattern Fabrication

Recently, FIB-Sputtering process has been applied to many micro-manufacturing fields such as semi-conductor industries, display industries and IT industries etc. because it is available to fabricate the micro 3D shape structure directly and more effectively than other machining processes. However, c...

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Bibliographische Detailangaben
Hauptverfasser: Eun-Goo Kang, Byeong-Yeol Choi, Won-Pyo Hong, Hon-Zong Choi, Seok-Woo Lee
Format: Tagungsbericht
Sprache:eng
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