Utilization of Insitu Metrology Capability of ASML Lithography Scanner to Improve Overall Process Control

As the device integration and relating lithography process progressively increasing in complexity for each new technology node, there is a growing need for a more integrated approach to process control. There are several insitu metrology sensors in ASML scanners that can be used to improve not only...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Chen, A., Dusa, M., van Schoot, J., Theeuwes, T., Janssen, M., van Ingen Schenau, K., van der Laan, H.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Delay Detectors Feeds Fingerprint recognition Lenses Lithography Metrology Process control Sensor phenomena and characterization Stability
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