The Future of CD Metrology

State-of-the-art critical dimension (CD) metrology tools have had difficulty keeping pace with the extremely stringent lithography and etch CD measurement requirements in cutting-edge device fabrication facilities. These tight CD control requirements for 90 nm technology and below have been set fort...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Allgair, J., Bunday, B.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Councils Etching Fabrication Laboratories Length measurement Lithography Manufacturing Metrology NIST Random access memory
Online-Zugang:	Volltext bestellen
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