A Highly pH-Sensitive Eelectrolyte Insulator Semi-conductor Element Using A Stack of Anodic Gd Oxide/Silicon Oxide
In this paper, the Gd 2 O 3 /SiO 2 stacks were fabricated in an anodic oxidation method and used as a pH-sensitive electrolyte insulator semiconductor (EIS) element for pH value test. Several outstanding results are obtained, they are: (1) The higher pH-value solution the EIS samples were immersed i...
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description | In this paper, the Gd 2 O 3 /SiO 2 stacks were fabricated in an anodic oxidation method and used as a pH-sensitive electrolyte insulator semiconductor (EIS) element for pH value test. Several outstanding results are obtained, they are: (1) The higher pH-value solution the EIS samples were immersed in, the more rugged surface the films were observed. (2) The etched thickness of the Gd 2 O 3 layer almost linearly increases with the decrease of pH value. (3) The C-V curves for EIS samples etched with decedent pH- value solutions were shifted to right in a ratio around 56.72 mV/pH. (4) When fixing in the same capacitance, the linear factor of the voltage compared with a fitting linear curve is 99.98%, which is much closed to ideal case. From those results, the Gd 2 O 3 oxide can be adequately regarded as a pH-sensitive EIS device for the bio-medicine test of the human blood, urine and even saliva, of which pH-values may be changed by different syndromes of diseases. |
doi_str_mv | 10.1109/EDSSC.2007.4450250 |
format | Conference Proceeding |
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Several outstanding results are obtained, they are: (1) The higher pH-value solution the EIS samples were immersed in, the more rugged surface the films were observed. (2) The etched thickness of the Gd 2 O 3 layer almost linearly increases with the decrease of pH value. (3) The C-V curves for EIS samples etched with decedent pH- value solutions were shifted to right in a ratio around 56.72 mV/pH. (4) When fixing in the same capacitance, the linear factor of the voltage compared with a fitting linear curve is 99.98%, which is much closed to ideal case. From those results, the Gd 2 O 3 oxide can be adequately regarded as a pH-sensitive EIS device for the bio-medicine test of the human blood, urine and even saliva, of which pH-values may be changed by different syndromes of diseases.</description><identifier>ISBN: 1424406366</identifier><identifier>ISBN: 9781424406364</identifier><identifier>EISBN: 1424406374</identifier><identifier>EISBN: 9781424406371</identifier><identifier>DOI: 10.1109/EDSSC.2007.4450250</identifier><language>eng</language><publisher>IEEE</publisher><subject>Capacitance ; Capacitance-voltage characteristics ; Etching ; Insulation ; Insulator testing ; Oxidation ; Semiconductor device testing ; Semiconductor films ; Silicon ; Voltage</subject><ispartof>2007 IEEE Conference on Electron Devices and Solid-State Circuits, 2007, p.813-816</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/4450250$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,776,780,785,786,2052,27904,54898</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/4450250$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Huang, C.T.</creatorcontrib><creatorcontrib>Chen, M.Y.</creatorcontrib><creatorcontrib>Chen, J.Y.</creatorcontrib><creatorcontrib>Chen, S.N.</creatorcontrib><creatorcontrib>Ko, H.H.</creatorcontrib><title>A Highly pH-Sensitive Eelectrolyte Insulator Semi-conductor Element Using A Stack of Anodic Gd Oxide/Silicon Oxide</title><title>2007 IEEE Conference on Electron Devices and Solid-State Circuits</title><addtitle>EDSSC</addtitle><description>In this paper, the Gd 2 O 3 /SiO 2 stacks were fabricated in an anodic oxidation method and used as a pH-sensitive electrolyte insulator semiconductor (EIS) element for pH value test. Several outstanding results are obtained, they are: (1) The higher pH-value solution the EIS samples were immersed in, the more rugged surface the films were observed. (2) The etched thickness of the Gd 2 O 3 layer almost linearly increases with the decrease of pH value. (3) The C-V curves for EIS samples etched with decedent pH- value solutions were shifted to right in a ratio around 56.72 mV/pH. (4) When fixing in the same capacitance, the linear factor of the voltage compared with a fitting linear curve is 99.98%, which is much closed to ideal case. From those results, the Gd 2 O 3 oxide can be adequately regarded as a pH-sensitive EIS device for the bio-medicine test of the human blood, urine and even saliva, of which pH-values may be changed by different syndromes of diseases.</description><subject>Capacitance</subject><subject>Capacitance-voltage characteristics</subject><subject>Etching</subject><subject>Insulation</subject><subject>Insulator testing</subject><subject>Oxidation</subject><subject>Semiconductor device testing</subject><subject>Semiconductor films</subject><subject>Silicon</subject><subject>Voltage</subject><isbn>1424406366</isbn><isbn>9781424406364</isbn><isbn>1424406374</isbn><isbn>9781424406371</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2007</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNp9z81OwzAQBGAjhMRfXwAu-wJJ14mbiGNUAuHEwe25ipxtWXDsynYReXtArcSN0-jTaA4jxJ3EXEp8mLePWi_zArHOlVpgscAzcS1VoRRWZa3O_1BVl2IW4zsiyrpSsi6vRGig492bnWDfZZpc5MSfBC1ZMil4OyWCFxcPtk8-gKaRM-PdcDC_bC2N5BKsI7sdNKBTbz7Ab6FxfmADzwO8fvFAc82Wf2ZH3YqLbW8jzU55I-6f2tWyy5iINvvAYx-mzelL-X_7DanVTDo</recordid><startdate>200712</startdate><enddate>200712</enddate><creator>Huang, C.T.</creator><creator>Chen, M.Y.</creator><creator>Chen, J.Y.</creator><creator>Chen, S.N.</creator><creator>Ko, H.H.</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>200712</creationdate><title>A Highly pH-Sensitive Eelectrolyte Insulator Semi-conductor Element Using A Stack of Anodic Gd Oxide/Silicon Oxide</title><author>Huang, C.T. ; Chen, M.Y. ; Chen, J.Y. ; Chen, S.N. ; Ko, H.H.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-ieee_primary_44502503</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2007</creationdate><topic>Capacitance</topic><topic>Capacitance-voltage characteristics</topic><topic>Etching</topic><topic>Insulation</topic><topic>Insulator testing</topic><topic>Oxidation</topic><topic>Semiconductor device testing</topic><topic>Semiconductor films</topic><topic>Silicon</topic><topic>Voltage</topic><toplevel>online_resources</toplevel><creatorcontrib>Huang, C.T.</creatorcontrib><creatorcontrib>Chen, M.Y.</creatorcontrib><creatorcontrib>Chen, J.Y.</creatorcontrib><creatorcontrib>Chen, S.N.</creatorcontrib><creatorcontrib>Ko, H.H.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Huang, C.T.</au><au>Chen, M.Y.</au><au>Chen, J.Y.</au><au>Chen, S.N.</au><au>Ko, H.H.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>A Highly pH-Sensitive Eelectrolyte Insulator Semi-conductor Element Using A Stack of Anodic Gd Oxide/Silicon Oxide</atitle><btitle>2007 IEEE Conference on Electron Devices and Solid-State Circuits</btitle><stitle>EDSSC</stitle><date>2007-12</date><risdate>2007</risdate><spage>813</spage><epage>816</epage><pages>813-816</pages><isbn>1424406366</isbn><isbn>9781424406364</isbn><eisbn>1424406374</eisbn><eisbn>9781424406371</eisbn><abstract>In this paper, the Gd 2 O 3 /SiO 2 stacks were fabricated in an anodic oxidation method and used as a pH-sensitive electrolyte insulator semiconductor (EIS) element for pH value test. Several outstanding results are obtained, they are: (1) The higher pH-value solution the EIS samples were immersed in, the more rugged surface the films were observed. (2) The etched thickness of the Gd 2 O 3 layer almost linearly increases with the decrease of pH value. (3) The C-V curves for EIS samples etched with decedent pH- value solutions were shifted to right in a ratio around 56.72 mV/pH. (4) When fixing in the same capacitance, the linear factor of the voltage compared with a fitting linear curve is 99.98%, which is much closed to ideal case. From those results, the Gd 2 O 3 oxide can be adequately regarded as a pH-sensitive EIS device for the bio-medicine test of the human blood, urine and even saliva, of which pH-values may be changed by different syndromes of diseases.</abstract><pub>IEEE</pub><doi>10.1109/EDSSC.2007.4450250</doi></addata></record> |
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subjects | Capacitance Capacitance-voltage characteristics Etching Insulation Insulator testing Oxidation Semiconductor device testing Semiconductor films Silicon Voltage |
title | A Highly pH-Sensitive Eelectrolyte Insulator Semi-conductor Element Using A Stack of Anodic Gd Oxide/Silicon Oxide |
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