Thermoelectric Flow Sensors with Monolithically Integrated Channel Structures for Measurements of Very Small Flow Rates

Thermoelectric Flow Sensors with Monolithically Integrated Channel Structures for Measurements of Very Small Flow Rates

A thermal flow sensor with monolithically integrated channel structures for measurements of flow rates down to 40 nlmin -1 is presented. The sensor is based on a fabrication process using a high-temperature silicon nitride as protective coating. The channel is realised by means of surface micromachi...

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Hauptverfasser: Buchner, R., Bhargava, P., Sosna, C., Benecke, W., Lang, W.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Chemical sensors
Coatings
Fabrication
Fluid flow measurement
Micromachining
Protection
Silicon
Stability
Thermal sensors
Thermoelectricity
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creator Buchner, R.
Bhargava, P.
Sosna, C.
Benecke, W.
Lang, W.
description A thermal flow sensor with monolithically integrated channel structures for measurements of flow rates down to 40 nlmin -1 is presented. The sensor is based on a fabrication process using a high-temperature silicon nitride as protective coating. The channel is realised by means of surface micromachining and consists of SU-8. For chemical stability and to gain hydrophilic properties, the channel is coated on the inside by silicon-oxide and silicon-nitride as a moisture barrier. Sensor systems have been fabricated and characterised.
doi_str_mv 10.1109/ICSENS.2007.4388529
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subjects Chemical sensors
Coatings
Fabrication
Fluid flow measurement
Micromachining
Protection
Silicon
Stability
Thermal sensors
Thermoelectricity
title Thermoelectric Flow Sensors with Monolithically Integrated Channel Structures for Measurements of Very Small Flow Rates
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